A method of manufacturing a crystalline layer of material on a surface, the crystalline layer including lithium, at least one transition metal and at least one counter-ion. The method includes the following steps: generating a plasma using a remote plasma generator, plasma sputtering material from a first target including lithium onto a surface of or supported by a substrate, there being at least a first plume corresponding to trajectories of particles from the first target onto the surface, and plasma sputtering material from a second target including at least one transition metal onto the surface, there being at least a second plume corresponding to trajectories of particles from the second target onto the surface. The first target is positioned to be non-parallel with the second target, the first plume and the second plume converge at a region proximate to the surface of or supported by the substrate, and the crystalline layer is formed on the surface at the region.

A sputter deposition apparatus including: a remote plasma generation arrangement arranged to provide a plasma for sputter deposition of target material within a sputter deposition zone; a confining arrangement arranged to provide a confining magnetic field to substantially confine the plasma in the sputter deposition zone a substrate provided within the sputter deposition zone; and one or more target support assemblies arranged to support one or more targets in the sputter deposition zone so as to provide for sputter deposition of the target material on the substrate. The confining arrangement confines the remote plasma to the target support assemblies such that in use there is deposited: target material as a first region on the substrate; target material as a second region on the substrate; and an intermediate region between the first and second region with no target material.

A steel sheet is provided with a coating having at least one layer of zinc and a top layer of paint applied by cataphoresis. The zinc layer is deposited by a jet vapor deposition process in a deposition chamber maintained at a pressure between 6.Math.10.sup.−2 mbar and 2.Math.10.sup.−1 mbar. A fabrication method and an installation are also provided.

A steel sheet is provided with a coating having at least one layer of zinc and a top layer of paint applied by cataphoresis. The zinc layer is deposited by a jet vapor deposition process in a deposition chamber maintained at a pressure between 6.Math.10.sup.−2 mbar and 2.Math.10.sup.−1 mbar. A fabrication method and an installation are also provided.

A sputter deposition apparatus including: a remote plasma generation arrangement arranged to provide a plasma for sputter deposition of target material within a sputter deposition zone; a confining arrangement arranged to provide a confining magnetic field to substantially confine the plasma in the sputter deposition zone a substrate provided within the sputter deposition zone; and one or more target support assemblies arranged to support one or more targets in the sputter deposition zone so as to provide for sputter deposition of the target material on the substrate. The confining arrangement confines the remote plasma to the target support assemblies such that in use there is deposited: target material as a first region on the substrate; target material as a second region on the substrate; and an intermediate region between the first and second region including a blend of target materials.

A method of forming a crystalline cathode layer of a solid-state battery on a substrate, the method including generating a plasma remote from one or more sputter targets for forming the cathode layer, generating sputtered material from the target or targets using the plasma, and depositing the sputtered material on the substrate, thereby forming the crystalline cathode layer.

A flow rate adjustment valve includes: a flow path portion which has one end at which an opening is formed, and in which a fluid flows; a lifting valve which is configured to close the opening by covering an entire region of the opening, open the opening by being separated from the opening in an opening direction of the opening, and change a distance from the opening in the opening direction to change a flow area with respect to the opening; and a servo actuator as a driver which moves the lifting valve in the opening direction based on a predetermined detection value.

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition. In certain embodiments, the device includes a counter electrode having an anodically coloring electrochromic material in combination with an additive.

There is provided a configuration that includes: an intake damper and an intake fan configured to communicate with an intake port that sucks air to a transfer chamber connected to a process chamber; a valve of an inert gas introduction pipe configured to supply an inert gas to the transfer chamber; an exhaust fan and a first exhaust valve installed in the transfer chamber; a switch configured to select one of an atmospheric mode in which an atmosphere of the transfer chamber is an air atmosphere and a purge mode in which the atmosphere of the transfer chamber is an inert gas atmosphere; and a controller configured to control each of the intake damper, the intake fan, the valve of the inert gas introduction pipe, the exhaust fan, and the first exhaust valve to execute one of the atmospheric mode and the purge mode.

Processing a flexible substrate of a matrix-shaped or lattice-shaped construction material. A first layer thereof is transported in a first transport direction, and a second layer thereof is transported in parallel with and closely spaced apart from the first layer in an opposite, second transport direction through a free region in the evacuable process area. A usable flux of a processing instrument penetrates the first and the second layer of the flexible substrate simultaneously while transported through the free region in an opposite direction. Also, a vacuum processing system including two roller groups, each group including smaller and larger rollers deflecting the flexible substrate. The free region including a processing instrument arranged between the roller groups through which the flexible substrate is transported in an opposite direction and without directional change. At least two closely spaced apart layers of the flexible substrate are transported in opposite directions.