An electrotechnical core for generating a cold atmospheric pressure or low-pressure plasma for the treatment of human, animal, or technical surfaces. The core has a side facing the surface and a side facing away from the surface and comprises the following layers, starting from the side facing the surface: a first insulation layer, a first electrode structure with a first contact between the first electrode structure and a power supply unit, a second insulation layer to galvanically isolate the first electrode structure and a second electrode structure from one another, wherein the second electrode structure is driven during operation by a voltage signal sufficient to ignite a plasma, a third insulation layer to galvanically isolate the second electrode structure from a third electrode structure, wherein the third electrode structure grounds the third electrode structure during operation.

A parallelepipedal low-pressure plasma chamber body of glass is disclosed. The low-pressure plasma chamber may have electrodes at opposing sides of the low-pressure plasma chamber body. Furthermore, the low-pressure plasma chamber may have at opposing sides a door and a rear wall closure. The door and rear wall closure may in each case have at least one media connection in order to achieve a uniform gas flow in the low-pressure plasma chamber. The door may be assembled on the collar of the low-pressure plasma chamber body which extends radially away from the longitudinal axis of the low-pressure plasma chamber body. The low-pressure plasma chamber body is preferably produced using the pressing method or blow-and-blow method, in an analogous manner to industrial glass bottle production.

A submerged plasma generator includes: a reactor inside of which a flow path, through which a working fluid passes, is formed along a lengthwise direction; and a dielectric insert which is disposed in the flow path so as to define the flow path into one space and the other space, and has formed therein a through-hole to generate micro-nano bubbles by cavitation in the working fluid fed into the one space of the flow path, and includes, a metallic catalyst which undergoes friction with the working fluid flowing through the through-hole and releases electric charges of the same polarity to the micro-nano bubbles to collapse the micro-nano bubbles and generate plasma; in which the other space of the flow path in which the working fluid ionized by exposure to the plasma travels is formed in an oval structure.

A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply deice. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.

The invention relates to a microwave driven plasma ion source (1) for ionising a sample to be ionised to sample ions, the microwave driven plasma ion source (1) including a sample intake (6) for inserting the sample from an outside of the microwave driven plasma ion source (1) into an inside (3) of the microwave driven plasma ion source (1); a microwave generator (10) for generating microwaves for generating a plasma (101) from a plasma gas (100); a plasma torch (20) providing a plasma torch orientation direction (29) having an inside (21) for housing (2) a process of generation of the plasma (101) from the plasma gas (100) and for housing a process of ionising the sample to the sample ions by exposing the sample to the plasma (101), wherein the plasma torch (20) comprises a torch outlet (22) for letting out the plasma (101) and the sample ions from the inside (21) of the plasma torch (20) essentially in the plasma torch orientation direction (29) to an outside of the plasma torch (20), the torch outlet (22) having a torch aperture. Furthermore the microwave driven plasma ion source (1, 201) includes a shielding (4) for shielding off the microwaves from passing from the inside (3) of the microwave driven plasma ion source (1) to the outside of the microwave driven plasma ion source (1), wherein the shielding (4) comprises a shielding outlet (5) for letting out the plasma (101) and the sample ions from the inside (3) of the microwave driven plasma ion source (1) essentially in the plasma torch orientation direction (29) to the outside of the microwave driven plasma ion source (1), the shielding outlet (5) having a shielding aperture. Thereby, the shielding outlet (5) is fluidly coupled to the torch outlet (22) for letting out the plasma (101) and the sample ions from the inside (21) of the plasma torch (20) essentially in the plasma torch orientation direction (29) to the outside of the microwave driven plasma ion source (1), wherein a size of the shielding aperture is less than 150%, preferably less than 125%, particular preferably less than 110% of a size of the torch aperture, wherein both the size of the shielding aperture and the size of the torch aperture are measured in units of area.

A plasma generator that detects whether a connector of a head is electrically connected to a power cable. The plasma generator includes the head including the connector with a terminal to supply electricity to electrodes that generate plasma by electrical discharge, and a first terminal and a second terminal that are connected to each other; a power cable to supply electricity to the terminal; a cable to transmit a signal to the first terminal; a first ground cable to ground the second terminal; and a detector to detect a signal current that flows in a path from the cable to the first ground cable in accordance with transmission of the signal.

A robot end effector for surface preparation in an automated inspection and repair system for composite parts has an end effector body and a plasma control unit and a plasma jet nozzle supported on the end effector body. The plasma control unit directs a jet of atmospheric plasma through the plasma jet nozzle. A slave tool changer is secured to the end effector body. The slave tool changer releasably and operatively connects the robot end effector to an industrial robot such that the industrial robot can move the robot end effector along a composite part as the plasma control unit directs a jet of atmospheric plasma through the plasma jet nozzle toward the composite part to clean the composite part and increase a surface free energy of the composite part.

The invention relates to a treatment device for dielectric harrier discharge plasma treatment of a wound surface or skin surface, having: a flexible, planar electrode assembly with at least one planar electrode (6, 6′) and a dielectric layer (5) which at least partially embeds the at least one electrode (6, 6′), has a contact side (7) facing the wound surface or skin surface and electrically shields the planar electrode (6, 6′) from the wound surface or skin surface such that only a dielectric barrier current can flow from the electrode (6, 6′) to the wound surface or skin surface; and a control device (2) which has a separate housing (25) and via which the electrode (6, 6′) can be connected to an operating voltage. The treatment device allows simpler wound treatment in that the assembly of electrode (6, 6′) and dielectric layer (5) is designed for uninterrupted contact with the wound surface or skin surface and that the housing (25) of the control device (2) can be fastened with a fastening device (3, 3′) to the body having the wound surface or skin surface.

A plasma generation system capable of more accurately measuring the actual temperature of a plasma gas applied to a target object. The plasma generation system includes: an emitting head configured to generate plasma gas by supplying power to electrodes provided in a reaction chamber to generate a plasma gas by converting a processing gas into plasma, and apply the generated plasma gas to a target object; and a temperature sensor configured to detect a temperature of the plasma gas and output a detection signal corresponding to the detected temperature. The temperature sensor is arranged at a position separated from an emission port of the emitting head from which the plasma gas is emitted. The emitting head is configured to be movable between the target object the temperature sensor.

A vacuum cell provides for electric field control within an ultra-high vacuum (UHV) for cold-neutral-atom quantum computing and other quantum applications. Electrode assemblies extend through vacuum cell walls. Prior to cell assembly, contacts are bonded to respective locations on the ambient-facing surfaces of the walls. Trenches are formed in the vacuum-facing surfaces of walls and via holes are formed, extending from trenches through the wall and into the contacts. Plating conductive material into the trenches and via holes forms the electrodes and vias. The electrodes are contained by the trenches and do not extend beyond the trenches so as to avoid interfering with the bonding of components to the vacuum-facing surfaces of the walls. The vias extend into the contacts to ensure good electrical contact. An electric-field controller applies electric potentials to the electrodes (via the contacts) to control electric fields within the vacuum.