A system for treating and/or preventing a viral, bacterial and/or fungal infection in the oral cavity and/or along the respiratory tract, in particular the interior of the nose, throat, trachea and/or lungs, of a patient by reactive species generated by plasma as well as a plasma for such use is disclosed. The system comprises a plasma source generating reactive species in a gas, the plasma source being configured to be located outside a body of the patient, and a species directing member forming at least one duct for guiding at least a part of the reactive species generated by the plasma source into the oral cavity and/or the respiratory tract.

The present invention discloses a magnetic probe device. The magnetic probe device includes a magnetic probe body and a signal processing circuit, and an output end of the magnetic probe body is connected with an input end of the signal processing circuit; the signal processing circuit includes a first capacitor, a second capacitor, a Faraday shield and a step-up transformer, and the Faraday shield is fixedly arranged between a primary winding and a secondary winding of the step-up transformer; a center tap is arranged at the primary winding of the step-up transformer, and the center tap is grounded; and a first end of the primary winding is in series connection with the first capacitor, and a second end of the primary winding is in series connection with the second capacitor. The magnetic probe device provided by the present invention can improve the signal-to-noise ratio of a magnetic probe and the measurement accuracy of the magnetic field in plasma.

A plasma processing method according to an exemplary embodiment includes applying a first direct-current voltage to a lower electrode of a substrate support provided in a chamber of a plasma processing apparatus, in a first period during generation of plasma in the chamber. The plasma processing method further includes applying a second direct-current voltage to the lower electrode in a second period different from the first period during generation of plasma in the chamber. The second direct-current voltage has a level different from a level of the first direct-current voltage. The second direct-current voltage has a same polarity as a polarity of the first direct-current voltage.

Systems and methods that facilitate non-pertubative measurements of low and null magnetic field in high temperature plasmas.

Disclosed is a system and method for delivering reactive species from a plasma to a treatment area by scanning a linear array of stacked plasma elements across the treatment area. Reactive species output from each plasma element is calibrated, and during scanning each plasma element is modulated with a uniformity modulation and a dose modulation, enabling a predetermined contour dose distribution of reactive species to be delivered to the treatment area.

An apparatus for monitoring a plasma process may include an electro-optical (EO) sensor module and an optical guide, the EO sensor module may be arranged in a plasma chamber configured to perform a semiconductor process for processing a substrate using plasma, the EO sensor module may include a non-conductive material having an optical refractive index changed by an electric field formed in the plasma chamber, the optical guide may form at least one internal path of a light, which may have an optical characteristic changed by the changed optical refractive index, between the EO sensor module and the plasma chamber.

A probe for measuring plasma parameters by means of active plasma resonance spectroscopy comprises an external coupling, a balun, an internal coupling, and a probe head. It is provided that the couplings, the balun, and the probe head are integrated in an electrically-insulating substrate cylinder, and the substrate cylinder has a layered structure made from multiple substrate layers along its rotational axis. In this way, a probe for measuring plasma parameters is provided which enables an improved measurement of the plasma parameters, wherein the plasma is influenced as little as possible during the measurement of the plasma parameters.

A system for reducing plasma instability is disclosed. The system includes: an outer electrode having a first end and a second end spaced from the first end; and an inner electrode disposed inside of a void defined within the outer electrode and arranged coaxial with the outer electrode. The inner electrode includes: a base end defined by the first end of the outer electrode; and an apical end spaced from the base end. The system includes a fiber injector configured to inject a frozen fiber into the void from the apical end of the inner electrode; an electrode power source configured to energize the outer electrode and the inner electrode, and thereby, cause a plasma contained within the outer electrode to flow axially along the frozen fiber; and a frozen fiber power source configured to drive an electrical pulse to the frozen fiber.

A system for reducing plasma instability is disclosed. The system includes: an outer electrode having a first end and a second end spaced from the first end; and an inner electrode disposed inside of a void defined within the outer electrode and arranged coaxial with the outer electrode. The inner electrode includes: a base end defined by the first end of the outer electrode; and an apical end spaced from the base end. The system includes a fiber injector configured to inject a frozen fiber into the void from the apical end of the inner electrode; an electrode power source configured to energize the outer electrode and the inner electrode, and thereby, cause a plasma contained within the outer electrode to flow axially along the frozen fiber; and a frozen fiber power source configured to drive an electrical pulse to the frozen fiber.

Adjustable distal tips of cold plasma generating devices configured for introduction to and operation within narrow intra-body confines. In some embodiments, a plasma delivery tip of a cold plasma generating device is expandable from a compact delivery configuration, allowing device operation with plasma plume parameters difficult to achieve within size constraints of a narrow delivery catheter and/or endoscope working channel. Additionally or alternatively, in some embodiments, operating parameters of a plasma delivery tip are adjustable to tune characteristics of the plasma plume. Adjustable parameters optionally include, for example: lumen diameter, lumen aperture shape/direction, discharge electrode geometry, dielectric barrier characteristics, and/or relative placement of these components, including placement relative to a stream of ionizing gas. In some embodiments, plasma delivery tip elements are adapted to assist device navigation and/or tissue penetration.