Patent classifications
C08F24/00
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
The present invention is a positive photosensitive resin composition including: (A) an alkali-soluble resin containing at least one structure selected from a polyimide structure, a polyamide structure, a polybenzoxazole structure, a polyamide-imide structure, and a precursor structure thereof; (B) a polymer compound having a structural unit formed by cyclopolymerization; and (C) a compound having a quinonediazide structure for serving as a photosensitizer to generate an acid by light and increase a dissolution speed to an alkaline aqueous solution. An object of the present invention is to provide a positive photosensitive resin composition and a positive photosensitive dry film that are soluble in an alkaline aqueous solution, that can achieve high resolution without damaging excellent features such as the mechanical characteristics of a protective film, adhesiveness, etc., and that have excellent mechanical characteristics and adhesiveness to a substrate even when cured at low temperatures.
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
The present invention is a positive photosensitive resin composition including: (A) an alkali-soluble resin containing at least one structure selected from a polyimide structure, a polyamide structure, a polybenzoxazole structure, a polyamide-imide structure, and a precursor structure thereof; (B) a polymer compound having a structural unit formed by cyclopolymerization; and (C) a compound having a quinonediazide structure for serving as a photosensitizer to generate an acid by light and increase a dissolution speed to an alkaline aqueous solution. An object of the present invention is to provide a positive photosensitive resin composition and a positive photosensitive dry film that are soluble in an alkaline aqueous solution, that can achieve high resolution without damaging excellent features such as the mechanical characteristics of a protective film, adhesiveness, etc., and that have excellent mechanical characteristics and adhesiveness to a substrate even when cured at low temperatures.
POLYMERS INCLUDING A METHYLENE BETA-KETOESTER AND PRODUCTS FORMED THEREFROM
The present teachings are directed at 1,1-disubstituted alkene monomers (e.g., methylene beta-ketoester monomers), methods for producing the same, polymerizable compositions including a methylene beta-ketoester monomer, and polymers, compositions and products formed therefrom. The monomer preferably is a high purity monomer. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester may be reacted with a source of formaldehyde. The methylene beta-ketoester monomers may be used in monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).
POLYMERS INCLUDING A METHYLENE BETA-KETOESTER AND PRODUCTS FORMED THEREFROM
The present teachings are directed at 1,1-disubstituted alkene monomers (e.g., methylene beta-ketoester monomers), methods for producing the same, polymerizable compositions including a methylene beta-ketoester monomer, and polymers, compositions and products formed therefrom. The monomer preferably is a high purity monomer. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester may be reacted with a source of formaldehyde. The methylene beta-ketoester monomers may be used in monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).
Polymers and processes for preparing the polymers
Provided is a polymer obtained by homopolymerizing a lactone monomer. The polymer contains a structural unit having a lactone ring containing three or more carbon atoms, wherein at least one of the carbon atoms, except for C of —C(═O)O—, of the lactone ring forms a part of a main chain; and wherein at least one of the carbon atoms, except for C of —C(═O)O—, which forms the lactone ring and is other than the carbon atom(s) forming a part of the main chain is bridged with an atom of the main chain.
Polymers and processes for preparing the polymers
Provided is a polymer obtained by homopolymerizing a lactone monomer. The polymer contains a structural unit having a lactone ring containing three or more carbon atoms, wherein at least one of the carbon atoms, except for C of —C(═O)O—, of the lactone ring forms a part of a main chain; and wherein at least one of the carbon atoms, except for C of —C(═O)O—, which forms the lactone ring and is other than the carbon atom(s) forming a part of the main chain is bridged with an atom of the main chain.
METHOD OF PURIFYING MONOMER COMPOSITION AND METHOD OF PRODUCING POLYMER
Provided is a method of purifying a monomer composition that contains a polycyclic aromatic vinyl compound including at least two monocycles selected from the group consisting of aromatic hydrocarbon monocycles and aromatic heteromonocycles. The purification method includes an impurity removal step of removing at least sulfur from the monomer composition.
METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND COMPOSITION THEREOF
An object of the present disclosure is to provide a method for producing a fluorine-containing polymer and a composition containing the fluorine-containing polymer.
The present disclosure provides a composition comprising (A) a fluorine-containing polymer comprising as a main component a structural unit containing a fluorine-containing aliphatic ring, and (B) an aprotic solvent, wherein the fluorine-containing aliphatic ring of the fluorine-containing polymer (A) contains one, two, or three etheric oxygen atoms as a ring-constituting atom; when the fluorine-containing aliphatic ring contains a plurality of etheric oxygen atoms, the etheric oxygen atoms are not adjacent to each other; and the fluorine-containing polymer (A) is present in an amount of 20 mass % or more based on the mass of the composition.
METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND COMPOSITION THEREOF
An object of the present disclosure is to provide a method for producing a fluorine-containing polymer and a composition containing the fluorine-containing polymer.
The present disclosure provides a composition comprising (A) a fluorine-containing polymer comprising as a main component a structural unit containing a fluorine-containing aliphatic ring, and (B) an aprotic solvent, wherein the fluorine-containing aliphatic ring of the fluorine-containing polymer (A) contains one, two, or three etheric oxygen atoms as a ring-constituting atom; when the fluorine-containing aliphatic ring contains a plurality of etheric oxygen atoms, the etheric oxygen atoms are not adjacent to each other; and the fluorine-containing polymer (A) is present in an amount of 20 mass % or more based on the mass of the composition.
FLUORORESIN, FLUORORESIN PARTICLES, AND METHODS FOR PRODUCING THESE
The present invention relates to resin particles including a residue unit represented by the following general formula (1) and having a volume average particle diameter equal to or more than 5 μm and equal to or less than 2000 μm, and a method for producing thereof. Furthermore the present invention relates to a fluororesin comprising a residue unit represented by a general formula (1) and having a weight average molecular weight Mw in a range of 5×10.sup.4 to 3×10.sup.5, and a yellow index of a heat-melted molded product (thickness 3 mm) after 24 h at 280° C. of equal to or less than 6, and a method for producing thereof.
##STR00001##
In the formula (1), Rf.sub.1, Rf.sub.2, Rf.sub.3, and Rf.sub.4 are each independently one of the groups consisting of a fluorine atom, a linear perfluoroalkyl group having 1 to 7 carbon atoms, a branched perfluoroalkyl group having 3 to 7 carbon atoms, or a cyclic perfluoroalkyl group having 3 to 7 carbon atoms. The perfluoroalkyl group may have an ethereal oxygen atom. Further, Rf.sub.1, Rf.sub.2, Rf.sub.3, and Rf.sub.4 may be linked to one another to form a ring having 4 or more and 8 or less carbon atoms, and the ring may include an ethereal oxygen atom.