An electrode embedded ceramic structure includes: a first ceramic layer; an electrode layer formed on the first ceramic layer; and a second ceramic layer covering the first ceramic layer and the electrode layer, the second ceramic layer being thinner than the first ceramic layer. In a cross section of the first ceramic layer, the electrode layer, and the second ceramic layer along a laminating direction in this electrode embedded ceramic structure, T1 and T2 satisfy Equation (T2−T1)/T2≤0.15, where T1 denotes a least thickness in the second ceramic layer, and T2 denotes an average thickness of the second ceramic layer.

Disclosed herein is a multi-channel device for detecting plasma at an ultra-fast speed, including: a first antenna module connected to a first output terminal in contact with a substrate on a chuck of a process chamber and extending to ground, and receiving a first leakage current leaking through the substrate to increase reception sensitivity of the leakage current; a first current detection module detecting the first leakage current; a current measurement module receiving the first leakage current output from the first current detection module, and extracting the received first leakage current for each predetermined period to generate a first leakage current measurement information; and a control module comparing the first leakage current measurement information with a reference value to generate first arcing occurrence information.

A method for measuring an electron nonextensive parameter of a plasma by using nonextensive statistical mechanics and electric probe is provided. The plasma is described by the nonextensive statistical mechanics and establishes a nonextensive single electric probe theory on the basis of this. The electron nonextensive parameter have been measured which cannot be measured by traditional single probe, and obtained more accurate electron temperature, plasma potential, electron density and floating potential than traditional single probe. The nonextensive electric probe plays a role in plasma diagnosis, which will measure the nonextensivity of plasma and improve the diagnostic accuracy of other plasma parameters.

There is provided a technique that includes: imaging a gas supply hole configured to supply a plasma-converted gas into a process chamber by using an imaging device disposed in the process chamber; detecting a plasma emission intensity based on an image of the imaged gas supply hole; and determining at least one of whether abnormal plasma discharge has occurred and whether plasma flickering has occurred based on the detected plasma emission intensity.

A data collection system includes: a first substrate processing apparatus having a first processing space, a second substrate processing apparatus having a second processing space, and a data collection apparatus connected to the first substrate processing apparatus and the second substrate processing apparatus. The data collection apparatus is configured to compare observed data observed when substrates having the same or similar shapes are processed under the same processing conditions in the first processing space and the second processing space, respectively, and calculate a correction amount for correcting the observed data observed when being processed in the second processing space, and correct the observed data observed when being processed in the second processing space based on the correction amount, and collect corrected observed data, when searching for a processing condition by processing substrates while changing the processing condition in the second processing space.

This disclosure relates to systems and methods detecting a change in pressure, wall shear flow, or both. The method includes generating DC plasma having an electrical field based on an input DC voltage and a DC current, detecting changes to the electrical field, and identifying a change in wall shear flow, pressure, or both based on the change in the electrical field when the DC plasma is disposed in a flow field.

A underwater plasma generating apparatus according to an embodiment of the present invention includes: a reactor inside of which a flow path, through which a working fluid passes, is formed along a length direction; and a dielectric insertion which is disposed on the flow path, partitions the flow path into a plurality of spaces, has therein one or more through holes for connecting the plurality of spaces and having a smaller cross-sectional width compared to the flow path, and has on one side, a metal catalyst coming into contact with the working fluid which has flowed in through the through holes.

An ignition apparatus is provided which ignites a mixture of air and fuel gas by plasma to generate an initial flame. The apparatus includes: a spark plug that includes an inner conductor, a cylindrical outer conductor that holds the inner conductor thereinside, and a dielectric that is provided between the inner conductor and the outer conductor, and that generates plasma in a plasma formation space between the inner conductor and the outer conductor; an electromagnetic wave power supply that generates an electromagnetic wave to apply electromagnetic wave power to the spark plug; an evaluation section that evaluates a state of formation of the plasma; a determination section that determines a matching object of the electromagnetic wave based on an evaluation result by the evaluation section; and a coupled state control section that controls a matching condition of the electromagnetic wave so that the electromagnetic wave matches the matching object.

Plasma processing apparatus and associated methods for detecting air leak are provided. In one example implementation, the plasma processing apparatus can include a processing chamber to process a workpiece, a plasma chamber separated from the processing chamber by a separation grid, and an inductive coupling element to induce an oxygen plasma using a process gas in the plasma chamber. The plasma processing apparatus can detect afterglow emission strength from reaction between nitric oxide (NO) and oxygen radical(s) in a process space downstream to an oxygen plasma to measure nitrogen concentrations due to presence of air leak.

A probe for measuring plasma parameters by means of active plasma resonance spectroscopy comprises an external coupling, a balun, an internal coupling, and a probe head. It is provided that the couplings, the balun, and the probe head are integrated in an electrically-insulating substrate cylinder, and the substrate cylinder has a layered structure made from multiple substrate layers along its rotational axis. In this way, a probe for measuring plasma parameters is provided which enables an improved measurement of the plasma parameters, wherein the plasma is influenced as little as possible during the measurement of the plasma parameters.