Provided is a resin composition including at least one (meth)acrylate monomer, a urethane (meth)acrylate oligomer, and at least one photo initiator. The urethane (meth)acrylate oligomer includes a phosphate ester group and is represented by Formula 1. Accordingly, the resin composition may exhibit satisfactory compatibility before curing and may exhibit excellent adhesion after curing. ##STR00001##

The invention relates to poly(oligo(ethylene glycol) methacrylate) microgels, to the process for preparing same and the uses thereof in various fields of application such as optics, electronics, pharmacy and cosmetics.

These microgels have the advantage of being monodisperse, pH-responsive and temperature-responsive. They can carry magnetic nanoparticles or biologically active molecules. These microgels may also form transparent films, which have novel optical and electromechanical properties.

A resin has a structure defined by Formula (I)

##STR00001##

wherein: (a) each R.sub.5 is independently a methylene group (CH.sub.2), or a methylene group substituted with one or more —H, —CH.sub.3, or halogen functionalities; (b) each R.sub.6 is independently a bond or a straight-chain or branched, linear or cyclic, saturated or unsaturated, substituted or unsubstituted, aliphatic or aromatic group having between 1 and 2 carbon atoms; (c) each X is independently a functionality possessing at least one non-aromatic alkene or alkyne moiety; (d) each Z is independently either H or X; (e) each Z is independently either H or X, and each p is independently an integer from 1-4; (f) each w is independently 0, or an integer greater than or equal to 1, and (i) when w is 0, the bracket region represents a bond and n is 0, or an integer greater than or equal to 1; and (ii) when n is 0, the bracket region represents a bond. The resin is especially well suited for use in a base station, circuit board, server, router, radome or satellite structure, as well as such processes as digital light printing (DLP), continuous liquid interface printing (CLIP), and Stereolithography (SL).

The present invention relates to a process for the effective removal of residual monomeric aliphatic isocyanate from a reaction mixture comprising aliphatic polyisocyanate comprising (i) providing a reactor containing a scavenger comprising a zeolitic material, wherein the zeolitic material comprises SiO.sub.2 and optionally X.sub.2O.sub.3 in its framework structure, wherein X is a trivalent element; (ii) providing a reaction mixture comprising aliphatic polyisocyanate and monomeric aliphatic isocyanate; (iii) contacting the scavenger in the reactor with the reaction mixture provided in (ii) at a temperature lower than the boiling point of the residual monomeric aliphatic isocyanate for obtaining a product comprising aliphatic polyisocyanate with a reduced monomeric aliphatic isocyanate content, wherein if the zeolitic material comprises X.sub.2O.sub.3, the zeolitic material has an SiO.sub.2 to X.sub.2O.sub.3 molar ratio higher than 2.8:1, preferably higher than 5:1, more preferably higher than 30:1.

Described herein are thermoset compositions and kits of compositions suitable for use in additive fabrication processes including high concentrations of urethane methacrylate oligomers having at least one polymerizable group, and a number average molecular weight from 750 to 4000 g/mol, an effective quantity of a monofunctional reactive diluent monomer, a defined concentration of a network building agent having a molecular weight that is lower than the urethane methacrylate oligomer, optionally a photoinitiator, and optionally, additives. Also disclosed are methods of creating three-dimensional parts via additive fabrication processes utilizing urethane methacrylate oligomer-centric compositions, wherein various exposure irradiances, cure temperatures, and oxygen content levels are prescribed, as well as the articles cured therefrom.

An oligomer is formed by reacting a diacid monomer with (a) epoxy resin or (b) glycidyl methacrylate, wherein the diacid monomer has a chemical structure of

##STR00001##

wherein X is —O—,

##STR00002##

and each R.sup.1 is independently CH.sub.3, CH.sub.2F, CHF.sub.2, or CF.sub.3. A composition containing the oligomer can be cured to serve as a sealant of an optoelectronic device, and the sealant can be lifted off by a laser beam irradiation.

A resin has a structure defined by Formula (I) ##STR00001## wherein: (a) each R.sub.5 is independently a methylene group (CH.sub.2), or a methylene group substituted with one or more —H, —CH.sub.3, or halogen functionalities; (b) each R.sub.6 is independently a bond or a straight-chain or branched, linear or cyclic, saturated or unsaturated, substituted or unsubstituted, aliphatic or aromatic group having between 1 and 2 carbon atoms; (c) each X is independently a functionality possessing at least one non-aromatic alkene or alkyne moiety; (d) each Z is independently either H or X; (e) each Z is independently either H or X, and each p is independently an integer from 1-4; (f) each w is independently 0, or an integer greater than or equal to 1, and (i) when w is 0, the bracket region represents a bond and n is 0, or an integer greater than or equal to 1; and (ii) when n is 0, the bracket region represents a bond. The resin is especially well suited for use in a base station, circuit board, server, router, radome or satellite structure, as well as such processes as digital light printing (DLP), continuous liquid interface printing (CLIP), and Stereolithography (SL).

A process for the high-yield preparation of p-(R)calix[9-20]arenes.

Provided is a resin composition including at least one (meth)acrylate monomer, a urethane (meth)acrylate oligomer, and at least one photo initiator. The urethane (meth)acrylate oligomer includes a phosphate ester group and is represented by Formula 1. Accordingly, the resin composition may exhibit satisfactory compatibility before curing and may exhibit excellent adhesion after curing.

##STR00001##

The invention provides polyurethane and polyisocyanurate foams and methods for the preparation thereof. More particularly, the invention relates to closed-celled, polyurethane and polyisocyanurate foams and methods for their preparation. The foams are characterized by a fine uniform cell structure and little or no foam collapse. The foams are produced with a polyol premix composition which comprises a combination of a hydrohaloolefin blowing agent, a polyol, a silicone surfactant, and a non-amine catalyst used alone or in combination with an amine catalyst.