A semiconductor storage device according to an embodiment includes a board, a first semiconductor memory, a second semiconductor memory, a controller, and a wiring. The first semiconductor memory includes a first bonding member. The first semiconductor memory has a first corner, a second corner, a third corner, and a fourth corner. The second semiconductor memory includes a second bonding member. The second semiconductor memory has a fifth corner, a sixth corner, a seventh corner, and an eighth corner. The first bonding member is a first detection-bonding member. The first detection-bonding member detects a connection state of the first semiconductor memory and the second semiconductor memory. The second bonding member is a second detection-bonding member. The second detection-bonding member is electrically connected to the first detection-bonding member. The second detection-bonding member detects a connection state of the first semiconductor memory and the second semiconductor memory.

Three-dimensional (3D) devices that include at least two electrically isolated planes of electrically conductive traces and methods of making the same. The 3D device includes an upper level, a lower level electrically isolated from the upper level, and one or more pedestal portions joining the upper level and the lower level. The pedestal portions comprise an undercut. The undercut defines an upper level overhang that is configured to define a mask region to prevent conductive material from being deposited below the undercut.

A power electronics assembly includes a printed circuit board including a plurality of substrate layers. The plurality of substrate layers include a first core layer and a second core layer stacked vertically below the first core layer, wherein the first core layer comprises a first electrical component embedded therein and the second core layer comprises a second electrical component embedded therein. The first electrical component and the second electrical component are arranged in a vertical column.

A semiconductor device includes first, second and third stacked chips with a first, second and third substrate, respectively, at least three first, second and third logical circuits, respectively, and at least two first, second and third vias, respectively, and a fourth chip stacked on the third chip having a fourth substrate, and at least three fourth logical circuits. First and second ones of the first to third logical circuits of the first to fourth chips are each configured to perform a first and second logical operation, respectively, on a first and second address input signal, respectively, received at the respective chip to thereby output a first and second address output signal, respectively. Third ones are each configured to activate the respective chip based on at least the second address output signal transmitted within the respective chip.

Implementations of a semiconductor package may include two or more die, each of the two more die coupled to a metal layer at a drain of each of the two more die, the two or more die and each metal layer arranged in two parallel planes; a first interconnect layer coupled at a source of each of the two more die; a second interconnect layer coupled to a gate of each of the two or more die and to a gate package contact through one or more vias; and an encapsulant that encapsulates the two or more die and at least a portion of the first interconnect layer, each metal layer, and the second interconnect layer.

A backplane and a glass-based circuit board. The backplane includes: a base substrate and a plurality of light-emitting units, arranged in an array on the base substrate. Each of the light-emitting units includes at least one light-emitting sub-unit; the light-emitting sub-unit includes a connection line and a plurality of light-emitting diode chips connected with the connection line, and the light-emitting diode chips are located on a side of the connection line away from the base substrate. The connection line includes a first connection portion, a second connection portion and a third connection portion; in each of the light-emitting sub-units, the third connection portion includes a plurality of connection sub-portions, each of the connection sub-portions includes at least one electrical contact point; the electrical contact points at adjacent ends of adjacent connection sub-portions constitute an electrical contact point pair.

Embodiments of the invention include molded modules and methods for forming molded modules. According to an embodiment the molded modules may be integrated into an electrical package. Electrical packages according to embodiments of the invention may include a die with a redistribution layer formed on at least one surface. The molded module may be mounted to the die. According to an embodiment, the molded module may include a mold layer and a plurality of components encapsulated within the mold layer. Terminals from each of the components may be substantially coplanar with a surface of the mold layer in order to allow the terminals to be electrically coupled to the redistribution layer on the die. Additional embodiments of the invention may include one or more through mold vias formed in the mold layer to provide power delivery and/or one or more faraday cages around components.

Disclosed embodiments include methods, apparatuses, integrated circuits, and circuit boards for power conversion with reduced parasitics. The apparatuses include an integrated circuit for power conversion. The integrated circuit includes a plurality of power transistors and a plurality of metal regions coupled to the power transistors. A first portion of the metal regions are coupled to source regions of the power transistors. A second portion of the metal regions are coupled to drain regions of the power transistors. The first and second portions have at least one of substantially equal numbers of metal regions, substantially equal resistances, or balanced distributions of metal regions.

A semiconductor device includes a semiconductor substrate, a TiW layer arranged on the semiconductor substrate a Ti layer arranged on the TiW layer, a Ni alloy layer arranged on the Ti layer, and an Ag layer arranged on the Ni alloy layer, wherein the Ag layer and the Ni alloy layer comprise side faces fabricated by at least one wet etching process, and wherein the Ti layer and the TiW layer comprise side faces fabricated by a dry etching process.

Implementations described herein relate to various semiconductor device assemblies. In some implementations, an apparatus includes a dielectric layer having a first material that is an insulative material, a conductive layer having a second material that is a conductive material, and a stimulus-responsive strain layer having a third material that deforms in response to an applied stimulus.