The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO.sub.2, 5-15 mol % of Al.sub.2O.sub.3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF.sub.2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index K.sub.H is 2.0 or higher, and a plasma-resistant characteristic of an etch rate of lower than 10 nm/min for a mixed plasma of fluorine and argon (Ar) is exhibited.

The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO.sub.2, 5-15 mol % of Al.sub.2O.sub.3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF.sub.2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index K.sub.H is 2.0 or higher, and a plasma-resistant characteristic of an etch rate of lower than 10 nm/min for a mixed plasma of fluorine and argon (Ar) is exhibited.

An article includes a substrate with two main faces defining two main surfaces separated by edges, the substrate carrying a functional coating deposited over at least a portion of a main surface and a temporary protective layer deposited over at least a portion of the coating. The temporary protective layer has a thickness of at least 1 micrometer. The temporary protective layer made of polyfuran resin is obtained from a liquid composition comprising furfuryl alcohol.

An article includes a substrate with two main faces defining two main surfaces separated by edges, the substrate carrying a functional coating deposited over at least a portion of a main surface and a temporary protective layer deposited over at least a portion of the coating. The temporary protective layer has a thickness of at least 1 micrometer. The temporary protective layer made of polyfuran resin is obtained from a liquid composition comprising furfuryl alcohol.

According to one embodiment, a method for thermally treating glass articles may include holding a glass article at a treatment temperature equal to an annealing temperature of the glass article =15° C. for a holding time greater than or equal to 5 minutes. Thereafter, the glass article may be cooled from the treatment temperature through a strain point of the glass article at a first cooling rate CR1 less than 0° C./min and greater than −20° C./min such that a density of the glass article is greater than or equal to 0.003 g/cc after cooling. The glass article is subsequently cooled from below the strain point at a second cooling rate CR.sub.2, wherein |CR.sub.2|>|CR.sub.1|.

The invention provides a composition for glass, a glass, and a preparation method and application thereof. On an oxide basis, the composition for glass contains 45-64 wt % SiO.sub.2, 16-26 wt % Al.sub.2O.sub.3, 0.1-2 wt % MgO, 10-17 wt % Na.sub.2O, 0.5-15 wt % P.sub.2O.sub.5, and optionally 0-2 wt % TiO.sub.2. The glass prepared from the composition for glass has a higher chemical resistance, a higher strain point, and a higher compressive stress and depth of compressive stress layer formed on the glass surface, and the glass has a higher Young's modulus.

The invention provides a composition for glass, a glass, and a preparation method and application thereof. On an oxide basis, the composition for glass contains 45-64 wt % SiO.sub.2, 16-26 wt % Al.sub.2O.sub.3, 0.1-2 wt % MgO, 10-17 wt % Na.sub.2O, 0.5-15 wt % P.sub.2O.sub.5, and optionally 0-2 wt % TiO.sub.2. The glass prepared from the composition for glass has a higher chemical resistance, a higher strain point, and a higher compressive stress and depth of compressive stress layer formed on the glass surface, and the glass has a higher Young's modulus.

The present invention relates to a high-generation TFT-LCD glass substrate production line. The production line includes a kiln, a large-flow precious metal channel, a tin bath, an annealing kiln, a cutting machine and an unloading machine connected in sequence. The present invention combines high-efficiency melting, clarification and homogenization of molten glass, ultrathin float forming and annealing process technologies of the TFT-LCD glass, which can produce the TFT-LCD glass substrates with large sizes such as 8.5 generations and 10.5/11 generations, which has the advantages of large product size, excellent product performance, coherent process procedures, high production efficiency, high productivity and the like.

The present invention relates to a high-generation TFT-LCD glass substrate production line. The production line includes a kiln, a large-flow precious metal channel, a tin bath, an annealing kiln, a cutting machine and an unloading machine connected in sequence. The present invention combines high-efficiency melting, clarification and homogenization of molten glass, ultrathin float forming and annealing process technologies of the TFT-LCD glass, which can produce the TFT-LCD glass substrates with large sizes such as 8.5 generations and 10.5/11 generations, which has the advantages of large product size, excellent product performance, coherent process procedures, high production efficiency, high productivity and the like.

A method for producing a coated and printed glass panel, includes providing a glass substrate having a metal-containing coating on at least one first surface and a polymeric protective layer arranged on this metal-containing coating, removing the temporary polymeric protective layer and the metal-containing coating only in a predetermined region, applying a ceramic ink in the predetermined region, wherein the removing is carried out with a laser and the polymeric protective layer and the metal-containing coating are intact outside the predetermined region after the removing.