Patent classifications
C08F214/00
TELLURIUM-CONTAINING COMPOUND, POLYMER, AND METHOD FOR PRODUCING POLYMER
Provided are: a tellurium-containing compound represented by Formula (M1); a polymer of a tellurium-containing compound represented by any one of Formulae (M1) to (M3); and a method for producing a polymer. Each of X.sup.1 to X.sup.3, Y.sup.1 to Y.sup.3 and Z.sup.1 to Z.sup.3 independently denotes a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; at least one of X.sup.1, Y.sup.1, or Z.sup.1 is a fluorine atom; at least one of X.sup.2, Y.sup.2, or Z.sup.2 is a chlorine atom, a perfluoroalkyl group, a monovalent hydrocarbon group having an oxyperfluoroalkylene structure, or a phenyl group; and each of R.sup.1 to R.sup.3 denotes an organic group having from 1 to 20 carbon atoms.
##STR00001##
Radiation curing composition
Disclosed is a radiation curable composition comprising 2-hydroxy-3-butenoic acid and/or at least one ester of 2-hydroxy-3-butenoic acid and at least one additional compound selected from radiation curable monomers, oligomers and polymers.
Radiation curing composition
Disclosed is a radiation curable composition comprising 2-hydroxy-3-butenoic acid and/or at least one ester of 2-hydroxy-3-butenoic acid and at least one additional compound selected from radiation curable monomers, oligomers and polymers.
Co-cured fluoroelastomers with improved chemical resistance
Co-cured blends of fluoroelastomers of tetrafluoroethylene-propylene copolymer with cure site monomer and terpolymers of Vinylidene fluoride (VDF), Hexafluoropropylene (HFP) and Tetrafluoroethylene (TFE) with peroxide as initiator and coagent TAIC as crosslinker show improved curing performance, improved mechanical properties and improved compression set as well. The co-cured fluoroelastomers show improved chemical resistance to the solvent aging systems and better retention of mechanical properties after aging at high temperature in the solvents system.
RADIATION CURING COMPOSITION
Disclosed is a radiation curable composition comprising 2-hydroxy-3-butenoic acid and/or at least one ester of 2-hydroxy-3-butenoic acid and at least one additional compound selected from radiation curable monomers, oligomers and polymers.
RADIATION CURING COMPOSITION
Disclosed is a radiation curable composition comprising 2-hydroxy-3-butenoic acid and/or at least one ester of 2-hydroxy-3-butenoic acid and at least one additional compound selected from radiation curable monomers, oligomers and polymers.
Fluorine-containing copolymer, optical resin composition, and optical resin formed body
The fluorine-containing copolymer of the present invention includes: a structural unit (A) represented by the following formula (1); and at least one selected from the group consisting of a structural unit (B) represented by the following formula (2), a structural unit (C) represented by the following formula (3), and a structural unit (D) represented by the following formula (4): ##STR00001## in the formula (1), R.sub.ff.sup.1 to R.sub.ff.sup.4 each independently represent a fluorine atom, a perfluoroalkyl group having 1 to 7 carbon atoms, or a perfluoroalkyl ether group having 1 to 7 carbon atoms, and R.sub.ff.sup.1 and R.sub.ff.sup.2 are optionally linked to form a ring; ##STR00002## in the formula (2), R.sup.1 to R.sup.3 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 7 carbon atoms, R.sup.4 represents a perfluoroalkyl group having 1 to 7 carbon atoms, the perfluoroalkyl group optionally has a ring structure, one or some of the fluorine atoms are optionally substituted by a halogen atom other than a fluorine atom, and one or some of fluorine atoms in the perfluoroalkyl group are optionally substituted by a halogen atom other than a fluorine atom; ##STR00003## in the formula (3), R.sup.5 to R.sup.8 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 7 carbon atoms, the perfluoroalkyl group optionally has a ring structure, one or some of the fluorine atoms are optionally substituted by a halogen atom other than a fluorine atom, and one or some of fluorine atoms in the perfluoroalkyl group are optionally substituted by a halogen atom other than a fluorine atom; and ##STR00004## in the formula (4), Z represents an oxygen atom, a single bond, or OC(R.sup.19R.sup.20)O, R.sup.9 to R.sup.20 each independently represent a fluorine atom, a perfluoroalkyl group having 1 to 5 carbon atoms, or a perfluoroalkoxy group having 1 to 5 carbon atoms, one or some of the fluorine atoms are optionally substituted by a halogen atom other than a fluorine atom, one or some of fluorine atoms in the perfluoroalkyl group are optionally substituted by a halogen atom other than a fluorine atom, one or some of fluorine atoms in the perfluoroalkoxy group are optionally substituted by a halogen atom other than a fluorine atom, s and t are each independently 0 to 5, and s+t represents an integer of 1 to 6 (when Z is OC(R.sup.19R.sup.20)O, s+t is optionally 0).