A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##

A binder composition for a secondary battery positive electrode contains a polymer including a nitrile group-containing monomer unit, an aromatic vinyl monomer unit, a hydrophilic group-containing monomer unit, a conjugated diene monomer unit, and a linear alkylene structural unit having a carbon number of 4 or more. The aromatic vinyl monomer unit is included in the polymer in a proportion of not less than 30.0 mass % and not more than 60.0 mass %. The polymer has an iodine value of not less than 60 mg/100 mg and not more than 150 mg/100 mg.

Disclosed is a method and apparatus for using iodinated polymer as an antimicrobial agent to manage the suppression and disinfection of pathogens.

Disclosed is a method and apparatus for using iodinated polymer as an antimicrobial agent to manage the suppression and disinfection of pathogens.

The present invention relates to the field of an aqueous vinyl polymer dispersion PD comprising a hydrophilic vinyl oligomer, a hydrophobic vinyl oligomer and a vinyl polymer obtained by the emulsion polymerization of ethylenically unsaturated monomers from petrochemical or renewable origin. The present invention also relates to a process for making the aqueous vinyl polymer dispersion; to a coating composition comprising said aqueous vinyl polymer dispersion and the method making thereof; to a paint formulation comprising said aqueous vinyl polymer dispersion; and to an article coated with the coating composition or the paint formulation. The coating compositions are especially suitable for decorative and industrial wood applications.

The present invention relates to the field of an aqueous vinyl polymer dispersion PD comprising a hydrophilic vinyl oligomer, a hydrophobic vinyl oligomer and a vinyl polymer obtained by the emulsion polymerization of ethylenically unsaturated monomers from petrochemical or renewable origin. The present invention also relates to a process for making the aqueous vinyl polymer dispersion; to a coating composition comprising said aqueous vinyl polymer dispersion and the method making thereof; to a paint formulation comprising said aqueous vinyl polymer dispersion; and to an article coated with the coating composition or the paint formulation. The coating compositions are especially suitable for decorative and industrial wood applications.

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure.

##STR00001##

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure.

##STR00001##

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure.

##STR00001##