A bearing table and a fabrication method thereof as well as a processing device and an operation method thereof. The bearing table includes a bearing substrate; an electrically conductive layer disposed on the bearing substrate; and an insulation layer covering the electrically conductive layer disposed on the bearing substrate. The electrically conductive layer is configured to provide electrostatic adsorption. conductive layer

A bearing table and a fabrication method thereof as well as a processing device and an operation method thereof. The bearing table includes a bearing substrate; an electrically conductive layer disposed on the bearing substrate; and an insulation layer covering the electrically conductive layer disposed on the bearing substrate. The electrically conductive layer is configured to provide electrostatic adsorption. conductive layer

An apparatus for vacuum deposition on a substrate is provided. The apparatus includes a vacuum chamber having a deposition area, one or more deposition sources in the deposition area and configured for vacuum deposition on the substrate while the substrate is transported along a transport direction past the one or more deposition sources, and a masking arrangement in the deposition area and configured for masking at least one of a first edge portion and a second edge portion of the substrate while the substrate passes the masking arrangement and the one or more deposition sources. The first edge portion and the second edge portion are opposite edge portions of the substrate.

A holder for securing at least one rod-shaped substrate body having a variable cross-section along the substrate body has a substrate body region BQ1 comprising a surface to be treated. The holder comprises at least one perforated wall as the front wall, the wall having at least one opening, and also comprises a support element and a retaining element. The support element is constructed and/or secured in the opening in such a way that at least part of the substrate body can be arranged longitudinally and obliquely in the support element and the retaining element is constructed and/or secured in the opening in such a way that the retaining element can retain the substrate body at a point between the region BQ1 and the remainder of the substrate body such that the region BQ1 protrudes from the holder through the opening.

A holder for securing at least one rod-shaped substrate body having a variable cross-section along the substrate body has a substrate body region BQ1 comprising a surface to be treated. The holder comprises at least one perforated wall as the front wall, the wall having at least one opening, and also comprises a support element and a retaining element. The support element is constructed and/or secured in the opening in such a way that at least part of the substrate body can be arranged longitudinally and obliquely in the support element and the retaining element is constructed and/or secured in the opening in such a way that the retaining element can retain the substrate body at a point between the region BQ1 and the remainder of the substrate body such that the region BQ1 protrudes from the holder through the opening.

A sputtering apparatus according to one embodiment of the present invention includes a substrate holder, a cathode unit arranged at a position diagonally opposite to the substrate holder, a position sensor for detecting a rotational position of the substrate, and a holder rotation controller for adjusting a rotation speed of the substrate according to the detected rotational position. The holder rotation controller controls the rotation speed so that the rotation speed of the substrate when the cathode unit is located on a side in a first direction as an extending direction of a process target surface of the relief structure is lower than the rotation speed of the substrate when the cathode unit is located on a side in a second direction which is perpendicular to the first direction along the rotation of the substrate.

Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapor distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3). From the two-component vapor coating substance vapor is applied to substrate 5 to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP2).

Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapor distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3). From the two-component vapor coating substance vapor is applied to substrate 5 to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP2).

A box coating apparatus for vacuum coating of substrates comprises a vacuum chamber which contains an evaporation source for evaporating coating material and a substrate holder disposed vis--vis to the evaporation source so that coating material evaporated by the evaporation source can impinge on substrates held by the substrate holder. An electric heating device is centrally arranged in the vacuum chamber, which is constructed to heat up the vacuum chamber during vacuum check and cleaning routines. So as to be removable from the vacuum chamber prior to the deposition processes, the heating device is provided with a stand having a plurality of leg portions mounted to a base plate, which are sized and constructed at the base plate so that the heating device can be placed over and above the evaporation source.

A box coating apparatus for vacuum coating of substrates comprises a vacuum chamber which contains an evaporation source for evaporating coating material and a substrate holder disposed vis--vis to the evaporation source so that coating material evaporated by the evaporation source can impinge on substrates held by the substrate holder. An electric heating device is centrally arranged in the vacuum chamber, which is constructed to heat up the vacuum chamber during vacuum check and cleaning routines. So as to be removable from the vacuum chamber prior to the deposition processes, the heating device is provided with a stand having a plurality of leg portions mounted to a base plate, which are sized and constructed at the base plate so that the heating device can be placed over and above the evaporation source.