B22F2999/00

3D PRINTING METHOD AND TOOL

A 3D printing method providing an improved manufacturing process by providing a plurality of layers forming at least a part of the component, wherein the plurality of layers contains at least one first layer part and at least one second layer part, wherein the at least one first layer part and the at least one second layer part have been manufactured with different manufacturing speeds.

3D PRINTING METHOD AND TOOL

A 3D printing method providing an improved manufacturing process by providing a plurality of layers forming at least a part of the component, wherein the plurality of layers contains at least one first layer part and at least one second layer part, wherein the at least one first layer part and the at least one second layer part have been manufactured with different manufacturing speeds.

SCANNING STRATEGY FOR VOLUME SUPPORT IN ADDITIVE MANUFACTURING

A method of additive manufacturing includes a) providing a component geometry with a hole and, b) selectively irradiating a powder bed with an energy beam according to the geometry in a layerwise manner, wherein in layers of the component including the hole, the respective regions which define the hole are irradiated with the energy beam such that a supporting structure is generated in the hole having a lower rigidity than a structure of the component. The supporting structure is used for counteracting stress or distortion during the additive buildup. A computer program product and apparatus correspond to the method.

SCANNING STRATEGY FOR VOLUME SUPPORT IN ADDITIVE MANUFACTURING

A method of additive manufacturing includes a) providing a component geometry with a hole and, b) selectively irradiating a powder bed with an energy beam according to the geometry in a layerwise manner, wherein in layers of the component including the hole, the respective regions which define the hole are irradiated with the energy beam such that a supporting structure is generated in the hole having a lower rigidity than a structure of the component. The supporting structure is used for counteracting stress or distortion during the additive buildup. A computer program product and apparatus correspond to the method.

R-T-B-BASED PERMANENT MAGNET MATERIAL, PREPARATION METHOD THEREFOR AND USE THEREOF
20230051707 · 2023-02-16 ·

Disclosed are an R-T-B-based permanent magnet material, a preparation method therefor and the use thereof. The R-T-B-based permanent magnet material comprises R, B, M, Fe, Co, X and inevitable impurities, wherein: (1) R is a rare earth element, and the R includes at least Nd and RH, M being one or more of Ti, Zr and Nb, and X including Cu, “Al and/or Ga”; and (2) in percentage by weight, R: 30.5-32.0 wt%, B: 0.95-0.99 wt%, M: 0.3-0.6 wt%, X: 0.8-1.8 wt%, and Cu: 0.35-0.50 wt%, and the balance is Fe, Co and inevitable impurities. According to the present invention, under the condition of 0.3-0.6 wt% of a high melting point metal, a permanent magnet material with an excellent magnet performance and a good squareness is obtained.

R-T-B-BASED PERMANENT MAGNET MATERIAL, PREPARATION METHOD THEREFOR AND USE THEREOF
20230051707 · 2023-02-16 ·

Disclosed are an R-T-B-based permanent magnet material, a preparation method therefor and the use thereof. The R-T-B-based permanent magnet material comprises R, B, M, Fe, Co, X and inevitable impurities, wherein: (1) R is a rare earth element, and the R includes at least Nd and RH, M being one or more of Ti, Zr and Nb, and X including Cu, “Al and/or Ga”; and (2) in percentage by weight, R: 30.5-32.0 wt%, B: 0.95-0.99 wt%, M: 0.3-0.6 wt%, X: 0.8-1.8 wt%, and Cu: 0.35-0.50 wt%, and the balance is Fe, Co and inevitable impurities. According to the present invention, under the condition of 0.3-0.6 wt% of a high melting point metal, a permanent magnet material with an excellent magnet performance and a good squareness is obtained.

Method for Producing Sputtering Target Material
20230048285 · 2023-02-16 ·

Provided is a method of producing a target material with reduced particle generation during sputtering, which is a method of producing a sputtering target material whose material is an alloy M, including a sintering step of sintering a mixed powder obtained by mixing a first powder and a second powder. A material of the first powder is an alloy M1 in which the proportion of a B content is from 40 at. % to 60 at. %. A material of the second powder is an alloy M2 in which the proportion of a B content is from 20 at. % to 35 at. %. The proportion of a B content in the mixed powder is from 33 at. % to 50 at. %. A metallographic structure including a (CoFe).sub.2B phase and a (CoFe)B phase is formed in the sintering step. A boundary length per unit area Y (1/μm), which is obtained by measuring a boundary length between the (CoFe).sub.2B phase and the (CoFe)B phase using a scanning electron microscope, and a proportion X (at. %) of a B content of the alloy M satisfy the expression


Y<−0.0015×(X−42.5).sup.2+0.15.

Method for Producing Sputtering Target Material
20230048285 · 2023-02-16 ·

Provided is a method of producing a target material with reduced particle generation during sputtering, which is a method of producing a sputtering target material whose material is an alloy M, including a sintering step of sintering a mixed powder obtained by mixing a first powder and a second powder. A material of the first powder is an alloy M1 in which the proportion of a B content is from 40 at. % to 60 at. %. A material of the second powder is an alloy M2 in which the proportion of a B content is from 20 at. % to 35 at. %. The proportion of a B content in the mixed powder is from 33 at. % to 50 at. %. A metallographic structure including a (CoFe).sub.2B phase and a (CoFe)B phase is formed in the sintering step. A boundary length per unit area Y (1/μm), which is obtained by measuring a boundary length between the (CoFe).sub.2B phase and the (CoFe)B phase using a scanning electron microscope, and a proportion X (at. %) of a B content of the alloy M satisfy the expression


Y<−0.0015×(X−42.5).sup.2+0.15.

SURFACE ROUGHNESS APPLICATION

In an example, a method comprises receiving, at a processor, a digital model representing an object to be produced by additive manufacturing. The method may comprise receiving, at the processor, an indication that a first selected region of a surface of the object is to have a first coating applied after printing. The method may further comprise applying a first predefined surface roughness pattern to the first selected region of the surface of the digital model.

SURFACE ROUGHNESS APPLICATION

In an example, a method comprises receiving, at a processor, a digital model representing an object to be produced by additive manufacturing. The method may comprise receiving, at the processor, an indication that a first selected region of a surface of the object is to have a first coating applied after printing. The method may further comprise applying a first predefined surface roughness pattern to the first selected region of the surface of the digital model.