Patent classifications
H05H3/00
PRODUCTION OF NEUTRAL BEAMS OF HIGHLY SPIN-POLARIZED HYDROGEN ISOTOPES FROM MOLECULAR PHOTODISSOCIATION
A method for producing a neutral beam of spin polarized Hydrogen isotopes by photodissociating compound molecules is provided. Each compound molecule comprises a Hydrogen isotope and a second element. A molecular beam is generated by passing the compound molecules through a nozzle. The molecular beam is introduced into a photodissociation chamber. The molecular beam is photodissociated into spin polarized Hydrogen isotopes and second elements by intersecting the molecular beam with a circularly polarized photolysis laser beam. The spin polarized Hydrogen isotopes are guided, accelerated, and neutralized. A photodissociation system for producing a neutral beam of spin polarized Hydrogen isotopes by photodissociating compound molecules and a nuclear reactor system are also provided.
MODERATOR FOR MODERATING NEUTRONS
Disclosed is a moderator for moderating neutrons, including a substrate and a surface treatment layer or a dry inert gas layer or a vacuum layer coated on the surface of the substrate, wherein the substrate is prepared from a moderating material by a powder sintering device through a powder sintering process from powders or by compacting powders into a block, and the moderating material includes 40% to 100% by weight of aluminum fluoride; wherein the surface treatment layer is a hydrophobic material; and the surface treatment layer or the dry inert gas layer or the vacuum layer is used for isolating the substrate from the water in the environment in which the substrate is placed. The surface treated moderator can avoid the hygroscopic or deliquescence of the moderating material during use, improve the quality of the neutron source and prolong the service life.
QUANTUM SIMULATOR AND QUANTUM SIMULATION METHOD
A quantum simulator includes a pseudo speckle pattern generator, a main vacuum chamber, an atomic gas supply unit, a light beam generator, a photodetector, and an atom number detector. The pseudo speckle pattern generator generates a pseudo speckle pattern in the inside of the main vacuum chamber by light allowed to enter the inside of the main vacuum chamber through the second window. The pseudo speckle pattern generator includes a controller, a light source, a beam expander, a spatial light modulator, and a lens. The controller sets a modulation distribution of the spatial light modulator based on a two-dimensional pseudo random number pattern.
QUANTUM SIMULATOR AND QUANTUM SIMULATION METHOD
A quantum simulator includes a pseudo speckle pattern generator, a main vacuum chamber, an atomic gas supply unit, a light beam generator, a photodetector, and an atom number detector. The pseudo speckle pattern generator generates a pseudo speckle pattern in the inside of the main vacuum chamber by light allowed to enter the inside of the main vacuum chamber through the second window. The pseudo speckle pattern generator includes a controller, a light source, a beam expander, a spatial light modulator, and a lens. The controller sets a modulation distribution of the spatial light modulator based on a two-dimensional pseudo random number pattern.
METHOD AND SYSTEM FOR STRESS TESTING OF MATERIALS
A system and method for stress testing a sample, the system comprising a high-intensity laser unit and a target for laser-matter interaction, wherein the high-intensity laser unit delivers an intensity of at least 10.sup.13 W/cm.sup.2 on the target, and resulting laser-accelerated particles generated by the target irradiate the sample.
METHOD AND SYSTEM FOR STRESS TESTING OF MATERIALS
A system and method for stress testing a sample, the system comprising a high-intensity laser unit and a target for laser-matter interaction, wherein the high-intensity laser unit delivers an intensity of at least 10.sup.13 W/cm.sup.2 on the target, and resulting laser-accelerated particles generated by the target irradiate the sample.
Quantum simulator and quantum simulation method
A quantum simulator includes a pseudo speckle pattern generator, a main vacuum chamber, an atomic gas supply unit, a light beam generator, a photodetector, and an atom number detector. The pseudo speckle pattern generator generates a pseudo speckle pattern in the inside of the main vacuum chamber by light allowed to enter the inside of the main vacuum chamber through the second window. The pseudo speckle pattern generator includes a controller, a light source, a beam expander, a spatial light modulator, and a lens. The controller sets a modulation distribution of the spatial light modultor based on a two-dimensional pseudo random number pattern.
Quantum simulator and quantum simulation method
A quantum simulator includes a pseudo speckle pattern generator, a main vacuum chamber, an atomic gas supply unit, a light beam generator, a photodetector, and an atom number detector. The pseudo speckle pattern generator generates a pseudo speckle pattern in the inside of the main vacuum chamber by light allowed to enter the inside of the main vacuum chamber through the second window. The pseudo speckle pattern generator includes a controller, a light source, a beam expander, a spatial light modulator, and a lens. The controller sets a modulation distribution of the spatial light modultor based on a two-dimensional pseudo random number pattern.
Apparatus and methods for generating electromagnetic radiation
An apparatus includes at least one conductive layer, an electromagnetic (EM) wave source, and an electron source. The conductive layer has a thickness less than 5 nm. The electromagnetic (EM) wave source is in electromagnetic communication with the at least one conductive layer and transmits a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field near a surface of the at least one conductive layer. The electron source propagates an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength less than the first wavelength.
Transition radiation light sources
Transition radiation from nanotubes, nanosheets, and nanoparticles and in particular, boron nitride nanomaterials, can be utilized for the generation of light. Wavelengths of light of interest for microchip lithography, including 13.5 nm (91.8 eV) and 6.7 nm (185 eV), can be generated at useful intensities, by transition radiation light sources. Light useful for monitoring relativistic charged particle beam characteristics such as spatial distribution and intensity can be generated.