Apparatus and techniques presented combine the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the phase feedback from second resonant drive frequency operates in FM mode. In particular the first or second frequency may be used to measure the loss tangent, a dimensionless parameter which measures the ratio of energy dissipated to energy stored in a cycle of deformation.

Apparatus and techniques for extracting information carried in higher eigenmodes or harmonics of an oscillating cantilever or other oscillating sensors in atomic force microscopy and related MEMs work are described. Similar apparatus and techniques for extracting information from piezoelectric, polymer and other materials using contact resonance with multiple excitation signals are also described.

Apparatus and techniques for extracting information carried in higher eigenmodes or harmonics of an oscillating cantilever or other oscillating sensors in atomic force microscopy and related MEMs work are described. Similar apparatus and techniques for extracting information from piezoelectric, polymer and other materials using contact resonance with multiple excitation signals are also described.

Methods are provided for operating a scanning probe microscope in which a first method comprises identifying the location of a measurement spot on the surface of the cantilever using a photodetector assembly and executing a calibration procedure to identify a target region for positioning the measurement spot on the surface of the cantilever. A second method comprises identifying the cantilever, retrieving a target region for a measurement spot on the surface of the cantilever from memory based on the identified cantilever; and positioning the measurement spot in the target region.

Methods are provided for operating a scanning probe microscope in which a first method comprises identifying the location of a measurement spot on the surface of the cantilever using a photodetector assembly and executing a calibration procedure to identify a target region for positioning the measurement spot on the surface of the cantilever. A second method comprises identifying the cantilever, retrieving a target region for a measurement spot on the surface of the cantilever from memory based on the identified cantilever; and positioning the measurement spot in the target region.

A scanning probe microscope and method of operating the scanning probe microscope selects a preferred focus position of a focused optical beam on a probe of the scanning probe microscope by adjusting a focus position of the focused optical beam on the probe relative to a tip of the probe and then measuring at least one of a response of the probe and optical radiation scattered from the probe as a function of the position of the focused optical beam. The preferred focus position of the focused optical beam on the probe is based on the measuring of the at least one of the response of the probe and the optical radiation scattered from the probe.

A scanning probe microscope and method of operating the scanning probe microscope selects a preferred focus position of a focused optical beam on a probe of the scanning probe microscope by adjusting a focus position of the focused optical beam on the probe relative to a tip of the probe and then measuring at least one of a response of the probe and optical radiation scattered from the probe as a function of the position of the focused optical beam. The preferred focus position of the focused optical beam on the probe is based on the measuring of the at least one of the response of the probe and the optical radiation scattered from the probe.

A method of operating an atomic force microscope (AFM) is provided. The method includes inspecting a sample by using the AFM and inspecting a tip of a probe of the AFM by using a characterization sample. The characterization sample includes a first characterization pattern that includes a line and space pattern of a first height, a second characterization pattern that includes a line and space pattern of a second height that is lower than the first height, and a third characterization pattern that includes a line and space pattern of a third height that is lower than the second height, and includes a rough surface.

A method of operating an atomic force microscope (AFM) is provided. The method includes inspecting a sample by using the AFM and inspecting a tip of a probe of the AFM by using a characterization sample. The characterization sample includes a first characterization pattern that includes a line and space pattern of a first height, a second characterization pattern that includes a line and space pattern of a second height that is lower than the first height, and a third characterization pattern that includes a line and space pattern of a third height that is lower than the second height, and includes a rough surface.

A method of operating an atomic force microscope (AFM) is provided. The method includes inspecting a sample by using the AFM and inspecting a tip of a probe of the AFM by using a characterization sample. The characterization sample includes a first characterization pattern that includes a line and space pattern of a first height, a second characterization pattern that includes a line and space pattern of a second height that is lower than the first height, and a third characterization pattern that includes a line and space pattern of a third height that is lower than the second height, and includes a rough surface.