A method of assessing a probe by measuring a known sample whose shape is known with the probe in an electronic microscope, the known sample having a projection part on a surface thereof, and the projection part having a shape tapered toward a vertex thereof, the method comprising a step of measuring circle equivalent radius of the projection part, a step of comparing the circle equivalent radius with a first threshold value, and a step of determining that the probe is satisfactory when the width is less than the first threshold value, and a step of determining that the probe is unsatisfactory when the width is equal to or greater than the first threshold value.

The present invention relates to a device for measuring and/or modifying a surface of a sample, including a sample holder, including a first area configured to receive the sample fixedly mounted relative to the first area, a support, a first probe configured to detect a first parameter at a point of the surface and to generate a first measurement signal representative of the first parameter, and a second probe configured to detect a second parameter at a point of the surface, and to generate a second measurement signal representative of the second parameter, the first parameter being different from the second parameter, or one of the first probe and the second probe being configured to modify a third parameter of the surface at the point of the surface.

The present invention relates to a device for measuring and/or modifying a surface of a sample, including a sample holder, including a first area configured to receive the sample fixedly mounted relative to the first area, a support, a first probe configured to detect a first parameter at a point of the surface and to generate a first measurement signal representative of the first parameter, and a second probe configured to detect a second parameter at a point of the surface, and to generate a second measurement signal representative of the second parameter, the first parameter being different from the second parameter, or one of the first probe and the second probe being configured to modify a third parameter of the surface at the point of the surface.

Apparatus and techniques presented combine the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the phase feedback from second resonant drive frequency operates in FM mode. In particular the first or second frequency may be used to measure the loss tangent, a dimensionless parameter which measures the ratio of energy dissipated to energy stored in a cycle of deformation.

Apparatus and techniques presented combine the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the phase feedback from second resonant drive frequency operates in FM mode. In particular the first or second frequency may be used to measure the loss tangent, a dimensionless parameter which measures the ratio of energy dissipated to energy stored in a cycle of deformation.

A method for automatically calibrating a feedback system, comprising: receiving one or more input parameters associated with a feedback system; applying the one or more input parameters to a model of the feedback system; deriving one or more feedback parameters for the feedback system from the model by: optimizing the model for the feedback parameters, and applying a noise characteristic of the feedback system to the model; and automatically tuning the feedback system using the one or more derived feedback parameters.

A method for automatically calibrating a feedback system, comprising: receiving one or more input parameters associated with a feedback system; applying the one or more input parameters to a model of the feedback system; deriving one or more feedback parameters for the feedback system from the model by: optimizing the model for the feedback parameters, and applying a noise characteristic of the feedback system to the model; and automatically tuning the feedback system using the one or more derived feedback parameters.

A scanning probe microscope is designed to improve visibility of a marker in broad and high-speed observation by a magnifying observation processing device. A marker is disposed so that an aspect ratio of an observation visual field of the magnifying observation processing device is matched with an observation angle in a circumference centering on a region of interest. Further, the marker is formed by scratch scars of multiple lines, for example, to enhance edge contrast.

A scanning probe microscope is designed to improve visibility of a marker in broad and high-speed observation by a magnifying observation processing device. A marker is disposed so that an aspect ratio of an observation visual field of the magnifying observation processing device is matched with an observation angle in a circumference centering on a region of interest. Further, the marker is formed by scratch scars of multiple lines, for example, to enhance edge contrast.

An alignment system (100) and method for positioning and/or keeping a first object (1) at a controlled distanced (D1) with respect to a second object (2). An object stage (11) is configured to hold a surface (1a) of the first object (1) at a distance (D1) over a surface (2a) of the second object (2). A sensor device (31) comprising a probe tip (31a) is connected at a predetermined probe level distance (Dp) relative to the surface (1a) of the first object (1). The probe tip (31a) is configured to perform an atomic force measurement (AFM) of a force (F1) exerted via the probe tip (31a) on a surface (2a) of the second object (2). A controller (80) is configured to control an object stage actuator (21) as a function of the probe level distance (Dp) and the measured force (F1) to maintain the controlled distanced (D1).