Various embodiments may provide an optical sensing device based on surface plasmon resonance (SPR). The optical sensing device may include an optical arrangement configured to provide a first polarization light beam and a second polarization light beam, and a first optical member including a sensing surface, the first optical member configured to receive the first and second polarization light beams and reflect the first and second polarization light beams at the sensing surface. The optical sensing device may further include a second optical member arranged to receive the reflected first and second polarization light beams from the first optical member and configured to separate the reflected first and second polarization light beams in a first direction and a second direction, respectively. The optical device may additionally include a detector arrangement configured to detect the reflected first and second polarization light beams from the second optical member.

Various embodiments may provide an optical sensing device based on surface plasmon resonance (SPR). The optical sensing device may include an optical arrangement configured to provide a first polarization light beam and a second polarization light beam, and a first optical member including a sensing surface, the first optical member configured to receive the first and second polarization light beams and reflect the first and second polarization light beams at the sensing surface. The optical sensing device may further include a second optical member arranged to receive the reflected first and second polarization light beams from the first optical member and configured to separate the reflected first and second polarization light beams in a first direction and a second direction, respectively. The optical device may additionally include a detector arrangement configured to detect the reflected first and second polarization light beams from the second optical member.

A material transport property measurement system includes an ellipsometry system, a heat capacity measurement system, and a controller. The ellipsometry system has a light source to generate a light which passes through a polarizer and shines on a sample. The sample reflects the light to an integrated polarization analyzer, which includes multiple polarizers with different polarization angles distributed from 0 to 180 degrees. A detector assembly includes multiple detectors corresponding to the multiple polarizers to detect light passing through the respective polarizers and generate multiple first electrical signals. The heat capacity measurement system measures a temperature parameter of the sample using a non-contact method, and outputs a second electrical signal. The controller analyzes the second and the multiple first electrical signals to obtain the transport properties of the material. A material transport property measurement method is also provided.

A polarization property image measurement device includes: a first radiation unit that radiates light beams in different polarization conditions onto a target object after subjecting the light beams to intensity modulation at frequencies different from one another; a light receiving unit including first photoelectric conversion units that photoelectrically convert the light beams having been radiated from the first radiation unit and scattered at the target object in correspondence to each of the different polarization conditions, and second photoelectric conversion units that photoelectrically convert visible light from the target object; and a processor that detects signals individually output from the first photoelectric conversion units at the different frequencies and differentiates each signal from other signals so as to determine an origin of the signal as one of the light beams; and creates an image of the target object based upon signals individually output from the second photoelectric conversion units.

A polarization property image measurement device includes: a first radiation unit that radiates light beams in different polarization conditions onto a target object after subjecting the light beams to intensity modulation at frequencies different from one another; a light receiving unit including first photoelectric conversion units that photoelectrically convert the light beams having been radiated from the first radiation unit and scattered at the target object in correspondence to each of the different polarization conditions, and second photoelectric conversion units that photoelectrically convert visible light from the target object; and a processor that detects signals individually output from the first photoelectric conversion units at the different frequencies and differentiates each signal from other signals so as to determine an origin of the signal as one of the light beams; and creates an image of the target object based upon signals individually output from the second photoelectric conversion units.

In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.

In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.

This invention relates to a method of and a system for determining a beam quality factor (VQF) of a beam of light having a transverse electric field that may be scalar, vector, or a combination thereof, wherein the VQF is a measure of the degree of vectorness of the beam of light varying between pure scalar and pure vector. The beam is typically a laser beam, wherein the method comprises receiving an input laser beam to be analysed and splitting the received beam of light into two orthogonal components. A predetermined number of modes or states per orthogonal component is then detected and an on axis intensity of each detected mode or state detected is measured. The measured intensities is then used to calculate the VQF in terms using at least one quantum mechanical entanglement measure.

A system is described that combines spectropolarimetry with scatterometry. The system uses an annular mirror and liquid crystal devices to control the angle of the incident light cone, the polarization and wavelength, an imaging setup and one or more video cameras so that spectroscopic-polarimetric-scatterometric images can be grabbed rapidly. The system is also designed to incorporate additional imaging modes such as interference, phase contrast, fluorescence and Raman spectropolarimetric imaging.

A system is described that combines spectropolarimetry with scatterometry. The system uses an annular mirror and liquid crystal devices to control the angle of the incident light cone, the polarization and wavelength, an imaging setup and one or more video cameras so that spectroscopic-polarimetric-scatterometric images can be grabbed rapidly. The system is also designed to incorporate additional imaging modes such as interference, phase contrast, fluorescence and Raman spectropolarimetric imaging.