The present technique presents a structured packing module 100 for a gas phase reactor 2, the structured packing module 100 comprising a structured packing 1 having a central axis 5x extending along a longitudinal direction, and may further comprise an inner tube 5 extending coaxially with the structured packing and along the longitudinal direction. The structured packing 1 includes a plurality of corrugated sheets 10, 20, 30, each arranged circumferentially around the central axis 5x and having a first end 101 and a second end 102 spaced apart from each other along the longitudinal direction. Each corrugated sheet 10, 20, 30 includes corrugations 9 extending between the first end 101 and the second end 102 and disposed at an acute angle A greater than or equal to 5 degree and less than or equal to 30 degree with respect to a line 5y parallel to the central axis 5x. The corrugated sheets 10, 20, 30 are arranged to radially overlap with each other such that the corrugations 9 of adjacently disposed corrugated sheets 10, 20, 30 are arranged in a crisscross relationship. The structured packing module 100 includes a gas flow path 40 comprising at least one inter-sheet gas flow path 42 defined between the adjacently disposed corrugated sheets 10, 20, 30.

Structured catalyst arranged for catalyzing an endothermic reaction of a feed gas, said structured catalyst comprising a macroscopic structure of electrically conductive material, said macroscopic structure supporting a ceramic coating, wherein said ceramic coating supports a catalytically active material, wherein the electrically conductive material at least partly is a composite in the form of a homogenous mixture of an electrically conductive metallic material and a ceramic material, wherein the macroscopic structure at least partly is composed of two or more materials with different resistivities.

Various embodiments of the present invention are directed towards a system and method relating to depositing vapor in a sample. For example, a device includes a vapor source chamber configured to contain a vapor source material to generate vapor. An activation chamber is configured to contain a sample. The activation chamber is in fluid communication with the vapor source chamber to receive the vapor. A permeable separator divides the vapor source chamber and the activation chamber, and isolates the sample in the activation chamber while allowing vapor to pass between the vapor source chamber and the activation chamber. The device is sealable and configured to apply vacuum to the vapor and sample, to cause deposition of the vapor into the pumice stone samples.

Various embodiments of the present invention are directed towards a system and method relating to depositing vapor in a sample. For example, a device includes a vapor source chamber configured to contain a vapor source material to generate vapor. An activation chamber is configured to contain a sample. The activation chamber is in fluid communication with the vapor source chamber to receive the vapor. A permeable separator divides the vapor source chamber and the activation chamber, and isolates the sample in the activation chamber while allowing vapor to pass between the vapor source chamber and the activation chamber. The device is sealable and configured to apply vacuum to the vapor and sample, to cause deposition of the vapor into the pumice stone samples.

Various embodiments of the present invention are directed towards a system and method relating to depositing vapor in a sample. For example, a device includes a vapor source chamber configured to contain a vapor source material to generate vapor. An activation chamber is configured to contain a sample. The activation chamber is in fluid communication with the vapor source chamber to receive the vapor. A permeable separator divides the vapor source chamber and the activation chamber, and isolates the sample in the activation chamber while allowing vapor to pass between the vapor source chamber and the activation chamber. The device is sealable and configured to apply vacuum to the vapor and sample, to cause deposition of the vapor into the pumice stone samples.

Various embodiments of the present invention are directed towards a system and method relating to depositing vapor in a sample. For example, a device includes a vapor source chamber configured to contain a vapor source material to generate vapor. An activation chamber is configured to contain a sample. The activation chamber is in fluid communication with the vapor source chamber to receive the vapor. A permeable separator divides the vapor source chamber and the activation chamber, and isolates the sample in the activation chamber while allowing vapor to pass between the vapor source chamber and the activation chamber. The device is sealable and configured to apply vacuum to the vapor and sample, to cause deposition of the vapor into the pumice stone samples.

A steam methane reformer (SMR) system includes an outer tube, wherein a first end of the outer tube is closed; an inner tube disposed in the outer tube, wherein a first end of the inner tube is open. A flow channel is defined within the inner tube and an annular space is defined between the outer tube and the inner tube, the flow channel being in fluid communication with the annular space. The SMR system includes a catalytic foam disposed in the annular space between the outer tube and the inner tube, the catalytic foam comprising a catalyst.

A steam methane reformer (SMR) system includes an outer tube, wherein a first end of the outer tube is closed; an inner tube disposed in the outer tube, wherein a first end of the inner tube is open. A flow channel is defined within the inner tube and an annular space is defined between the outer tube and the inner tube, the flow channel being in fluid communication with the annular space. The SMR system includes a catalytic foam disposed in the annular space between the outer tube and the inner tube, the catalytic foam comprising a catalyst.

A method for forming films on particles of powder includes diffusing the powder by leading the powder into a jet nozzle and ejecting a jet flow of the powder; leading the diffused particles of powder, a raw material gas, and a reaction gas activated by atmospheric pressure plasma, into a reaction container, and forming a swirl flow in the container; and forming the films on the diffused particles of powder by reaction of a raw material gas and an activated reaction gas in the container. An apparatus is also disclosed having a reaction container with a peripheral wall having a round section in plan view and a jet nozzle for a powder source, raw material gas, and atmospheric pressure plasma sources are coupled to and enter the container at an angle with a radius thereof thereby forming a swirl flow to form a film on the powder.

A process for treating a material, such as by calcination or reduction processes, is disclosed. The process comprises reacting hydrogen and oxygen in a reaction chamber and producing heat and steam, discharging steam from the reaction chamber, using the heat to treat the material and produce a treated material, and returning at least some of the steam discharged from the reaction chamber to the process. An apparatus is also disclosed.