C09D153/00

BLOCK COPOLYMERS WITH NITRIC OXIDE DONOR
20230044613 · 2023-02-09 ·

Disclosed herein is a composite material comprising a substrate coated with a block copolymer brush, where the block copolymer brush comprises a first block of a hydrophobic polymer conjugated to a nitric oxide source, where the first block of the hydrophobic polymer is covalently bonded to a surface of the substrate or a first block of a cationic polymer covalently bonded to a surface of the substrate and a second block of a hydrophilic polymer, extending from the first block to form an outer surface of the block copolymer brush.

BLOCK COPOLYMERS WITH NITRIC OXIDE DONOR
20230044613 · 2023-02-09 ·

Disclosed herein is a composite material comprising a substrate coated with a block copolymer brush, where the block copolymer brush comprises a first block of a hydrophobic polymer conjugated to a nitric oxide source, where the first block of the hydrophobic polymer is covalently bonded to a surface of the substrate or a first block of a cationic polymer covalently bonded to a surface of the substrate and a second block of a hydrophilic polymer, extending from the first block to form an outer surface of the block copolymer brush.

BLOCK COPOLYMER, DISPERSANT, AND PIGMENT DISPERSION COMPOSITION
20180002473 · 2018-01-04 · ·

Provided is a block copolymer with an acid group that, when used as a dispersant, can provide a dispersion composition having excellent dispersion stability, a dispersant containing the block copolymer, and a pigment dispersion composition using the dispersant. The block copolymer is an ABA block copolymer including an A block and a B block and has the feature that its acid value is 30 to 250 mgKOH/g and the B block contains a structural unit derived from a vinyl monomer with an acid group.

RADICAL-POLYMERIZABLE RESIN COMPOSITION, CURING METHOD THEREOF, METHOD OF PRODUCING SAME, USE OF RADICAL-POLYMERIZABLE RESIN COMPOSITION, AND USE METHOD OF THEREOF

A radical-polymerizable resin composition comprising one or more metal-containing compounds (A) selected from a metal soap (A1) and a β-diketone skeleton-containing metal complex (A2); one or more thiol compounds (B) selected from a secondary thiol compound (B1) and a tertiary thiol compound (B2); and a radical-polymerizable compound (C) can stably cure under a dry condition, in water and in seawater and further on a wet substrate. The radical-polymerizable resin composition is useful as a repairing material for inorganic structure, a radical-polymerizable coating composition, a concrete spall preventing curable material, a reinforcing fiber-containing composite material, etc.

RADICAL-POLYMERIZABLE RESIN COMPOSITION, CURING METHOD THEREOF, METHOD OF PRODUCING SAME, USE OF RADICAL-POLYMERIZABLE RESIN COMPOSITION, AND USE METHOD OF THEREOF

A radical-polymerizable resin composition comprising one or more metal-containing compounds (A) selected from a metal soap (A1) and a β-diketone skeleton-containing metal complex (A2); one or more thiol compounds (B) selected from a secondary thiol compound (B1) and a tertiary thiol compound (B2); and a radical-polymerizable compound (C) can stably cure under a dry condition, in water and in seawater and further on a wet substrate. The radical-polymerizable resin composition is useful as a repairing material for inorganic structure, a radical-polymerizable coating composition, a concrete spall preventing curable material, a reinforcing fiber-containing composite material, etc.

Process for hierarchical manipulation of self-assembled polymer thin film patterns through in-film polymerization
11566096 · 2023-01-31 · ·

Methods for the in-film polymerization of a second polymer in a film of a first polymer are provided. The methods integrate polymer synthesis with simultaneous block copolymer selfassembly, providing a route for on-demand nanopattern manipulation in polymeric films.

BLOCK COPOLYMERS WITH A FLUORINATED BLOCK AND A PHOSPHORUS-CONTAINING BLOCK

A block copolymer is provided that includes a first block having pendant phosphorus-containing groups and a second block having fluorinated groups. Compositions containing the block copolymer as well as articles that include the block copolymer are also provided. The block copolymer can be used to provide a lower surface energy to a surface, particularly a metal-containing surface.

BLOCK COPOLYMERS WITH A FLUORINATED BLOCK AND A PHOSPHORUS-CONTAINING BLOCK

A block copolymer is provided that includes a first block having pendant phosphorus-containing groups and a second block having fluorinated groups. Compositions containing the block copolymer as well as articles that include the block copolymer are also provided. The block copolymer can be used to provide a lower surface energy to a surface, particularly a metal-containing surface.

Method of producing block copolymer capable of creating specific structure pattern

A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: ##STR00001## In which R.sup.P211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and R.sup.P212 is a group derived from a compound represented by formula SHR.sup.t1, wherein R.sup.t1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.

Method of producing block copolymer capable of creating specific structure pattern

A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: ##STR00001## In which R.sup.P211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and R.sup.P212 is a group derived from a compound represented by formula SHR.sup.t1, wherein R.sup.t1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.