Patent classifications
C23C14/048
Mask repairing apparatus and mask repairing method
A mask repairing apparatus may include a stage, a stereoscopic imaging unit to measure a stereoscopic image of a mask on the stage, a control unit to compare the stereoscopic image with a normal image of the mask and to produce a defect image of the mask, and a laser unit to irradiate a laser beam onto a deficient part of the mask, under control of the control unit. The control unit may control the laser unit, based on the defect image, such that the laser beam is sequentially irradiated onto m multiple layers of the deficient part while repeatedly moving in a first direction and a second direction crossing each other.
DEVICES AND METHODS FOR VARIABLE ETCH DEPTHS
Methods and devices for producing substrates with variable height features are provided. In one example, a proximity mask may include a plate positioned over a substrate, wherein at least a portion of the plate is separated from the substrate by a distance. The plate may include a first opening and a second opening, wherein the first opening is defined by a first perimeter having a first shape, wherein the second opening is defined by a second perimeter having a second shape, and wherein the first shape is different than the second shape.
LIFT printing of conductive traces onto a semiconductor substrate
A method for metallization includes providing a transparent donor substrate (34) having deposited thereon a donor film (36) including a metal with a thickness less than 2 μm. The donor substrate is positioned in proximity to an acceptor substrate (22) including a semiconductor material with the donor film facing toward the acceptor substrate and with a gap of at least 0.1 mm between the donor film and the acceptor substrate. A train of laser pulses, having a pulse duration less than 2 ns, is directed to impinge on the donor substrate so as to cause droplets (44) of the metal to be ejected from the donor layer and land on the acceptor substrate, thereby forming a circuit trace (25) in ohmic contact with the semiconductor material.
TECHNIQUES AND APPARATUS FOR SELECTIVE SHAPING OF MASK FEATURES USING ANGLED BEAMS
A method may include providing a set of features in a mask layer, wherein a given feature comprises a first dimension along a first direction, second dimension along a second direction, orthogonal to the first direction, and directing an angled ion beam to a first side region of the set of features in a first exposure, wherein the first side region is etched a first amount along the first direction. The method may include directing an angled deposition beam to a second side region of the set of features in a second exposure, wherein a protective layer is formed on the second side region, the second side region being oriented perpendicularly with respect to the first side region. The method may include directing the angled ion beam to the first side region in a third exposure, wherein the first side region is etched a second amount along the first direction.
SYSTEM AND METHOD FOR COMPONENT MATERIAL ADDITION
A system is disclosed for depositing material on a component. The system includes a deposition device operatively coupled to a fiber optic Nd:YAG laser. The deposition device includes a focusing prism that focuses the Nd:YAG laser at a focal area on a bladed disk, where the focal area on the bladed disk is between two blades of the disk. The system further includes an imaging means that views the focal area of the component. The imaging means and the fiber optic Nd:YAG laser each are positioned in a substantially similar optical relationship to the focal area on the bladed disk The system further includes an additive material delivery means that delivers additive material to the component at the focal area on the component.
Electrochemical sensor with exchangeable electrode assembly
The present disclosure relates to a method for producing an exchangeable electrode assembly, with at least one sensor body and at least a first electrode, for an electrochemical sensor for determining the concentration of an analyte in a gaseous or liquid measurement medium, a corresponding electrode assembly, and an electrochemical sensor with an electrode assembly according to the present disclosure. In order to produce the electrode assembly, the following method steps are performed: providing a sensor body, and applying at least a first electrically-conductive material to a first sub-region of the sensor body for producing a first electrode of the electrode assembly.
Direct-Deposition System Including Standoffs for Controlling Substrate-Mask Separation
The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.
VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREPARATION BODY, METHOD FOR PRODUCING VAPOR DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT
There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
USE OF A COMPONENT IN A COMPOSITION, COMPOSITION FOR LASER TRANSFER PRINTING, AND LASER TRANSFER PRINTING METHOD
Use of a laser-activatable component in a composition and/or use of a composition that includes the laser-activatable component, during laser transfer printing, characterized in that the laser-activatable component is activated by laser irradiation during use in such a way that the viscosity and/or the elasticity and/or the tack of the composition increase(s) due to an increase in temperature of the composition, wherein the laser-activatable component is a polymer made up of the groups comprising polyethylene glycol, polyvinylpyrrolidone, polyvinyl acetate, polyvinyl alcohol, polyacrylate, polyester, or copolymers of these polymers or blends.
Evaporation device and evaporation method
The present disclosure provides an evaporation device and an evaporation method. The evaporation device includes: an evaporation chamber; a plurality of spaced conductive baffles disposed in the evaporation chamber and dividing the evaporation chamber into a plurality of evaporation sub-chambers, the conductive baffles configured to carry charges of a first polarity; an evaporation source disposed in at least one of the evaporation sub-chambers; and a particle charging circuit disposed in at least one of the evaporation sub-chambers. The particle charging circuit is configured to control evaporation material particles generated from the evaporation source in at least one of the evaporation sub-chambers to have charges of the first polarity.