A system for sterilizing a fluid includes a sterilization container bounding a fluid flow path that can be coupled with a fluid source. The sterilization container is comprised of one or more polymeric walls. A beam generator is configured to direct a beam of electromagnetic radiation through at least a portion of the fluid flow path of the sterilization container, the beam of electromagnetic radiation being sufficient to sterilize a fluid within the fluid flow path.

A method for regulating the relative position of an analyte of a sample (16) in relation to a light beam (F) includes the illumination of the analyte of the sample (16) with the light beam (F), capturing by an imaging device (38) a transmission image of the beams scattered by the analyte of the sample (16) in order to establish a diffraction pattern, and modifying the relative position of the analyte of the sample (16) in relation to the light beam (F) according to at least one property of the diffraction pattern.

A tunable colorimetric sensor/optical filter is based on a lithography-free, asymmetric Fabry-Perot cavity. The sensor has a thin-film structure formed by a lossy, porous nanoplasmonic top film deposited on an actively tunable spacer middle layer, and a reflective base layer (either a metal or semiconductor). The structure is fabricated using wafer-scale PVD processes, and the middle layer responds to the presence of a stimulus in the local environment, by expanding in thickness resulting in a shift in resonance wavelength and thus an obvious change in color of the sensor, which color change is detectable by the naked-eye. Such layered geometries exhibit vibrant, macroscopic structural coloration owing to the broadband optical absorption of the top film, enabling the change in spacer thickness to be transduced visually, circumventing the need for sophisticated optical equipment for signal readout to observe the presence of the environmental stimulus.

A confocal chromatic device for inspecting the surface of an object such as a wafer, including a plurality of optical measurement channels with collection apertures arranged for collecting the light reflected by the object through a chromatic lens at a plurality of measurement points, the plurality of optical measurement channels including optical measurement channels with an intensity detector for measuring a total intensity of the collected light. A method is also provided for inspecting the surface of an object such as a wafer including tridimensional structures.

A method of defect inspection for a photomask is provided. According to the method, a light transmittance correction is performed to reduce a light transmittance of a calibration key pattern region of a photomask including a field region and the calibration key pattern region to the light transmittance of the field region. Light calibration is performed using the calibration key pattern region having corrected light transmittance. Defect inspection for the field region is performed by applying a result of the light calibration.

The invention relates to a method for securing a document including a visual element, carried out by a processing unit comprising processing means, the method comprising generation, from the visual element, of a reference security datum, and storage of the reference security datum,

wherein the reference security datum is generated by means of an algorithm configured so as to generate: for any image acquired from the visual element, a security datum whereof the differences relative to the reference security datum are less than a determined threshold, and for any image acquired on a different visual element, a security datum whereof the differences relative to the reference security datum are greater than said threshold.

The invention relates to a method for securing a document including a visual element, carried out by a processing unit comprising processing means, the method comprising generation, from the visual element, of a reference security datum, and storage of the reference security datum,

wherein the reference security datum is generated by means of an algorithm configured so as to generate: for any image acquired from the visual element, a security datum whereof the differences relative to the reference security datum are less than a determined threshold, and for any image acquired on a different visual element, a security datum whereof the differences relative to the reference security datum are greater than said threshold.

Provided are a mask inspection apparatus and a mask inspection method that can prevent a reduction in a reflectance of a drop-in mirror, which is caused by carbon contaminants. A mask inspection apparatus according to the present invention includes a drop-in mirror including multi-layer film and a reflective surface. The drop-in mirror is configured to reflect illumination light incident on the reflective surface and illuminate the mask. An area of the reflective surface is configured to be greater than an area of an illuminated spot irradiated with the illumination light on the reflective surface. The drop-in mirror is configured to be movable. A position of the illuminated spot on the reflective surface is configured to be moved when the drop-in mirror is moved.

A component concentration measurement device includes a light irradiation unit that performs intensity modulation where two lights of wavelengths different from each other are intensity-modulated by signals of a same frequency and a same phase, and a measurement object is irradiated, a detecting unit that detects a photoacoustic wave generated within the measurement object due to irradiation by the light irradiation unit, and converts the detected photoacoustic wave into a first electric signal, and a processing unit that obtains a concentration of a target component contained in the measurement object, on the basis of an amplitude and a phase of the first electric signal. Light absorption coefficients of the two lights, corresponding to a background component contained in the measurement object, are equal in change amount with regard to change in temperature, and have signs different from each other.

The device permitting an early detection, without measurement of the fluorescence, of colonies resulting from the multiplication of micro-organisms present in a sample to be tested, includes a substantially flat and horizontal detection surface, on which at least one support for growing the micro-organisms in the form of colonies is arranged immobile. The support is of the type membrane or agar medium. There is a detection system, such as a linear scanner, mounted movable and flat for scanning the whole or part of the surface, including at least one CCD sensor associated with an optical system comprised of at least one lighting and at least one optical device, such as a lens. The CCD sensor has a resolution higher than or equal to 2400 dpi. The detection system images colonies having a diameter smaller than 50 [mu]m through a useful magnification higher than or equal to 60.