Patent classifications
H01S4/00
ULTRACOMPACT, ULTRASHORT COHERENT LIGHT SOURCES OPERATING AT UV TO X-RAY WAVELENGTHS
Systems and methods for generating longitudinally modulated (micro-bunched) electron bunches and for generating coherent radiation by the emission from relativistic electrons with a density that is longitudinally modulated (micro-bunched) with a spatial dimension that is significantly below the wavelength of the emitted radiation. The light source includes a high-brightness relativistic electron beam that interacts in a magnetic structure (linear or helical undulator or wiggler) or an electromagnetic structure with a pulse of high-power electro-magnetic wave (modulation laser pulse). The interaction leads to a large energy-modulation of the electron bunch which is transformed into a spatial modulation by an energy-dispersive element that can be the same undulator.
ULTRACOMPACT, ULTRASHORT COHERENT LIGHT SOURCES OPERATING AT UV TO X-RAY WAVELENGTHS
Systems and methods for generating longitudinally modulated (micro-bunched) electron bunches and for generating coherent radiation by the emission from relativistic electrons with a density that is longitudinally modulated (micro-bunched) with a spatial dimension that is significantly below the wavelength of the emitted radiation. The light source includes a high-brightness relativistic electron beam that interacts in a magnetic structure (linear or helical undulator or wiggler) or an electromagnetic structure with a pulse of high-power electro-magnetic wave (modulation laser pulse). The interaction leads to a large energy-modulation of the electron bunch which is transformed into a spatial modulation by an energy-dispersive element that can be the same undulator.
Method for manufacturing a photonic waveguide and photonic waveguide manufactured by said method
Some embodiments are directed to a method for manufacturing photonic waveguides and to photonic waveguides manufactured by this method.
Cartridge with laminated manifold
A circuit with electrical interconnect for external electronic connection and sensor(s) on a die are combined with a laminated manifold to deliver a liquid reagent over an active surface of the sensor(s). The laminated manifold includes fluidic channel(s), an interface between the die and the fluidic channel(s) being sealed. Also disclosed is a method, the method including assembling a laminated manifold including fluidic channel(s), attaching sensor(s) on a die to a circuit, the circuit including an electrical interconnect, and attaching a planarization layer to the circuit, the planarization layer including a cut out for the die. The method further includes placing sealing adhesive at sides of the die, attaching the laminated manifold to the circuit, and sealing an interface between the die and fluidic channel(s).
Electron diffraction intensity from single crystal silicon in a photoinjector
A method includes simulating diffraction in a transmission geometry of relativistic electron bunches from a crystallographic structure of a crystal thereby simulating diffraction of the relativistic electron bunches into a plurality of Bragg peaks. The method includes selecting a range of angles between a direction of propagation of the relativistic electron bunches and a normal direction of crystal including an angle at which a diffraction portion is maximized. The method includes sequentially accelerating a plurality of physical electron bunches to relativistic energies toward a physical crystal having the crystallographic structure and diffracting the plurality of physical electron bunches off the physical crystal at different angles and measuring the diffraction portion into the respective Bragg peak at the different angles. The method includes selecting a final angle based on the measured diffraction portion into the respective Bragg peak at the different angles and generating a pulse of light.
Electron diffraction intensity from single crystal silicon in a photoinjector
A method includes simulating diffraction in a transmission geometry of relativistic electron bunches from a crystallographic structure of a crystal thereby simulating diffraction of the relativistic electron bunches into a plurality of Bragg peaks. The method includes selecting a range of angles between a direction of propagation of the relativistic electron bunches and a normal direction of crystal including an angle at which a diffraction portion is maximized. The method includes sequentially accelerating a plurality of physical electron bunches to relativistic energies toward a physical crystal having the crystallographic structure and diffracting the plurality of physical electron bunches off the physical crystal at different angles and measuring the diffraction portion into the respective Bragg peak at the different angles. The method includes selecting a final angle based on the measured diffraction portion into the respective Bragg peak at the different angles and generating a pulse of light.
Generation of VUV, EUV, and X-ray Light Using VUV-UV-VIS Lasers
A method for extending and enhancing bright coherent high-order harmonic generation into the VUV-EUV-X-ray regions of the spectrum involves a way of accomplishing phase matching or effective phase matching of extreme upconversion of laser light at high conversion efficiency, approaching 10.sup.3 in some spectral regions, and at significantly higher photon energies in a waveguide geometry, in a self-guiding geometry, a gas cell, or a loosely focusing geometry, containing nonlinear medium. The extension and enhancement of the coherent VUV, EUV, X-ray emission to high photon energies relies on using VUV-UV-VIS lasers of shorter wavelength. This leads to enhancement of macroscopic phase matching parameters due to stronger contribution of linear and nonlinear dispersion of both atoms and ions, combined with a strong microscopic single-atom yield.
Generation of VUV, EUV, and X-ray Light Using VUV-UV-VIS Lasers
A method for extending and enhancing bright coherent high-order harmonic generation into the VUV-EUV-X-ray regions of the spectrum involves a way of accomplishing phase matching or effective phase matching of extreme upconversion of laser light at high conversion efficiency, approaching 10.sup.3 in some spectral regions, and at significantly higher photon energies in a waveguide geometry, in a self-guiding geometry, a gas cell, or a loosely focusing geometry, containing nonlinear medium. The extension and enhancement of the coherent VUV, EUV, X-ray emission to high photon energies relies on using VUV-UV-VIS lasers of shorter wavelength. This leads to enhancement of macroscopic phase matching parameters due to stronger contribution of linear and nonlinear dispersion of both atoms and ions, combined with a strong microscopic single-atom yield.
Modular rack system
A containerized data center modular rack system configured to mount electronic equipment and associated accessories is disclosed. A data center modular rack system may include a container structure with a floor and a ceiling configured to house a modular rack system. Further, a plurality of bottom anchor assemblies is disposed in the floor and a plurality of top anchor assemblies is disposed in the ceiling of the container structure. A plurality of modular supports is included; each having an upper end, a lower end, and a plurality of openings configured to mount electronic equipment and associated accessories. Each of the lower and upper ends of the plurality of modular supports is configured to be removably secured to the plurality of bottom and top anchor assemblies disposed in the ceiling of the container structure.
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.