Patent classifications
C23C16/453
Layered transparent conductive oxide thin films
Transparent conductive oxide thin films having a plurality of layers with voids located at each interface. Smooth TCO surfaces with no post growth processing and a largely tunable haze value. Methods of making include applying multiple layers of a conductive oxide onto a surface of a substrate, and interrupting the application between the multiple layers to form a plurality of voids at the interfaces.
Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof
A device and a method for continuous chemical vapor deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open sides of which the substrates are guided, as a result of which the corresponding coatings can be effected on the side of the substrates which is orientated towards the chamber interior.
Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof
A device and a method for continuous chemical vapor deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open sides of which the substrates are guided, as a result of which the corresponding coatings can be effected on the side of the substrates which is orientated towards the chamber interior.
METALLIC OR METALLIZED, GRAPHENIZED REINFORCEMENT
A threadlike metallic or metallized reinforcer, for example a thread, film, tape or cord made of carbon steel, at the periphery of which is positioned a layer of metal referred to as surface metal chosen from copper, nickel and copper/nickel alloys, is characterized in that this surface metal layer is itself coated, at least in part, with at least one layer of graphene; preferably, there is grafted, to this graphene, at least one functional group which can crosslink to a polymer matrix. This reinforcer of the invention is effectively protected from corrosion by virtue of the graphene present at the surface; advantageously, it can be adhesively bonded directly, without adhesion primer or addition of metal salt, to an unsaturated rubber matrix, such as natural rubber, by virtue of the possible functionalization of this graphene.
Flame guard and exhaust system for large area combustion deposition line, and associated methods
Certain example embodiments relate to an in-line scalable system that may be used in the combustion deposition depositing of thin films. The systems of certain example embodiments may comprise one or more modules, with each such module including at least one burner and at least one high volume cooling section. In certain example implementations, multiple burners and multiple cooling sections are provided to a single module in alternating order. The systems of certain example embodiments may, in addition or in the alternative, comprise a combined flame guard and exhaust system. The combined flame guard and exhaust system of certain example embodiments advantageously may provide a means to reduce the amount of interference of the deposition process by ambient conditions, improve flame uniformity in the deposition zone, contain and exhaust combustion products while reducing restrictions to the stable operating space of the combustion deposition process, etc.
Flame guard and exhaust system for large area combustion deposition line, and associated methods
Certain example embodiments relate to an in-line scalable system that may be used in the combustion deposition depositing of thin films. The systems of certain example embodiments may comprise one or more modules, with each such module including at least one burner and at least one high volume cooling section. In certain example implementations, multiple burners and multiple cooling sections are provided to a single module in alternating order. The systems of certain example embodiments may, in addition or in the alternative, comprise a combined flame guard and exhaust system. The combined flame guard and exhaust system of certain example embodiments advantageously may provide a means to reduce the amount of interference of the deposition process by ambient conditions, improve flame uniformity in the deposition zone, contain and exhaust combustion products while reducing restrictions to the stable operating space of the combustion deposition process, etc.
Plasma processing apparatus and method, and method of manufacturing electronic device
In an inductively coupled plasma torch unit, two coils, a first ceramic block, and a second ceramic block are arranged, and an annular chamber is provided. Plasma generated in the chamber is ejected toward a substrate through an opening in the chamber. The chamber and the substrate are caused to relatively move having an orientation perpendicular to a longitudinal direction of the opening, thereby processing the substrate. A shield cylinder is disposed around the coil inside a rotating cylindrical ceramic tube, thereby making it possible to achieve compatibility of ignitibility and shielding properties.
DICHLOROSILANE COMPENSATING CONTROL STRATEGY FOR IMPROVED POLYCRYSTALLINE SILICON GROWTH
A method of improving polycrystalline silicon growth in a reactor, including: introducing a chlorosilane feed composition comprising trichlorosilane and dichlorosilane into a deposition chamber, wherein the deposition chamber contains a substrate; blending the chlorosilane feed composition with hydrogen gas to form a feed composition; adjusting a baseline flow of chlorosilane and hydrogen gas into the deposition chamber to achieve a pre-determined total flow and a pre-determined chlorosilane feed composition set point; applying pressure to the deposition chamber and energy to the substrate in the deposition chamber to form polycrystalline silicon; measuring the amount of dichlorosilane present in the chlorosilane feed composition and determining an offset value from a target value of dichlorosilane present in the chlorosilane feed composition; adjusting the chlorosilane feed composition set point by an amount inversely proportional to the dichlorosilane offset value; and depositing the formed polycrystalline silicon onto the substrate.
CNT-infused metal fiber materials and process therefor
A composition includes a carbon nanotube (CNT)-infused metal fiber material which includes a metal fiber material of spoolable dimensions, a barrier coating conformally disposed about the metal fiber material, and carbon nanotubes (CNTs) infused to the metal fiber material. A continuous CNT infusion process includes: (a) disposing a barrier coating and a carbon nanotube (CNT)-forming catalyst on a surface of a metal fiber material of spoolable dimensions; and (b) synthesizing carbon nanotubes on the metal fiber material, thereby forming a carbon nanotube-infused metal fiber material.
CNT-infused metal fiber materials and process therefor
A composition includes a carbon nanotube (CNT)-infused metal fiber material which includes a metal fiber material of spoolable dimensions, a barrier coating conformally disposed about the metal fiber material, and carbon nanotubes (CNTs) infused to the metal fiber material. A continuous CNT infusion process includes: (a) disposing a barrier coating and a carbon nanotube (CNT)-forming catalyst on a surface of a metal fiber material of spoolable dimensions; and (b) synthesizing carbon nanotubes on the metal fiber material, thereby forming a carbon nanotube-infused metal fiber material.