A magnetic polishing machine includes a container which accommodates a polishing target and a plurality of polishing pieces, a plurality of rotation plates which are rotatably disposed below the container while a magnet is attached to the rotation plate, and a first rotation mechanism which rotates each rotation plate about a rotation axis of the rotation plate. The adjacent rotation plates are disposed at a position in which rotation areas thereof partially overlap each other.

A method for smoothing and polishing metals via ion transport by free solid bodies. The method includes connecting a part to be treated to a pole of a current generator and subjecting the part to friction with a set of particles that includes electrically charged and electrically conductive free solid bodies in a gaseous environment.

The invention relates to a method for the surface processing of a component by flow grinding, comprising the following steps: (a) providing a blank (1), (b) flooding at least one surface of the blank (1) with a fluid carrier material containing grinding particles,
wherein the blank (1) is rounded at positions at which, during flooding, the flow direction (25) of the fluid carrier material containing the grinding particles changes and, at positions at which a flow separation occurs on the finished component, additional material (5) is attached such that a flow separation at the beginning of the flooding operation is prevented.

The present disclosure is directed to a system and method for in-situ (e.g. on-wing) cleaning of gas turbine engine components. The method includes injecting a dry cleaning medium into the gas turbine engine at one or more locations. The dry cleaning medium includes a plurality of abrasive microparticles. Thus, the method also includes circulating the dry cleaning medium through at least a portion of the gas turbine engine such that the abrasive microparticles abrade a surface of the one or more components so as to clean the surface.

In a method of monitoring a vibratory grinding process, parameters from different parameter groups are detected and evaluated to output a command for operating the vibratory grinding system.

Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.

An insert apparatus for protecting a curved inner surface within a passageway from abrasion during an abrasive machining operation is disclosed. In various embodiments, the insert apparatus includes a shield having a shell shaped to match a curved portion of the curved inner surface of the passageway and a shaft having a first end connected to the shell and a second end connected to a member configured to maintain the shaft within the passageway and the shell positioned against the curved inner surface during the abrasive machining operation.

A method for outer surface finishing of a workpiece may include coaxially placing the workpiece inside a vessel. The exemplary vessel may include at least one baffle that may radially extend from an inner wall of the vessel toward the outer surface of the workpiece. The exemplary method may further include pouring an abrasive medium inside the vessel, rotating the abrasive medium about the longitudinal axis in a first direction within the vessel relative to the outer surface of the workpiece by rotating the vessel about the longitudinal axis, and concurrently rotating the workpiece within the vessel about the longitudinal axis in a second direction, the second direction being opposite the first direction.

Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.

A portable golf club cleaning tool apparatus for removing debris from the golf club head, comprised of a bag adapted to be hand-held comprised of a plurality of openings or pores; a plurality of granular particles held in the bag, and where the golf club cleaning tool is adapted to clean debris off the head of the golf club when the golf club cleaning tool is moistened with a liquid and a user scrubs the head of the golf club with the bag as the granular particles seep out of the bag.