A process of forming a thin film photoactive layer of an optoelectronic device comprising: providing a substrate having a surface comprising or coated with a metal M selected from at least one of Pb, Sn, Ge, Si, Ti, Bi, or In; and converting the metal surface or metal coating of the substrate to a perovskite layer.

A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a first plurality of regions disposed within the monolayer such that each of the first plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material.

The present invention relates to a method for producing a layer (2) of aluminum oxide and/or aluminum nitride (Al.sub.2O.sub.3, or AIN) on a substrate (1), said method comprising a sequence of consecutive steps a) and b) according to which: a) a basic layer of aluminum (21, 22) having a thickness between 5 and 25 nm is deposited on the substrate (1) in a deposition chamber (10), b) the substrate (1) is moved into a treatment chamber (20) separate from the deposition chamber (10), in which the basic layer of aluminum (21, 22) is oxidized or nitrided to produce a basic layer of aluminum oxide or aluminum nitride (21 22). Said sequence of consecutive steps is repeated in a loop until said layer of aluminum oxide and/or aluminum nitride (2) is obtained by stacking the consecutive layers of aluminum oxide and aluminum nitride (21 22).

An article comprises a body having a coating. The coating comprises a YOF coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.

An article comprises a body having a coating. The coating comprises a YOF coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.

An article comprises a body having a coating. The coating comprises a Y-O-F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.

Provided is a fabrication method for a composite planar pH sensor modified by graphene film. The fabrication method includes the steps of: slotting into substrate, setting copper foil on both sides, and setting leads on the copper foil; coating graphene film on the copper foils using micro mechanical stripping method to form the first graphene film and the second graphene film; depositing Sb layer and Sb.sub.2O.sub.3 layer successively on the first graphene film by magnetron sputtering method, and coating Nafion membrane on the Sb.sub.2O.sub.3 layer by spin-coating method to fabricate pH working electrode; depositing Ag layer on the second graphene film and dipping in FeCl.sub.3 solution to form AgCl layer; coating the third graphene film on the AgCl layer to fabricate reference electrode. The method can be used for fabricating the composite planar pH sensor modified by graphene film with the feature of quick response, good stability and good reproducibility, and the sensor can be used in pH measurement for solid, semisolid, mash and solution samples.

A timepiece part includes: a substrate; and a first coating configured from a material containing cobalt as a primary component, and 26 mass % to 30 mass % of Cr, and 5 mass % to 7 mass % of Mo. The first coating has an average signal intensity of oxygen of 0 counts/sec to 150 counts/sec as measured by SIMS relative to a 1.0 m-thick reference film of a composition containing Co: 62.8 mass %, Cr: 28.2 mass %, Mo: 6.0 mass %, C: 1.5 mass %, and Ar: 1.5 mass %.

[Object] To provide an anti-reflection film having a high light resistance and maintaining low reflection within wide wavelength bands, an optical component, an optical device, and a method of producing an anti-reflection film. [Solving Means] The anti-reflection film according to the invention is made of an inorganic material transparent in a visible light region, the inorganic material has a fine concave-convex structure including convex portions and concave portions each having a width equal to or smaller than a wavelength of visible light, and the concave portion has an aspect ratio of 1.5 or more.

A system for providing a pre-deposition treatment (e.g., of a work-function layer) to accomplish work function tuning. In various embodiments, a gate dielectric layer is formed over a substrate, and a work-function metal layer is deposited over the gate dielectric layer. In some embodiments, a first in-situ process including a pre-treatment process of the work-function metal layer is performed. By way of example, the pre-treatment process removes an oxidized layer of the work-function metal layer to form a treated work-function metal layer. In some embodiments, after performing the first in-situ process, a second in-situ process including a deposition process of another metal layer over the treated work-function metal layer is performed.