Various forms of Mg.sub.xGe.sub.1xO.sub.2x are disclosed, where an epitaxial layer comprises single crystal Mg.sub.xGe.sub.1xO.sub.2x, with x having a value of 0x<1, wherein the single crystal Mg.sub.xGe.sub.1xO.sub.2x has a crystal symmetry compatible with a substrate or with an underlying layer on which the single crystal Mg.sub.xGe.sub.1xO.sub.2x is grown. Semiconductor structures and devices comprising the epitaxial layer of Mg.sub.xGe.sub.1xO.sub.2x are disclosed, along with methods of making the epitaxial layers and semiconductor structures and devices.

Package structures, modules containing such packages and methods of manufacture. are described. In an embodiment, a package includes a plurality of terminal pads, a plurality of passive components bonded to top sides of the plurality of terminal pads, a die bonded to top sides of the plurality of passive components and a molding compound encapsulating at least the plurality of passive components and the die.

Various embodiments of the present disclosure are directed towards a trench capacitor with a trench pattern for yield improvement. The trench capacitor is on a substrate and comprises a plurality of capacitor segments. The capacitor segments extend into the substrate according to the trench pattern and are spaced with a pitch on an axis. The plurality of capacitor segments comprises an edge capacitor segment at an edge of the trench capacitor and a center capacitor segment at a center of the trench capacitor. The edge capacitor segment has a greater width than the center capacitor segment and/or the pitch is greater at the edge capacitor segment than at the center capacitor segment. The greater width may facilitate stress absorption and the greater pitch may increase substrate rigidity at the edge of the trench capacitor where thermal expansion stress is greatest, thereby reducing substrate bending and trench burnout for yield improvements.

To provide a magnetic element capable of performing skyrmion transfer, a skyrmion memory to which this magnetic element is applied, and a shift register, for example, a magnetic element capable of performing skyrmion transfer is provided, the magnetic element providing a transverse transfer arrangement in which the skyrmion is transferred substantially perpendicular to a current between an upstream electrode and a downstream electrode, and including a plurality of stable positions in which the skyrmion exists more stably than in other regions of a magnet, and a skyrmion sensor that detects a position of the skyrmion.

High voltage devices and methods for forming a high voltage device are disclosed. The high voltage device includes a substrate prepared with a device isolation region. The device isolation region defines a device region. The device region includes at least first and second source/drain regions and a gate region defined thereon. A device well is disposed in the device region. The device well encompasses the at least first and second source/drain regions. A primary gate and at least one secondary gate adjacent to the primary gate are disposed in the gate region. The at least first and second source/drain regions are displaced from first and second sides of the primary gate.

A semiconductor device includes a first active region including at least one first recess; a second active region including at least one second recess; an isolation region including a diffusion barrier that laterally surrounds at least any one active region of the first active region and the second active region; a first recess gate filled in the first recess; and a second recess gate filled in the second recess, wherein the diffusion barrier contacts ends of at least any one of the first recess gate and the second recess gate.

A memory array includes a semiconductor substrate having thereon a plurality of active areas and trench isolation regions between the active areas. Buried word lines are disposed in the semiconductor substrate. Two of the buried word lines intersect with each of the active areas, separating each of the active areas into three portions including a digit line contact area and two cell contact areas. Buried digit lines are disposed in the semiconductor substrate above the buried word lines. An epitaxial silicon layer extends from exposed sidewalls and a top surface of each of the cell contact areas.

A semiconductor substrate is provided. Active areas and trench isolation regions are formed. The active areas extend along a first direction. Buried word lines extending along a second direction are formed in the semiconductor substrate. Two of the buried word lines intersect with each of the active areas, separating each of the active areas into a digit line contact area and two cell contact areas. Buried digit lines extending along a third direction are formed above the buried word lines. An upper portion of the trench isolation region is removed to form an L-shaped recessed area around each of the cell contact areas. The L-shaped recessed area exposes sidewalls of the cell contact areas. An epitaxial silicon growth process is then performed to grow an epitaxial silicon layer from the exposed sidewalls and a top surface of each of the cell contact areas, thereby forming enlarged cell contact areas.

An integrated circuit (IC) device includes: a channel region that extends on the substrate to penetrate a plurality of word lines; a bit line contact pad that contacts an upper surface of the channel region; a bit line that contacts the bit line contact pad and extends on the bit line contact pad in a direction parallel to the main surface of the substrate; a common source line that partially fills a word line cut region and has a height lower than that of the channel region; and a common source via contact that contacts an upper surface of the common source line in the word line cut region.

A non-volatile memory having memory cells is provided. A stacked gate structure has gate dielectric layer, assist gate, insulation layer, and erase gate disposed in order. The floating gate is disposed on a first sidewall of the stacked gate structure, the floating gate has a corner portion at the top portion, and erase gate covers the corner portion. The tunneling dielectric layer is disposed under the floating gate. The erase gate dielectric layer is disposed between the erase gate and the floating gate. The assist gate dielectric layer is disposed between the assist gate and the floating gate. The source region and the drain region are respectively disposed at two sides of the stacked structure and the floating gate. The control gate is disposed on the source region and the floating gate. The inter-gate dielectric layer is disposed between the control gate and the floating gate.