Example implementations relate to an inspection method for training a measurement machine to accurately measure side joint lengths and detecting a defect among a plurality of solder joints. The method includes receiving a first data representing the side joint lengths of the plurality of solder joints measured by a first measurement machine and a second data representing the side joint lengths measured by a second measurement machine. Further, the method includes determining a correlation value based on a statistical analysis of a relationship between the first data and the second data. The method further includes updating an algorithm used by the first measurement machine to measure the side joint lengths, based on the correlation value to reduce deviation between the first data and the second data. Later, the updated algorithm is used as a dimensional metrology in the first measurement machine for detecting the defect in the solder joints.

A multi-mode microwave waveguide blade sensing system includes a transceiver, a waveguide, and a probe sensor. The transceiver generates a microwave energy signal having a first waveguide mode and a different second waveguide mode. The waveguide includes a first end that receives the microwave energy signal. The probe sensor includes a proximate end that receives the microwave energy signal from the transceiver and a distal end including an aperture that outputs the microwave energy signal. The probe sensor directs the microwave energy signal at a first direction based on the first waveguide mode and a different second direction different based on the second waveguide mode. The probe sensor receives different levels of reflected microwave energy based at least in part on a location at which the at least one microwave energy signal is reflected from the machine.

A multi-mode microwave waveguide blade sensing system includes a transceiver, a waveguide, and a probe sensor. The transceiver generates a microwave energy signal having a first waveguide mode and a different second waveguide mode. The waveguide includes a first end that receives the microwave energy signal. The probe sensor includes a proximate end that receives the microwave energy signal from the transceiver and a distal end including an aperture that outputs the microwave energy signal. The probe sensor directs the microwave energy signal at a first direction based on the first waveguide mode and a different second direction different based on the second waveguide mode. The probe sensor receives different levels of reflected microwave energy based at least in part on a location at which the at least one microwave energy signal is reflected from the machine.

Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.

Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.

Disclosed is a distance measuring device, in particular for dielectric or metallic target objects, said device comprising a sensor with a resonance chamber and a resonance structure. The resonance structure has an element consisting of a dielectric material which has a narrowing at the edge, the resonance frequency of the resonance chamber being dependent on the distance between the element and a target object.

Disclosed is a distance measuring device, in particular for dielectric or metallic target objects, said device comprising a sensor with a resonance chamber and a resonance structure. The resonance structure has an element consisting of a dielectric material which has a narrowing at the edge, the resonance frequency of the resonance chamber being dependent on the distance between the element and a target object.

The purpose of the present invention is to provide a height measurement device with which, even when the height of a sample surface varies considerably, it is possible, with a relatively simple configuration, to perform height measurement with high accuracy at various heights. In order to achieve the abovementioned purpose, proposed is an optical height measurement device characterized by being provided with: a stage for retaining a sample; a stage driving unit for adjusting the stage at different heights; a projection optical system for projecting light onto the sample; a detection optical system for receiving light reflected from the sample; and a processing unit for measuring the height of the sample on the basis of a signal outputted from the detection optical system, wherein the projection optical system is provided with a light source that emits light, and an optical path dividing element for branching the optical path of the light emitted from the light source, and the detection optical system is provided with a sensor for receiving light reflected from the sample, and an element for adjusting the light path of the light reflected from the sample in the direction of the sensor prior to reception of the light by the sensor.

A semiconductor review tool receives absolute Z-height values for the semiconductor wafer, such as a semiconductor wafer with a beveled edge. The absolute Z-height values can be determined by a semiconductor inspection tool. The semiconductor review tool reviews the semiconductor wafer within a Z-height based on the absolute Z-height values. Focus can be adjusted to within the Z-height.

A measuring device for a tube is disclosed. The measuring device includes a drift tool configured to verify roundness of the tube, a first electromagnetic (EM) emitter disposed on the drift tool and configured to emit EM waves while the drift tool drifts inside the tube, and an EM receiver disposed on the drift tool and configured to receive the EM waves reflected from an internal surface of the tube, wherein parameters of the emitted and received EM waves are analyzed to compute an internal diameter of the tube.