G03D13/00

METHOD AND APPARATUS FOR SUPPORTING AND HEATING A RECORDING MEDIA WITHOUT PHYSICAL CONTACT
20210252877 · 2021-08-19 ·

According to aspects of the embodiments, there is provided process and apparatus using an in-line air bearing heater to maintain ambient elevated temperature or to provide extra heating to a recording media moving along a path in an imaging system. The heated air bearing is also useful for shearing the surface of molten toner or inks to level and gloss an image at the recording media.

THERMAL PROCESSING DRUM
20200319544 · 2020-10-08 ·

A drum for processing a thermal image medium has first and second end plates that extend orthogonally to an axis of rotation and enclose an inner core. First and second inner partitions along the axis define a first end zone between the first partition and the first end plate, a second end zone between the second partition and the second end plate, and a middle zone between the first and second partitions. Each inner partition has sleeve portions that extend outward from the partition, in an axial direction. A first lamp heater extends parallel to the axis and through one or more sleeve portions and has a first filament within the first end zone and a second filament within the second end zone. A second lamp heater extends parallel to the axis and through one or more sleeve portions and has a central filament within the middle zone.

Thermal processing drum

A drum for processing a thermal image medium has first and second end plates that extend orthogonally to an axis of rotation and enclose an inner core. First and second inner partitions along the axis define a first end zone between the first partition and the first end plate, a second end zone between the second partition and the second end plate, and a middle zone between the first and second partitions. Each inner partition has sleeve portions that extend outward from the partition, in an axial direction. A first lamp heater extends parallel to the axis and through one or more sleeve portions and has a first filament within the first end zone and a second filament within the second end zone. A second lamp heater extends parallel to the axis and through one or more sleeve portions and has a central filament within the middle zone.

Industrial operation having a monitoring system and method
10433708 · 2019-10-08 ·

An industrial operation having a system for remotely investigating and monitoring chemical reactions and structural and environmental conditions within the components of the industrial operation. The system includes a capsule having cameras within the capsule that operates to acquire data which is communicated to a monitor and relates to structural, environmental, chemical and/or fluid conditions within the components of the industrial operation.

Substrate processing method, program, computer-readable storage medium, and substrate processing system
09690185 · 2017-06-27 · ·

A substrate processing method performs a photolithography processing on a wafer to form a resist pattern on the wafer. Ultraviolet ray is irradiated onto the resist pattern to cut side chains of the resist pattern to improve line edge roughness of the resist pattern. A processing agent is caused to enter the resist pattern and a metal is caused to be infiltrated into the resist pattern through the processing agent. Thereafter, the wafer is heated to vaporize the processing agent from the resist pattern to form a cured resist pattern.

Substrate processing method, program, computer-readable storage medium, and substrate processing system
09690185 · 2017-06-27 · ·

A substrate processing method performs a photolithography processing on a wafer to form a resist pattern on the wafer. Ultraviolet ray is irradiated onto the resist pattern to cut side chains of the resist pattern to improve line edge roughness of the resist pattern. A processing agent is caused to enter the resist pattern and a metal is caused to be infiltrated into the resist pattern through the processing agent. Thereafter, the wafer is heated to vaporize the processing agent from the resist pattern to form a cured resist pattern.