A magnetic levitation system for transporting a carrier is described. The magnetic levitation system includes a base defining a transportation track, a carrier movable relative to the base along the transportation track, and a plurality of active magnetic bearings provided at the base and configured to face a guided structure of the carrier. The guided structure includes a first guided zone and a second guided zone configured to interact with the plurality of active magnetic bearings and a recessed zone. The recessed zone is arranged between the first guided zone and the second guided zone in a transport direction of the carrier and is recessed with respect to the first guided zone and the second guided zone.

A substrate cooling unit includes a substrate holding mechanism holding a substrate horizontally, a driver that raises and lowers the substrate holding mechanism, a cooling plate having a surface facing a surface of the substrate, a laser emitter disposed at one lateral end of a space in which the substrate is raised and lowered and that emits a laser beam distributed with a width in a direction in which the substrate holding mechanism is raised and lowered and parallel to the surface of the substrate. A laser receiver disposed at the other lateral end of the space and that acquires light receiving position specifying information indicating a position at which the laser beam is received in the direction in which the substrate holding mechanism is raised and lowered. A calculator that calculates a distance between the cooling plate and the substrate based on the light receiving position specifying information.

There is provided a sputtering apparatus comprising: a target from which sputtered particles are emitted; a substrate support configured to support a substrate; a substrate moving mechanism configured to move the substrate in one direction; and a shielding member disposed between the target and the substrate support and having an opening through which the sputtered particles pass. The shielding member includes a first shielding member and a second shielding member disposed in a vertical direction.

There is provided a sputtering apparatus comprising: a target from which sputtered particles are emitted; a substrate support configured to support a substrate; a substrate moving mechanism configured to move the substrate in one direction; and a shielding member disposed between the target and the substrate support and having an opening through which the sputtered particles pass. The shielding member includes a first shielding member and a second shielding member disposed in a vertical direction.

The invention relates to a workpiece carrier device (1) for holding and moving workpieces (15), having: a workpiece carrier (2) for receiving workpieces (15), which is mounted on a main frame (4) so as to rotate about an axis (3); a drive part, which can likewise rotate about the axis (3) relative to the workpiece carrier (2); and multiple workpiece holders (5), which are arranged on the workpiece carrier (2) in a ring around the drive axis and are mounted on the workpiece carrier (2) so as to rotate about holder axes (6) which are spaced from the drive axis. The holder axes (6) run in such a way in relation to the axis (3) that the workpiece holders (5) form a conical crown arrangement (7). The invention further relates to a coating method using the workpiece carrier device (1) according to the invention and to workpieces or substrates (15) coated by means of the coating method (e.g, pins, pen injectors, balls, ball pins, pistons, nozzle needles etc.).

A method and system for vacuum vapor deposition of a deposition material to form functional materials, including a coating, a thin film material, or a thick film material, upon a substrate in space utilizes: a substrate support structure associated with a space platform; a depositor for the deposition material; and a moveable elongate arm associated with a space platform that provides relative movement between the substrate and the depositor.

The invention provides an apparatus that causes film formation particles to adhere to a surface of a substrate moving in a hermetically-sealable chamber and thereby forms a thin film thereon and includes: a plasma generator; a substrate transfer unit; a film-formation source supplier; and a film-formation region limiter. The plasma generator includes a magnet located at the other surface of the substrate and a gas supplier that supplies a film forming gas to near the surface of the substrate. The film-formation region limiter includes a shield that is located close to the surface of the substrate and has an opening. The ratio of a diameter of the opening of the shield to a diameter of the plasma generated by the plasma generator in a direction along the surface of the substrate is in a range of less than or equal to 110/100.

In the field of trace organic matter detection, a substrate holder for mass production of surface-enhanced Raman scattering (SERS) substrates includes a ring-shaped body and a support frame thereof. A plurality of cones are disposed on the ring-shaped body, and a plurality of substrates are pasted on both surfaces of each cone. The substrate holder allows for simultaneous deposition of silver nanorods on a plurality of substrates by glancing angle deposition method. An array film composed of the silver nanorods of a plurality of substrates has good product homogeneity, and the production efficiency of a traditional preparation method can be improved.

In the field of trace organic matter detection, a substrate holder for mass production of surface-enhanced Raman scattering (SERS) substrates includes a ring-shaped body and a support frame thereof. A plurality of cones are disposed on the ring-shaped body, and a plurality of substrates are pasted on both surfaces of each cone. The substrate holder allows for simultaneous deposition of silver nanorods on a plurality of substrates by glancing angle deposition method. An array film composed of the silver nanorods of a plurality of substrates has good product homogeneity, and the production efficiency of a traditional preparation method can be improved.

A substrate processing apparatus, a method, and a program for controlling temperature of the substrate processing apparatus. A substrate processing apparatus comprising: a mounting table configured to hold a substrate to be processed in a vacuum processing container; a heat transfer gas container placed on a back side of the mounting table with a gap between the mounting table and the heat transfer gas container and configured to be cooled by a refrigerator; and a control device configured to control heating of the refrigerator to the vicinity of a first temperature on the basis of a temperature of a first control point provided near the refrigerator and then switching the heating control for the refrigerator on or off.