A catalyst is imparted selectively to a plateable material portion 32 by performing a catalyst imparting processing on a substrate W having a non-plateable material portion 31 and the plateable material portion 32 formed on a surface thereof. Then, a hard mask layer 35 is formed selectively on the plateable material portion 32 by performing a plating processing on the substrate W. The non-plateable material portion 31 is made of SiO.sub.2 as a main component, and the plateable material portion 32 is made of a material including, as a main component, a material containing at least one of a OCH.sub.x group and a NH.sub.x group, a metal material containing Si as a main component, a material containing carbon as a main component or a catalyst metal material.

Provided is a mask frame assembly for thin film deposition. The mask frame assembly includes a mask frame having an opening surrounded by the mask frame; and a support extending across the opening to support a mask on the mask frame. The support includes a support body, a plurality of ribs in the support body, and one or more patterned portions in spaces between the plurality of ribs, the one or more patterned portions having a different thickness than the ribs.

A deposition apparatus includes a chamber, a support in the chamber, the support supporting a substrate, a deposition source in the chamber, the deposition source being above the support and emitting one or more deposition materials toward the substrate, a mask between the support and the deposition source, the mask including a deposition region having one or more openings, the one or more deposition materials passing through the one or more openings, and an edge region having a plurality of first slits, the edge region surrounding the deposition region, and a first coating layer on a first surface of the mask, the first surface of the mask facing the substrate.

The present disclosure is directed to a method for coating a component of a gas turbine engine. The method includes isolating a first portion of the component of the gas turbine engine from a second portion of the component. The method also includes simultaneously depositing a first coating material on the first portion of the component and a second coating material on the second portion of the component, wherein the first and second coating materials are different.

A vapor deposition device (50) disclosed, a partition wall (26) standing between film formation regions on a film formation substrate (200), includes: a mask unit (80) including a shadow mask (81) and a vapor deposition source (85) fixed in position relative to each other; contacting means for bringing the film formation substrate (200) and the shadow mask (81) into contact with each other at the partition wall (26); and moving means for moving at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof in a state in which the contact caused by the contacting means is kept.

Methods are provided herein for deposition of oxide films. Oxide films may be deposited, including selective deposition of oxide thin films on a first surface of a substrate relative to a second, different surface of the same substrate. For example, an oxide thin film such as an insulating metal oxide thin film may be selectively deposited on a first surface of a substrate relative to a second, different surface of the same substrate. The second, different surface may be an organic passivation layer.

The present disclosure provides a method of fabricating a diamond membrane. The method comprises providing a substrate and a support structure. The substrate comprises a diamond material having a first surface and the substrate further comprises a sub-surface layer that is positioned below the first surface and has a crystallographic structure that is different to that of the diamond material. The sub-surface layer is positioned to divide the diamond material into first and second regions wherein the first region is positioned between the first surface and the sub-surface layer. The support structure also comprises a diamond material and is connected to, and covers a portion of, the first surface of the substrate. The method further comprises selectively removing the second region of the diamond material from the substrate by etching away at least a portion of the sub-surface layer of the substrate.

A mask includes a mask sheet provided with a plurality of open areas defined therein in a plan view and a mask frame which supports the mask sheet. The mask sheet includes a first portion including a first surface, where the first surface is configured to be in contact with a target substrate, and a second portion disposed on the first portion, extending from a top of the first portion in a first direction and including a second surface defining the open area. The second surface is an inclined surface inclined downward with respect to the first direction, and the first direction is parallel to a plane in which the first surface is included.

A method of manufacturing a deposition mask includes preparing a mask-target substrate which has one surface on which a sacrificed layer pattern is formed and comprises a cover area covered by the sacrificed layer pattern and a plurality of exposed areas exposed by the sacrificed layer pattern; forming holes in the exposed areas of the mask-target substrate by emitting laser toward the mask-target substrate; and removing the sacrificed layer pattern, wherein the sacrificed layer pattern has a higher reflectance with respect to the laser than a reflectance of the mask-target substrate.

A deposition apparatus is disclosed. In one aspect, the apparatus includes a metal sheet of which an edge portion is integrally combined with a sheet frame and an electrostatic chuck attached to a bottom surface of the metal sheet and configured to pull a substrate based on a static electricity force. The apparatus also includes a metal mask placed below the electrostatic chuck, wherein an edge portion of the metal mask is combined with a mask frame, and wherein the metal mask has a predetermined patterned opening where the substrate is mounted to the upper surface thereof. The apparatus further includes a magnet plate placed above the metal sheet, and configured to pull the metal mask based on a magnetic force so as to attach the substrate to the electrostatic chuck.