A mask and a method of manufacturing the same are disclosed. The method of manufacturing a mask includes forming a conductive layer on a pattern region and an auxiliary region around the pattern region of a substrate, placing the substrate including the conductive layer in a plating bath, forming a plating layer on the conductive layer, and separating the substrate and the conductive layer from the plating layer.

A mask and a method of manufacturing the same are disclosed. The method of manufacturing a mask includes forming a conductive layer on a pattern region and an auxiliary region around the pattern region of a substrate, placing the substrate including the conductive layer in a plating bath, forming a plating layer on the conductive layer, and separating the substrate and the conductive layer from the plating layer.

A rotary cathode assembly includes a cathode having a tube shape and defining a hollow center, a shield surrounding the cathode, the shield defining an access opening that exposes a portion of the cathode, and a rotary magnet subassembly disposed within the hollow center of the cathode. The rotary magnet subassembly includes a first magnetic component having a first magnetic field strength and a second magnetic component having a second magnetic field strength. The first magnetic field strength is greater than the second magnetic field strength. Characteristically, the first magnet component and the second magnetic component are rotatable between a first position in which the first magnetic component faces the access opening and a second position in which the second magnetic component faces the access opening. A coating system including the rotary cathode assembly is also provided.

A mask assembly, an apparatus for manufacturing a display device, and a method of manufacturing a display device are provided. A mask assembly includes: a mask frame including a frame body portion and dividers, the frame body portion being arranged at an outside of the mask frame, and the dividers dividing an inside of the frame body portion into a plurality of openings, each of the dividers being connected in a first direction and a second direction; and a plurality of mask sheets arranged on a top surface of the mask frame, coupled to the mask frame, and including at least one pattern opening, mask sheets of the plurality of mask sheets being apart from each other in the first direction.

A mask assembly, an apparatus for manufacturing a display device, and a method of manufacturing a display device are provided. A mask assembly includes: a mask frame including a frame body portion and dividers, the frame body portion being arranged at an outside of the mask frame, and the dividers dividing an inside of the frame body portion into a plurality of openings, each of the dividers being connected in a first direction and a second direction; and a plurality of mask sheets arranged on a top surface of the mask frame, coupled to the mask frame, and including at least one pattern opening, mask sheets of the plurality of mask sheets being apart from each other in the first direction.

A film-forming apparatus comprises: a processing chamber defining a processing space, a first sputter-particle emitter and a second sputter-particle emitter having targets, respectively, from which sputter-particles are emitted in different oblique directions in the processing space, a sputter-particle blocking plate having a passage hole through which the sputter particles emitted from the first sputter-particle emitter and the second sputter-particle emitter pass, a substrate support configured to support a substrate and provided at a side opposite the first sputter-particle emitter and the second sputter-particle emitter with respect to the sputter-particle blocking plate in the processing space, a substrate moving mechanism configured to linearly move the substrate supported on the substrate support, and a controller configured to control the emission of sputter-particles from the first sputter-particle emitter and the second sputter-particle emitter while controlling the substrate moving mechanism to move the substrate linearly.

A film-forming apparatus comprises: a processing chamber defining a processing space, a first sputter-particle emitter and a second sputter-particle emitter having targets, respectively, from which sputter-particles are emitted in different oblique directions in the processing space, a sputter-particle blocking plate having a passage hole through which the sputter particles emitted from the first sputter-particle emitter and the second sputter-particle emitter pass, a substrate support configured to support a substrate and provided at a side opposite the first sputter-particle emitter and the second sputter-particle emitter with respect to the sputter-particle blocking plate in the processing space, a substrate moving mechanism configured to linearly move the substrate supported on the substrate support, and a controller configured to control the emission of sputter-particles from the first sputter-particle emitter and the second sputter-particle emitter while controlling the substrate moving mechanism to move the substrate linearly.

Methods and apparatus for passivating a target are provided herein. For example, a method includes a) supplying an oxidizing gas into an inner volume of the process chamber; b) igniting the oxidizing gas to form a plasma and oxidize at least one of a target or target material deposited on a process kit disposed in the inner volume of the process chamber; and c) performing a cycle purge comprising: c1) providing air into the process chamber to react with the at least one of the target or target material deposited on the process kit; c2) maintaining a predetermined pressure for a predetermined time within the process chamber to generate a toxic by-product caused by the air reacting with the at least one of the target or target material deposited on the process kit; and c3) exhausting the process chamber to remove the toxic by-product.

An alpha-alumina coated turbocharger turbine wheel includes a hub portion, a plurality of blades disposed about the hub portion, each blade of the plurality of blades having a leading edge and a trailing edge, a centerline passing axially through the hub portion, and a back-side wall defined radially between the leading edge of each blade of the plurality of blades and the centerline. The turbocharger turbine wheel is made of a metal alloy and a surface coating layer of alpha-alumina. The surface coating layer of alpha-alumina may be disposed only on the hub portion, the plurality of blades, and a radially-outer portion of the back-side wall. The radially-outer portion is defined between a radial distance from the centerline and the leading edge of each blade of the plurality of blades. Alternatively, the surface coating layer of alpha-alumina may be disposed on the hub portion, the plurality of blades, and an entirety of the back-side wall.

An alpha-alumina coated turbocharger turbine wheel includes a hub portion, a plurality of blades disposed about the hub portion, each blade of the plurality of blades having a leading edge and a trailing edge, a centerline passing axially through the hub portion, and a back-side wall defined radially between the leading edge of each blade of the plurality of blades and the centerline. The turbocharger turbine wheel is made of a metal alloy and a surface coating layer of alpha-alumina. The surface coating layer of alpha-alumina may be disposed only on the hub portion, the plurality of blades, and a radially-outer portion of the back-side wall. The radially-outer portion is defined between a radial distance from the centerline and the leading edge of each blade of the plurality of blades. Alternatively, the surface coating layer of alpha-alumina may be disposed on the hub portion, the plurality of blades, and an entirety of the back-side wall.