A substrate for forming timepiece components includes a first part based on photostructurable glass and at least a second part based on at least one second material. One surface of the first part is made integral with a surface of the second part so as to form a one-piece timepiece component.

A method for manufacturing a timepiece component including successive steps of: providing a timepiece component (1); breaking the timepiece component (1) into a plurality of pieces (10); depositing the pieces (10) on a support (2) and creating a desired pattern to be reassembled, the pattern having interstices (1) between the various pieces (10) of the timepiece component (1); transferring the support (2) into a mould adapted by hot forming and placing a preform (3) on the pieces (10) of the timepiece component; heating the whole to a temperature higher than the vitreous transition temperature of the preform (3) and applying a force on the preform to fill the interstices (11) and obtain a reassembled timepiece component (1); cooling the whole below the vitreous transition temperature of the preform (3) to form the reassembled timepiece component (1); recovering the reassembled timepiece component (1) and machining it to the required dimensions.

The invention relates to an external part including a first portion based on photostructurable glass, at least one second portion based on at least one second material. According to the invention, one surface of the first portion is made integral with a surface of the second portion so as to form a one-piece external part.

The invention relates to an external part including a first portion based on photostructurable glass, at least one second portion based on at least one second material. According to the invention, one surface of the first portion is made integral with a surface of the second portion so as to form a one-piece external part.

Economical method for manufacturing a timepiece display or hand-fitting component, wherein: there is chosen a first material which is easy to shape or to machine; a workpiece is made in the first material; a second material is chosen to make each aesthetical and/or visible surface of component, which is an amorphous metal alloy or has a nanocrystalline structure or includes nickel or nickel-phosphorus, or which is a pure metal or an alloy of gold and/or silver and/or copper and/or rhodium and/or titanium and/or aluminium; the workpiece is coated, at least on the surfaces intended to remain visible on the component, with a thick layer, of an initial thickness greater than 20 micrometres, of the second material; at least one aesthetical and/or visible surface, is diamond tool machined, removing all or part of the thick layer.

A process for producing a part provided with an external element includes: providing an electrically conductive substrate having an upper surface and a raised pattern with a crest on the upper surface; depositing an electrically insulating layer onto the upper surface around the pattern to a thickness less than or equal to the distance between the crest and the upper surface; depositing a metal layer onto the crest by galvanic growth so that the metal layer partly rests on the insulating layer; dissolving the insulating layer; covering an assembly including the substrate and the metal layer with a mass of a base material of the part to form an imprint; separating the mass and the metal layer from the substrate, the mass then exhibiting an external element formed by a recess, the shape of which corresponds to the imprint and the base of which interfaces with the metal layer.

A machining centre includes a base supporting several superposed stages. At least one stage is movable and can be position indexed relative to the base. Each stage includes distinct stations at a constant angular pitch including machining units or grippers. The combination of stations from adjacent stages defines a plurality of machining locations each combining a unit and a gripper. Each relative movement between two indexing positions of two stages changes the composition of the locations. Each gripper has at least one rotational degree of freedom relative to the stage that carries it. At least one station includes both at least one machining unit and at least one gripper.

Disclosed is a method including the following steps: a) providing a substrate including a first silicon layer, a second silicon layer and an intermediate silicon oxide layer therebetween; b) etching the first silicon layer in order to form the timepiece components therein; c) releasing from the substrate a wafer formed by at least all or part of the etched, first silicon layer and including the timepiece components; d) thermally oxidizing and then deoxidizing the timepiece components; e) forming by thermal oxidation or deposition a silicon oxide layer on the timepiece components; f) detaching the timepiece components from the wafer.

Disclosed is a method including the following steps: a) providing a substrate including a first silicon layer, a second silicon layer and an intermediate silicon oxide layer therebetween; b) etching the first silicon layer in order to form the timepiece components therein; c) releasing from the substrate a wafer formed by at least all or part of the etched, first silicon layer and including the timepiece components; d) thermally oxidizing and then deoxidizing the timepiece components; e) forming by thermal oxidation or deposition a silicon oxide layer on the timepiece components; f) detaching the timepiece components from the wafer.

A device (30, 40) for the transfer of a plurality of watch components (2) arranged on a first support (10) to their arrangement on a second support (20), wherein it comprises an inlet surface (31, 41) comprising inlet orifices (33, 43) so arranged as to correspond to a first arrangement of the watch components (2) on a first support (10), an outlet surface (32, 42) comprising outlet orifices (34, 44) so arranged as to correspond to a second arrangement of the watch components (2) on a second support (20), and guide elements (35, 45) adapted to guide the watch components (2) automatically from the inlet orifices (33, 43) to the outlet orifices (34, 44).