A method of mask-free printing of dry nanoparticles, the method comprising generating a dry nanoparticle stream from a feedstock material in an atmospheric gas flow using a laser ablation system at atmospheric pressure, the dry nanoparticle stream uncontaminated by a fluidic carrier medium, wherein the dry nanoparticles uncontaminated by a fluidic carrier medium are directed to a substrate through a nozzle by the gas flow in a dry state and adhere to the substrate.

A method for laser-induced growth of nano-units to form oriented, chiral, and complex structures is provided. Through a laser-induced photochemical reaction, a metal precursor undergoes photolysis to produce inorganic nanoparticles, and these nanoparticles are orientally deposited on a substrate along a polarization direction in a linearly polarized laser to form fusiform nano-units. Through mixed polarized light generated by a vortex plate, the nano-units can grow rapidly and form a specific arrangement to obtain special three-dimensional (3D) nanostructures with chiral features and complex patterns. This method can be implemented in a room temperature environment, has the characteristics of simple operation, short reaction time, high repeatability, long storage time, low cost, and controllable orientations and sites, and shows promising application prospects in the fields of optical devices, chiral catalysis, sensing, integrated circuits, and the like.

Printing apparatus includes a donor supply assembly, which positions a transparent donor substrate having opposing first and second surfaces and a donor film formed on the second surface so that the donor film is in proximity to a target area on an acceptor substrate. An optical assembly directs one or more beams of laser radiation to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate. Means are provided to mitigate or compensate for the variation in reflection of the laser radiation across an area of the donor substrate, so as to equalize a flux of the laser radiation that is absorbed in the donor film across the area of the donor substrate.

A device for laser-induced marking of an article having a marking surface comprising a non-flat portion to be marked, the device comprising: a first laser unit for emitting and scanning first laser light over a first transfer area; a first foil unit for providing a first laser transfer foil at the first transfer area; a carrier for providing the article at the first transfer area, the article having a marking surface comprising a non-flat surface area; a first hard adaptor that is transparent for the first laser light, the first hard adapter having a first contacting surface that is essentially a negative of the non-flat surface area of the marking surface; and a contacting unit for bringing the first laser transfer foil in contact with the marking surface by causing the first contacting surface to move one of the first laser transfer foil and the marking surface towards one another.

The technology disclosed relates to high utilization of donor material in a writing process using Laser-Induced Forward Transfer. Specifically, the technology relates to reusing, or recycling, unused donor material by recoating target substrates with donor material after a writing process is performed with the target substrate. Further, the technology relates to target substrates including a pattern of discrete separated dots to be individually ejected from the target substrate using LIFT.

Systems and methods for additive manufacturing, and, in particular, such methods and apparatus as employ pulsed lasers or other heating arrangements to create metal droplets from donor metal micro wires, which droplets, when solidified in the aggregate, form 3D structures. A supply of metal micro wire is arranged so as to be fed towards a nozzle area by a piezo translator. Near the nozzle, an end portion of the metal micro wire is heated (e.g., by a laser pulse or an electric heater element), thereby causing the end portion of the metal micro wire near the nozzle area to form a droplet of metal. A receiving substrate is positioned to receive the droplet of metal jetted from the nozzle area.

Energy bands of a thin film containing molecular clusters are tuned by controlling the size and the charge of the clusters during thin film deposition. Using atomic layer deposition, an ionic cluster film is formed in the gate region of a nanometer-scale transistor to adjust the threshold voltage, and a neutral cluster film is formed in the source and drain regions to adjust contact resistance. A work function semiconductor material such as a silver bromide or a lanthanum oxide is deposited so as to include clusters of different sizes such as dimers, trimers, and tetramers, formed from isolated monomers. A type of Atomic Layer Deposition system is used to deposit on semiconductor wafers molecular clusters to form thin film junctions having selected energy gaps. A beam of ions contains different ionic clusters which are then selected for deposition by passing the beam through a filter in which different apertures select clusters based on size and orientation.

A deposition mask includes a resin film defining a plurality of opening portions. Each opening portions extends through the resin film. The resin film includes a first surface and a second surface opposite to the first surface. The second surface is a surface faced to a vapor deposition source during vapor deposition. The resin film defines dents comprising laser marks on the first surface. A mask member for a deposition mask is also provided.

A deposition mask in which a resin film can be completely removed in opening portions, a method of manufacturing the deposition mask, and a mask member for the deposition mask are provided. A light irradiation source for laser light is disposed on one side of a resin film (11) and emits the laser light for forming a pattern of opening portions. A reflective film (30) is provided on another side of the resin film (11) and reflects light having a wavelength of the laser light emitted from the light irradiation source for the laser light. The laser light reflected by the reflective film (30) is used to form the patterns of the opening portion (11a) in the resin film (11).

The present disclosure relates to the field of vapor deposition technologies, and discloses a vapor deposition method. The vapor deposition method includes: applying an exciting acoustic wave to the target, such that particles in a predetermined location of the target break away from the target and adhere to a predetermined region of the substrate when an energy of the particles is higher than an energy required for the particles to break away from the target. By using the vapor deposition method, losses of vapor deposition materials may be avoided, utilization of the vapor deposition materials may be increased, and thus costs may be reduced.