In an additional embodiment, a semiconductor processing tool is provided. In an embodiment, the semiconductor processing tool, comprises a chamber, and a lid sealing the chamber. In an embodiment, with an elastomer seal is between the chamber and the lid. In an embodiment, the elastomer seal comprises a polymer with carbon chains, where an average number of bonds between carbons in the carbon chains is greater than 1.00. In an embodiment a portion of the processing tool is transparent to ultraviolet radiation so that the elastomer seal is exposed to the ultraviolet radiation.

In an additional embodiment, a semiconductor processing tool is provided. In an embodiment, the semiconductor processing tool, comprises a chamber, and a lid sealing the chamber. In an embodiment, with an elastomer seal is between the chamber and the lid. In an embodiment, the elastomer seal comprises a polymer with carbon chains, where an average number of bonds between carbons in the carbon chains is greater than 1.00. In an embodiment a portion of the processing tool is transparent to ultraviolet radiation so that the elastomer seal is exposed to the ultraviolet radiation.

Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.

Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.

A compound shown by the following general formula (1-1), ##STR00001##
AR1 and AR2 each independently represent an aromatic ring or an aromatic ring containing at least one nitrogen and/or sulfur atom, two AR1s, AR1 and AR2, or two AR2s are optionally bonded; AR3 represents a benzene, naphthalene, thiophene, pyridine, or diazine ring; A represents an organic group; B represents an anionic leaving group; Y represents a divalent organic group; “p” is 1 or 2; “q” is 1 or 2; “r” is 0 or 1; “s” is 2 to 4; when s=2, Z represents a single bond, divalent atom, or divalent organic group; and when s=3 or 4, Z represents a trivalent or quadrivalent atom or organic group. This compound cures to form an organic film, and also forms an organic under layer film.

A compound shown by the following general formula (1-1), ##STR00001##
AR1 and AR2 each independently represent an aromatic ring or an aromatic ring containing at least one nitrogen and/or sulfur atom, two AR1s, AR1 and AR2, or two AR2s are optionally bonded; AR3 represents a benzene, naphthalene, thiophene, pyridine, or diazine ring; A represents an organic group; B represents an anionic leaving group; Y represents a divalent organic group; “p” is 1 or 2; “q” is 1 or 2; “r” is 0 or 1; “s” is 2 to 4; when s=2, Z represents a single bond, divalent atom, or divalent organic group; and when s=3 or 4, Z represents a trivalent or quadrivalent atom or organic group. This compound cures to form an organic film, and also forms an organic under layer film.

A wetness indicating composition can include a mixing solvent including water and a water-miscible volatile organic solvent. The wetness indicating composition can also include an amphiphilic polydiacetylene and a hydrophobic binder. In some embodiments, the wetness indicating composition can be applied to a substrate and serve as a wetness indicator for an absorbent article.

A composition comprising an ethylene/C5-C10 alpha-olefin/non-conjugated polyene interpolymer, wherein the interpolymer meets the following relationship: Tg ( C.)[0.625( C./wt %)XC55 C.], where Tg is the glass transition temperature of the interpolymer, and XC is the wt % crystallinity of the interpolymer.

A composition comprising an ethylene/C5-C10 alpha-olefin/non-conjugated polyene interpolymer, wherein the interpolymer meets the following relationship: Tg ( C.)[0.625( C./wt %)XC55 C.], where Tg is the glass transition temperature of the interpolymer, and XC is the wt % crystallinity of the interpolymer.

A microporous polymeric composition including a matrix polymer having a fractional free volume of at least 0.1 and dispersed particles having a hypercrosslinked polymer.