There is provided a novel resist underlayer film forming composition comprising a polymer having a repeating structural unit of formula (1a) and/or (1b): ##STR00001##
[wherein two R.sup.1s are each independently a C.sub.1-10 alkyl group, a C.sub.2-6 alkenyl group, an aromatic hydrocarbon group, a halogen atom, a nitro group, or an amino group, two R.sup.2s are each independently a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.2-6 alkenyl group, an acetal group, an acyl group, or a glycidyl group, R.sup.3 is an aromatic hydrocarbon group optionally having a substituent or a heterocyclic group, R.sup.4 is a hydrogen atom, a phenyl group, or a naphthyl group, two ks are each independently 0 or 1, m is an integer of 3 to 500, p is an integer of 3 to 500, X is a benzene ring, and two C(CH.sub.3).sub.2 groups bonded to the benzene ring are in a meta position or a para position], and a solvent.

There is provided a novel resist underlayer film forming composition comprising a polymer having a repeating structural unit of formula (1a) and/or (1b):

##STR00001##

[wherein two R.sup.1s are each independently a C.sub.1-10 alkyl group, a C.sub.2-6 alkenyl group, an aromatic hydrocarbon group, a halogen atom, a nitro group, or an amino group, two R.sup.2s are each independently a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.2-6 alkenyl group, an acetal group, an acyl group, or a glycidyl group, R.sup.3 is an aromatic hydrocarbon group optionally having a substituent or a heterocyclic group, R.sup.4 is a hydrogen atom, a phenyl group, or a naphthyl group, two ks are each independently 0 or 1, m is an integer of 3 to 500, p is an integer of 3 to 500, X is a benzene ring, and two C(CH.sub.3).sub.2 groups bonded to the benzene ring are in a meta position or a para position], and a solvent.

Disclosed are methods for preparing and collecting a polyaromatic compound. Also disclosed are products comprising a polyaromatic compound.

Disclosed are methods for preparing and collecting a polyaromatic compound. Also disclosed are products comprising a polyaromatic compound.

Provided is a liquid phenolic resol resin containing a partial structure represented by General Formula (P-1) [in the formula, R.sup.1, R.sup.2 and R.sup.3 each independently represent a hydrogen atom or CH.sub.2OH, R.sup.4 represents a linear unsaturated hydrocarbon group having 10 or more carbon atoms, and * represents a bond].

##STR00001##

The composition includes: at least one binder chosen from phenolic resins, and particles formed from at least one pulverulent solid chosen from glass, polymers and silica, and mixtures thereof, the particles having an average size of less than 1 mm, wherein the composition includes between 34% and 50% by weight of the pulverulent material relative to the total weight of the composition. A sandwich composite material including such a composition and a process for preparing such a sandwich composite material are also described.

The composition includes: at least one binder chosen from phenolic resins, and particles formed from at least one pulverulent solid chosen from glass, polymers and silica, and mixtures thereof, the particles having an average size of less than 1 mm, wherein the composition includes between 34% and 50% by weight of the pulverulent material relative to the total weight of the composition. A sandwich composite material including such a composition and a process for preparing such a sandwich composite material are also described.

A compound represented by the following formula (1).

##STR00001##

(in formula (1), R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, R.sup.2 to R.sup.5 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group or a hydroxyl group, provided that at least one R.sup.4 and/or at least one R.sup.5 represents an alkoxy group having 1 to 30 carbon atoms, m.sup.2 and m.sup.3 are each independently an integer of 0 to 8, m.sup.4 and m.sup.5 are each independently an integer of 0 to 9, provided that m.sup.4 and m.sup.5 are not 0 at the same time, n is an integer of 1 to 4, and p.sup.2 to p.sup.5 are each independently an integer of 0 to 2.)

A selective removal of metal and its anion species that are detrimental to subsequent hydrothermal hydrocatalytic conversion from the biomass feed prior to carrying out catalytic hydrogenation/hydrogenolysis/hydrodeoxygenation of the biomass in a manner that does not reduce the effectiveness of the hydrothermal hydrocatalytic treatment while minimizing the amount of water used in the process is provided.