A measurement system including an imaging device and a plasma processing device having a plasma generator configured to generate plasma from a gas supplied into a processing chamber and a controller. The imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber, and the controller is configured to convert the generated optical information of the plasma into a plasma parameter that determines physical characteristics of the plasma with reference to a storage that stores correlation information between the optical information of the plasma and measurement results of the plasma parameter.

A cold plasma accessory having a hand piece having within in it flexible tubing, wiring, a PCB board connected to the wiring, and a conductive connector tube electrically connected to the PCB board, the conductive connector tube having an inner channel, a rigid tube extending from the distal end of the hand piece, and an electrode within the rigid tube. The electrode comprises a conductive connector having a contact surface contacting the conductive connector tube, a distal end surface facing away from the conductive connector tube, and a channel extending through a center of the conductive connector, the channel being fluidly connected to the flexible tubing, the distal end surface of the conductive connector being outside of the channel in the conductive connector, and a conductive wire connected to the distal end surface of the conductive connector.

Disclosed is an abnormality determination system for plasma treatment, including: a plasma treatment apparatus capable of treating, based on a recipe, a plurality of workpieces at a time; a sensor that obtains at least one monitoring data relating to the workpieces and the plasma treatment apparatus that is performing plasma treatment; a storage unit that stores a threshold that is set according to a first treatment mode including the number and the type of the workpieces; and a determination unit that determines, based on the monitoring data and the threshold, whether or not there is an abnormality in the plasma treatment.

In one embodiment, systems and methods include using a Langmuir probe to measure a plasma. The Langmuir probe comprises a housing, wherein the housing comprises an outer diameter and an inner diameter, wherein the inner diameter defines an internal cavity. The Langmuir probe further comprises a plurality of bodies, wherein the plurality of bodies is disposed at least partially within the inner cavity, wherein each of the plurality of bodies comprise a set of internal cavities. The Langmuir probe further comprises a plurality of double Langmuir probes disposed each set of the internal cavities.

A power generator is described that provides at least one of electrical and thermal power comprising (i) at least one reaction cell for reactions involving atomic hydrogen hydrogen products identifiable by unique analytical and spectroscopic signatures, (ii) a molten metal injection system comprising at least one pump such as an electromagnetic pump that provides a molten metal stream to the reaction cell and at least one reservoir that receives the molten metal stream, and (iii) an ignition system comprising an electrical power source that provides low-voltage, high-current electrical energy to the at least one steam of molten metal to ignite a plasma to initiate rapid kinetics of the reaction and an energy gain. In some embodiments, the power generator may comprise: (v) a source of H.sub.2 and O.sub.2 supplied to the plasma, (vi) a molten metal recovery system, and (vii) a power converter capable of (a) converting the high-power light output from a blackbody radiator of the cell into electricity using concentrator thermophotovoltaic cells or (b) converting the energetic plasma into electricity using a magnetohydrodynamic converter.

This plasma processing apparatus includes a processing container that defines a plasma processing space, a holder that holds a substrate to be processed, a gas supply unit that supplies gas into the plasma processing space, an antenna that radiates microwaves to the plasma processing space, a coaxial waveguide that supplies the microwaves to the antenna, a plurality of stubs that regulate distribution of the microwaves radiated from the antenna according to an insertion amount, a measuring unit that measures density of the plasma generated in the plasma processing space by the microwaves radiated from the antenna or a parameter having a correlation with the density of the plasma along a circumferential direction of the substrate to be processed, and a controller that individually controls an insertion amount of each of the plurality of stubs based on the density of the plasma or the parameter.

The present invention relates to a method for measuring the ion nonextensive parameter of plasma includes the following steps: describe the plasma with nonextensive statistical mechanics, obtain the equation describing the relationship between the geodesic acoustic mode frequency and the ion acoustic speed of plasma; collect the measurement data of the geodesic acoustic mode frequencies and plasma temperature in the device where the plasma is to be measured; the obtained equation describing the relationship between the geodesic acoustic mode frequency and the ion acoustic speed of plasma is used to linearly fit the collected measured data of the geodesic acoustic mode frequency and the plasma temperature in the device where the plasma is to be measured to obtain the slope value; based on the derived equation and the obtained slope values, and combining with the safety factor of the device where the plasma is to be measured, the ion nonextensive parameter is solved numerically. The present invention fills the gap where the electron nonextensive parameter can be measured with the nonextensive single electric probe, but the corresponding ion nonextensive parameter cannot be diagnosed yet in the field of nonextensive parameters diagnosis.

A system for surface treatment of a cylindric workpiece using an atmospheric pressure plasma generator according to an embodiment of the present disclosure includes a rotary plasma generator including a nozzle from which plasma is discharged, and a body to and from which the nozzle is attached and detached, and a plasma beam guide tap attached to one side of the nozzle about a rotation axis of the nozzle, in which the plasma beam guide tap is configured to discharge a plasma beam to at least a portion of a side of the workpiece while a rotation axis of the rotary plasma generator is aligned with a central axis of the cylindric workpiece.

Examples of a system for generating and confining a compact toroid are disclosed. The system comprises a plasma generator for generating magnetized plasma, a flux conserver for receiving the compact toroid, a power source for providing current pulse and a controller for actively controlling a current profile of the pulse to keep plasma's q-profile within pre-determined range. Examples of methods of controlling a magnetic lifetime of a magnetized plasma by controlling a current profile of the current pulse are disclosed.

A plasma generation system capable of more accurately measuring the actual temperature of a plasma gas applied to a target object. The plasma generation system includes: an emitting head configured to generate plasma gas by supplying power to electrodes provided in a reaction chamber to generate a plasma gas by converting a processing gas into plasma, and apply the generated plasma gas to a target object; and a temperature sensor configured to detect a temperature of the plasma gas and output a detection signal corresponding to the detected temperature. The temperature sensor is arranged at a position separated from an emission port of the emitting head from which the plasma gas is emitted. The emitting head is configured to be movable between the target object the temperature sensor.