C23C14/221

Oxide superconducting wire
11621105 · 2023-04-04 · ·

An oxide superconducting wire includes a superconducting laminate including an oxide superconducting layer disposed, either directly or indirectly, on a substrate, and a stabilization layer which is a Cu plating layer covering an outer periphery of the superconducting laminate. An average crystal grain size of the Cu plating layer is 3.30 μm or more and equal to or less than a thickness of the Cu plating layer.

WAFER STACK WITH MgO DIRECTLY ON INSULATING LAYER
20230152611 · 2023-05-18 ·

A method includes depositing a crystalline magnesium oxide (MgO) seed layer directly on an amorphous insulating cladding layer by a physical vapor deposition (PVD) process, and depositing a crystalline electro-optic layer directly on the crystalline MgO seed layer.

FUNCTIONAL FILM AND PRODUCTION METHOD OF FUNCTIONAL FILM
20230146688 · 2023-05-11 · ·

A functional film provided on a base material and having a fine uneven structure on its surface of the functional includes a coating. The coating is a coating film or a coating layer of the fine uneven structure. The coating is on a surface of the base material or a constituent layer and covers at least a bumpy portion or an entire surface of the base material. The fine uneven structure includes bumps and dents whose mutual positional relationship and shape have randomness with no regularity in terms of identity or periodicity and does not generate diffracted light.

Method of forming coating layer of which composition can be controlled
11618948 · 2023-04-04 ·

The present invention relates to a method of forming a coating layer of which a composition can be controlled, the method comprising steps of: preparing a substrate inside a chamber; evaporating a deposition material to generate YF.sub.3 or YOF particles in a gas phase by irradiating an electron beam on a YF.sub.3 deposition material provided in a solid form in an electron beam source; generating radical particles having activation energy by injecting a process gas containing oxygen into a RF energy beam source; irradiating an RF energy beam including oxygen radical particles toward the substrate; controlling a composition of a thin film by generating YOF deposition particles having a modified atomic ratio by adjusting an amount of fluorine substitution by oxygen as the YF.sub.3 or YOF particles and the oxygen radical particles react, and depositing the YOF deposition particles on the substrate with the RF energy beam.

TECHNIQUES AND APPARATUS FOR SELECTIVE SHAPING OF MASK FEATURES USING ANGLED BEAMS
20230135735 · 2023-05-04 · ·

A method may include providing a set of features in a mask layer, wherein a given feature comprises a first dimension along a first direction, second dimension along a second direction, orthogonal to the first direction, and directing an angled ion beam to a first side region of the set of features in a first exposure, wherein the first side region is etched a first amount along the first direction. The method may include directing an angled deposition beam to a second side region of the set of features in a second exposure, wherein a protective layer is formed on the second side region, the second side region being oriented perpendicularly with respect to the first side region. The method may include directing the angled ion beam to the first side region in a third exposure, wherein the first side region is etched a second amount along the first direction.

LOADED BODY, APPARATUS FOR PRODUCINGLOADED BODY AND METHOD FOR PRODUCING LOADED BODY

Nanoclusters are produced in a gas phase using a nanocluster manufacturing section including: a vacuum container; a sputtering source that has a target as a cathode, performs magnetron sputtering by pulse discharge, and generates plasma; a pulse power source that supplies pulsed power to the sputtering source; a first inert gas supply section that supplies a first inert gas to the sputtering source; a nanocluster growth cell that is contained in the vacuum container; and a second inert gas introduction section that introduces a second inert gas into the nanocluster growth cell. A multitude of supports are rolled in the gas phase and each of the supports is sprinkled with a multitude of nanoclusters to cause each support to support the multitude of nanoclusters.

Metal powder particles

A method for surface treatment of a metal material in a powder state is provided, the method including obtaining a powder formed from a plurality of particles of the metal material to be treated; and subjecting the powder to an ion implantation process by directing a beam of singly-charged or multi-charged ions towards an outer surface of the particles, the beam being produced by a source of singly-charged or multi-charged ions, whereby the particles have an overall spherical shape with a radius (R). There is also provided a material in a powder state formed from a plurality of particles having a ceramic outer layer and a metal core, the particles having an overall spherical shape.

BORON DOPED TA-C COATING FOR ENGINE COMPONENTS
20170362965 · 2017-12-21 ·

An engine component, for example a piston ring, including a wear resistant coating applied by physical vapor deposition (PVD) is provided. The coating includes tetrahedral amorphous carbon (ta-C), the carbon of the coating includes sp.sup.3 hybrid orbitals, and the coating includes boron in an amount of 0.1 wt. % to 4.0 wt. %, based on the total weight of the coating. The doped boron makes the coating less sensitive to the ion energy during the physical vapor deposition (PVD) process, improves adhesion of the coating, and expected to reduce compressive stress in the coating. Thus, the boron-doped ta-C coating can be applied to a greater thickness compared to ta-C coatings without the doped boron. In addition, there is a strong indication that the addition of boron will maintain a high level of sp.sup.3 bonded carbon and a high microhardness.

ANTI-REFLECTIVE COATINGS FOR IR-TRANSMITTING SUBSTRATES
20230193452 · 2023-06-22 ·

Optical elements including YbF.sub.3 layers with high transmittance in the LWIR spectral range are described. The YbF.sub.3 layer is produced by an ion-assisted deposition process under high voltage conditions. Dense, uniform, and nearly defect-free YbF.sub.3 layers are formed. The improved material quality of the YbF.sub.3 layers leads to low absorption in the LWIR spectral range, especially at wavelengths above 10.0 microns. The extinction coefficient of the YbF.sub.3 layers is less than 0.0400 at a wavelength of 13.5 microns.

Method for forming conductive mesh pattern, and mesh electrode and laminate manufactured thereby

The present invention relates to a method for manufacturing a conductive mesh pattern, a mesh electrode manufactured by the same, and a laminate.