Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point.

A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions.

Metallic bodies are provided having a lithium layer and a metallic substrate. The metallic bodies can exhibit increased resistance to radiation-induced deformations such as blistering. Methods are provided for transitioning the metallic bodies into more blister resistant configurations, as our methods for diminishing or eliminating blisters previously formed. Systems for utilizing the metallic bodies and methods are also disclosed.

A composite beam apparatus includes an electron beam column for irradiating an electron beam onto a sample, a focused ion beam column for irradiating a focused ion beam onto the sample to form a cross section, and a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column for irradiating a neutral particle beam onto the sample to perform finish processing of the cross section. The electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point. A controller controls the electron beam column to irradiate and scan the electron beam on the sample during cross section processing by the focused ion beam column and during finish processing by the neutral particle beam column. The composite beam apparatus is capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column, when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam.

A composite beam apparatus includes an electron beam column for irradiating an electron beam onto a sample, a focused ion beam column for irradiating a focused ion beam onto the sample to form a cross section, and a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column for irradiating a neutral particle beam onto the sample to perform finish processing of the cross section. The electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point. A controller controls the electron beam column to irradiate and scan the electron beam on the sample during cross section processing by the focused ion beam column and during finish processing by the neutral particle beam column. The composite beam apparatus is capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column, when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam.

Disclosed is an improved method of manufacturing cooled accelerator grid with full penetration weld configuration. In a preferred form, the method includes the steps of: machining a plurality of stubs, a first and a second end of a plurality of inconel pipes; welding the stubs with the first end of the inconel pipes forming a water connector assembly; machining of a base plate; welding the base plate with the water connector assembly; machining the base plate welded with the water connector assembly, wherein machining further comprises milling of plurality of cooling channels across angled plane of the base plate welded with the water connector assembly; closing of plurality of cooling channels located on the base plate welded with the water connector assembly; and welding each of plurality of external hydraulic circuits with the second end of each of the plurality of inconel pipes.

Ultra-cold atom sensor for measuring a rotational velocity along a measurement axis comprises: means designed to generate a first and a second ultra-cold atom trap, one trap making it possible to immobilize a cloud of ultra-cold atoms in an internal state different from the other trap, at a predetermined distance from the measurement plane, the means comprising, at least one first and one second waveguide that are designed to propagate microwaves with angular frequencies .sub.a and .sub.b, the waveguides being non-secant and positioned symmetrically about an axis called the axis of symmetry, conductive wires integrated into the chip and designed to be flowed through by DC currents, the means being configured to modify the energy of the ultra-cold atoms in such a way as to create a potential minimum for the ultra-cold atoms in the internal state |a> and a potential minimum for the ultra-cold atoms in the internal state |b>, thus forming the first and second ultra-cold atom traps, and to move the traps along a closed path, traveled in one direction by the ultra-cold atoms of the first trap and in the opposite direction by the ultra-cold atoms of the second trap.

Ultra-cold atom sensor for measuring a rotational velocity along a measurement axis comprises: means designed to generate a first and a second ultra-cold atom trap, one trap making it possible to immobilize a cloud of ultra-cold atoms in an internal state different from the other trap, at a predetermined distance from the measurement plane, the means comprising, at least one first and one second waveguide that are designed to propagate microwaves with angular frequencies .sub.a and .sub.b, the waveguides being non-secant and positioned symmetrically about an axis called the axis of symmetry, conductive wires integrated into the chip and designed to be flowed through by DC currents, the means being configured to modify the energy of the ultra-cold atoms in such a way as to create a potential minimum for the ultra-cold atoms in the internal state |a> and a potential minimum for the ultra-cold atoms in the internal state |b>, thus forming the first and second ultra-cold atom traps, and to move the traps along a closed path, traveled in one direction by the ultra-cold atoms of the first trap and in the opposite direction by the ultra-cold atoms of the second trap.

A quantum simulator includes a pseudo speckle pattern generator, a main vacuum chamber, an atomic gas supply unit, a light beam generator, a photodetector, and an atom number detector. The pseudo speckle pattern generator generates a pseudo speckle pattern in the inside of the main vacuum chamber by light allowed to enter the inside of the main vacuum chamber through the second window. The pseudo speckle pattern generator includes a controller, a light source, a beam expander, a spatial light modulator, and a lens. The controller sets a modulation distribution of the spatial light modultor based on a two-dimensional pseudo random number pattern.

The invention provides pneumatic shuttering of a focused or collimated aerosol particle stream. The aerosol stream can be collimated by an annular sheath of inert or non-inert gas. The apparatus propagates a sheathed aerosol stream through a series of aerodynamic lenses along the axis of a flow cell. The final lens is typically positioned above a substrate, so that direct material deposition is provided. A substantially perpendicularly-flowing gas external to the aerodynamic lens system is used to redirect the particle stream away from the flow axis and through an exhaust port, thereby shuttering the collimated aerosol stream. The pneumatic shutter enables printing of discreet structures, with on/off shuttering times of approximately 1 to 100 milliseconds.