An object of the present invention is to provide a biological corrosion inhibitor for a metal, which exhibits the effect at a low concentration and is superior in biodegradability. A biological corrosion inhibitor for a metal including 3-methylglutaraldehyde as an effective ingredient is provided.

Alkaline cleaning compositions with a blend of an amine and a nonionic alcohol ethoxylate between about 1:2 to about 1:10, preferably about 1:5 to about 1:10, with an alkalinity source and chelant are provided. The cleaning compositions provide efficacious cleaning of fatty soils to enhance fatty soil removal. Methods of cleaning surfaces using the cleaning composition are also disclosed.

Alkaline cleaning compositions with a blend of an amine and a nonionic alcohol ethoxylate between about 1:2 to about 1:10, preferably about 1:5 to about 1:10, with an alkalinity source and chelant are provided. The cleaning compositions provide efficacious cleaning of fatty soils to enhance fatty soil removal. Methods of cleaning surfaces using the cleaning composition are also disclosed.

Clean-in-place methods applicable to improve production of fermentation operations are disclosed herein to monitor, report, and control the cleaning reagents applied, residual components thereof, and clean-in-place conditions within levels that are compatible with fermentation processes, without limiting the effectiveness of the clean-in-place protocol with respect to cleaning or sanitizing the fermentation system.

Glycine is an organic compound that can be used in the making of a synthetic acid that obviates all the drawbacks of strong acids such as hydrochloric acid. The new compound is made by dissolving glycine in water, in a weight ratio of approximately 1:1 to 1:1.5. The solution is mixed until the glycine is essentially fully dissolved in the water. Once dissolution is complete, hydrogen chloride gas is dissolved in the solution to produce the new compound, which can be referred to as hydrogen glycine. Also disclosed is a method for adjusting the pH of a fluid, the method comprising adding an effective amount of a solution to the fluid for adjusting the pH thereof to a desired level, wherein the solution is prepared by mixing glycine in water to form a glycine solution; and adding hydrogen chloride to the glycine solution.

Glycine is an organic compound that can be used in the making of a synthetic acid that obviates all the drawbacks of strong acids such as hydrochloric acid. The new compound is made by dissolving glycine in water, in a weight ratio of approximately 1:1 to 1:1.5. The solution is mixed until the glycine is essentially fully dissolved in the water. Once dissolution is complete, hydrogen chloride gas is dissolved in the solution to produce the new compound, which can be referred to as hydrogen glycine. Also disclosed is a method for adjusting the pH of a fluid, the method comprising adding an effective amount of a solution to the fluid for adjusting the pH thereof to a desired level, wherein the solution is prepared by mixing glycine in water to form a glycine solution; and adding hydrogen chloride to the glycine solution.

Alkaline cleaning compositions with a blend of an amine and a nonionic alcohol ethoxylate between about 1:2 to about 1:10, preferably about 1:5 to about 1:10, with an alkalinity source and chelant are provided. The cleaning compositions provide efficacious cleaning of fatty soils to enhance fatty soil removal. Methods of cleaning surfaces using the cleaning composition are also disclosed.

The invention relates to a method for cleaning a synthetic surface, in particular to remove metal dirt and/or particles therefrom, said method being characterized by the following steps: a) the synthetic surface is rinsed with deionized water; b) the synthetic surface is rinsed with electrolyzed water; and c) the synthetic surface is rinsed with deionized water.

A treatment liquid is a treatment liquid for a semiconductor device, which contains a fluorine-containing compound and a water-soluble aromatic compound not having a heterocyclic group but having a benzene ring, and has a pH of 5 or less.

A composition useful for removing residue from a semiconductor substrate comprising in effective cleaning amounts: from about 55 to 80% by weight of water; from about 0.3 to about 5.0% by weight of EDTA; from about 10.0 to about 30.0% by weight of an amine compound wherein the amine compound is selected from the group consisting of a secondary amine, a tertiary amine, and mixtures thereof; from about 0.1 to about 5.0% by weight of a polyfunctional organic acid; from about 0.01 to about 8.0% by weight of a fluoride ion source; from about 0 to about 60% by weight of a water-miscible organic solvent; and from about 0 to about 15% by weight of a corrosion inhibitor.