C22C32/0015

Sputtering Target And Method For Manufacturing Sputtering Target
20220189750 · 2022-06-16 ·

Provided is a sputtering target capable of reducing generation of particles, and a method for producing the same. The sputtering target includes: 10 mol % or more and 85 mol % or less of Co, 0 mol % or more and 47 mol % or less of Pt, and 0 mol % or more and 47 mol % or less of Cr, as metal components; and at least B.sub.6O as an oxide component.

Methods of manufacturing oxide/metal composite components and the components produced therefrom

Methods for producing components for use in high temperature systems that include reacting a fluid reactant and a porous preform that has a pore volume and contains a solid oxide reactant that defines a solid volume of the porous preform. The method includes infiltrating the fluid reactant into the porous preform to react with the solid oxide reactant to produce a oxide/metal composite component, during which a displacing metal replaces a displaceable species of the solid oxide reactant to produce at least one solid oxide reaction product that has a reaction product volume that at least partially fills the pore volume. The oxide/metal composite component includes at least one oxide phase and at least one metal phase. The component is exposed to temperatures greater than 500° C. and the at least one oxide phase and the at least one metal phase exhibit thermal expansion values within 50% of one another.

PRODUCTION OF CASTABLE LIGHT RARE EARTH RICH LIGHT METAL COMPOSITIONS FROM DIRECT REDUCTION PROCESSES

The disclosure concerns methods for making a composition comprising a light metal and an intermetallic comprising the light metal and a light rare earth element. The composition also may include a plurality of nanoparticles comprising an oxide of the light metal. The method includes directly reducing a light rare earth element precursor compound in a melt of the light metal, thereby forming the light rare earth element and nanoparticles of the light metal oxide.

TECHNIQUES FOR CONTROLLING BUILD MATERIAL FLOW CHARACTERISTICS IN ADDITIVE MANUFACTURING AND RELATED SYSTEMS AND METHODS

Embodiments described herein relate to methods and systems for controlling the packing behavior of powders for additive manufacturing applications. In some embodiments, a method for additive manufacturing includes adding a packing modifier to a base powder to form a build material. The build material may be spread to form a layer across a powder bed, and the build material may be selectively joined along a two-dimensional pattern associated with the layer. The steps of spreading a layer of build material and selectively joining the build material in the layer may be repeated to form a three-dimensional object. The packing modifier may be selected to enhance one or more powder packing and/or powder flow characteristics of the base powder to provide for improved uniformity of the additive manufacturing process, promote sintering, and/or to enhance the properties of the manufactured three-dimensional objects.

Plating film and plated member

Provided is a plating film containing Au and Tl, including Tl oxides including Tl.sub.2O on a surface of the plating film, a ratio of Tl atoms constituting Tl.sub.2O to a total of Tl atoms constituting the Tl oxides and Tl atoms constituting Tl simple substances on the surface being 40% or more.

Three-dimensional shaped article production method, three-dimensional shaped article production apparatus, and three-dimensional shaped article
11154933 · 2021-10-26 · ·

A three-dimensional shaped article production method according to the invention is a method for producing a three-dimensional shaped article by stacking layers formed in a predetermined pattern, wherein a series of steps including a composition supply step of supplying a composition containing a plurality of particles to a predetermined part, and a bonding step of bonding the particles by irradiation with a laser light is performed repeatedly, and the composition supply step includes a step of forming a first region using a first composition containing first particles as the composition, and a step of forming a second region using a second composition containing second particles which are different from the first particles as the composition, and the bonding of the particles in the first region and the bonding of the particles in the second region are performed by irradiation with laser lights with a different spectrum.

SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR
20210149093 · 2021-05-20 ·

Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates (1) including a base body (2) made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body (2) is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer (6) is preferably provided on a polishing layer (3) of the substrate (1) of the EUV mirror (5).

PHOTOSINTERING COMPOSITION AND METHOD OF FORMING CONDUCTIVE FILM USING THE SAME

Provided is a photosintering composition including: a cuprous oxide particle comprising at least one additive element selected from the group consisting of tin, manganese, vanadium, cerium, iron and silver; a metal particle having a volume resistivity at 20° C. of 1.0×10.sup.−3 ω.Math.cm or less; and a solvent.

Substrate for an EUV-lithography mirror
10935704 · 2021-03-02 · ·

Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates (1) including a base body (2) made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body (2) is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer (6) is preferably provided on a polishing layer (3) of the substrate (1) of the EUV mirror (5).

METHOD FOR MANUFACTURING MATERIAL POWDER FOR METAL LAMINATING MODELLING
20210031270 · 2021-02-04 · ·

Provided is a method for manufacturing material powder for metal laminating modelling, in which a virgin material is manufactured based on the particle size distribution of the virgin material being an unused material powder, and the fluidity of an unsintered reused material after the virgin material is reused a predetermined number of times by a metal laminating modelling device, so that the particle size distribution of the virgin material corresponds to the fluidity of the reused material that is equal to or greater than a predetermined standard value. Silica particles may be added to the virgin material.