The present document relates to a method of measuring a topography of a side wall of a structure on a surface of a substrate using a scanning probe microscopy system. The system comprises a probe with a probe tip, and the substrate is supported on a substrate carrier. The method includes performing a measurement at a measurement point, which includes the steps of: moving the probe and the substrate carrier relative to each other to approach the probe tip towards the surface in a Z-direction perpendicular to the substrate surface; determining that the probe tip is located adjacent the side wall; establishing contact between the probe tip and the side wall; and obtaining a lateral position of the probe tip while in contact with the side wall, to determine a current position on the side wall. The step of establishing contact comprises a step of moving the probe tip relative to the substrate carrier in at least one lateral direction transverse to the Z-direction, by applying a non-oscillatory motion on the substrate carrier or the probe. The document further relates to a scanning probe microscopy device.