Amorphous multi-component metallic films can be used to improve the performance of electronic devices such as resistors, diodes, and thin film transistors. An amorphous hot electron transistor (HET) having co-planar emitter and base electrodes provides electrical properties and performance advantages over existing vertical HET structures. Emitter and the base terminals of the transistor are both formed in an upper crystalline metal layer of an amorphous nonlinear resistor. The emitter and the base are adjacent to one another and spaced apart by a gap. The presence of the gap results in two-way Fowler-Nordheim tunneling between the crystalline metal layer and the amorphous metal layer, and symmetric I-V performance. Meanwhile, forming the emitter and base terminals in the same layer simplifies the HET fabrication process by reducing the number of patterning steps.

A nanoparticle includes a cuboid base including a semiconductor material, and a plurality of surfaces formed on the base and including a plurality of functionalities, respectively.

Disclosed is a method for the manufacture of a CEM device comprising forming a thin film of a correlated electron material having a predetermined electrical impedance when the CEM device in its relatively conductive (low impedance) state, wherein the forming of the CEM thin film comprises forming a d- or f-block metal or metal compound doped by a physical or chemical vapour deposition with a predetermined amount of a dopant comprising a back-donating ligand for the metal.

A functional contactor is provided. Provided according to an exemplary embodiment of the present invention is a functional contactor comprising: a conductor which has elasticity and comes into contact with a conductor of an electronic device; a functional element which is connected to the conductor having elasticity and has a first and a second electrode respectively disposed on at least a part of an upper and a lower surface thereof; and a solder through which a lower surface of the conductor having elasticity is coupled with the first electrode of the functional element. The first electrode includes a first part outwardly extending from the lower surface of the conductor having elasticity along one side surface of the conductor having elasticity, and the solder includes an exposure part formed between the first part and a partial lateral surface of the one side surface of the conductor having elasticity.

The present application relates to a fabrication method for a double-sided capacitor. The fabrication method for the double-sided capacitor includes the following steps: providing a substrate; forming a stack structure on the substrate; forming a capacitor hole in a direction perpendicular to the substrate to penetrate the stack structure, wherein the stack structure includes sacrificial layers and supporting layers alternately stacked; forming an auxiliary layer to cover the sidewall of the capacitor hole; forming a first electrode layer to cover the surface of the auxiliary layer; removing a part of the supporting layer on the top of the stack structure; removing the sacrificial layers and the auxiliary layer simultaneously along the opening; and forming a dielectric layer covering the surface of the first electrode layer and a second electrode layer covering the surface of the dielectric layer, wherein the gap is at least filled with the dielectric layer.

The present application relates to a fabrication method for a double-sided capacitor. The fabrication method for the double-sided capacitor includes the following steps: providing a substrate; forming a stack structure on the substrate; forming a capacitor hole in a direction perpendicular to the substrate to penetrate the stack structure, wherein the stack structure includes sacrificial layers and supporting layers alternately stacked; forming an auxiliary layer to cover the sidewall of the capacitor hole; forming a first electrode layer to cover the surface of the auxiliary layer; removing a part of the supporting layer on the top of the stack structure; removing the sacrificial layers and the auxiliary layer simultaneously along the opening; and forming a dielectric layer covering the surface of the first electrode layer and a second electrode layer covering the surface of the dielectric layer, wherein the gap is at least filled with the dielectric layer.

A neuron circuit includes: an input terminal to which spike signals are continuously input; a first switch element that has a first end coupled to the input terminal and a second end coupled to a node, remains in a high resistance state even when a single spike signal is input, and goes into a low resistance state when spike signals are input within a time period; a feedback circuit coupled to the node, and causing the input terminal to be at a level when the first switch element goes into the low resistance state; and a second switch element that is connected in series with the first switch element between the input terminal and the node, remains in a low resistance state even when spike signals are input to the input terminal, and goes into a high resistance state when the input terminal becomes at the level.

A nanoparticle includes a cuboid base including a semiconductor material, and a plurality of surfaces formed on the base and including a plurality of functionalities, respectively.

Amorphous multi-component metallic films can be used to improve the performance of electronic devices such as resistors, diodes, and thin film transistors. An amorphous hot electron transistor (HET) having co-planar emitter and base electrodes provides electrical properties and performance advantages over existing vertical HET structures. Emitter and the base terminals of the transistor are both formed in an upper crystalline metal layer of an amorphous nonlinear resistor. The emitter and the base are adjacent to one another and spaced apart by a gap. The presence of the gap results in two-way Fowler-Nordheim tunneling between the crystalline metal layer and the amorphous metal layer, and symmetric I-V performance. Meanwhile, forming the emitter and base terminals in the same layer simplifies the HET fabrication process by reducing the number of patterning steps.

A functional contactor is provided. A functional contactor according to an exemplary embodiment of the present invention comprises; a clip-shaped conductor having elasticity which is in electrical contact with a conductor of an electronic device; a functional element which is electrically connected to the clip-shaped conductor in series via a solder and comprises a first electrode and a second electrode respectively provided on the entire upper and lower surfaces thereof; and an arrangement guide which is formed to surround at least a part of the clip-shaped conductor on the upper surface of the functional element so as to arrange the position of the clip-shaped conductor and is made of nonconductive resin.