C23C16/453

Pulsed valve manifold for atomic layer deposition

A vapor deposition device includes a reactor including a reaction chamber and an injector for injecting vapor into the reaction chamber. The device also includes a manifold for delivering vapor to the injector. The manifold includes a manifold body having an internal bore, a first distribution channel disposed within the body in a plane intersecting the longitudinal axis of the bore, and a plurality of supply channels disposed within the body and in flow communication with the first distribution channel and with the bore. Each of the first supply channels is disposed at an acute angle with respect to the longitudinal axis of the bore, and each of the supply channels connects with the bore at a different angular position about the longitudinal axis. The distribution channel (and thus, the supply channels) can be connected with a common reactant source. Related deposition methods are also described.

Method for high-velocity and atmospheric-pressure atomic layer deposition with substrate and coating head separation distance in the millimeter range

An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.

Method for high-velocity and atmospheric-pressure atomic layer deposition with substrate and coating head separation distance in the millimeter range

An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.

METHOD OF PRODUCING A FABRIC HAVING HYDRO- AND OLEOPHOBIC CHARACTERISTICS

The invention relates to a method of producing a fabric having a halogen free plasma coating, having a hydro- and oleophobic characteristics, wherein the method comprises: step DHF of depositing a plasma coating on the fabric by means of plasma polymerization of a halogen free precursor monomer by plasma-enhanced chemical vapor deposition method (PECVD), wherein the halogen free precursor monomer are organosilane, siloxane and/or hydrocarbon precursors, wherein the plasma-enhanced chemical vapor deposition is carried out as a low-pressure plasma processes under protective atmosphere, wherein the fabric comprises of a woven monofilament fabric of polymeric material having a filament diameter between 10 m to 150 m and a mesh opening between 5 m and 200 m.

METHOD OF PRODUCING A FABRIC HAVING HYDRO- AND OLEOPHOBIC CHARACTERISTICS

The invention relates to a method of producing a fabric having a halogen free plasma coating, having a hydro- and oleophobic characteristics, wherein the method comprises: step DHF of depositing a plasma coating on the fabric by means of plasma polymerization of a halogen free precursor monomer by plasma-enhanced chemical vapor deposition method (PECVD), wherein the halogen free precursor monomer are organosilane, siloxane and/or hydrocarbon precursors, wherein the plasma-enhanced chemical vapor deposition is carried out as a low-pressure plasma processes under protective atmosphere, wherein the fabric comprises of a woven monofilament fabric of polymeric material having a filament diameter between 10 m to 150 m and a mesh opening between 5 m and 200 m.

Method and apparatus for coating containers
12441515 · 2025-10-14 · ·

Provided is a method for coating containers, and in particular beverage containers which are suitable and intended to receive a liquid, wherein the container to be coated has a main body, a shoulder region, a base region and a mouth region, wherein for coating of an inner wall and/or an outer wall of the container a silicon-containing coating material is produced from a flowable precursor, which is applied to the inner wall and/or the outer wall of the container. The container to be coated is a container made from a fiber-based material.

Method and apparatus for coating containers
12441515 · 2025-10-14 · ·

Provided is a method for coating containers, and in particular beverage containers which are suitable and intended to receive a liquid, wherein the container to be coated has a main body, a shoulder region, a base region and a mouth region, wherein for coating of an inner wall and/or an outer wall of the container a silicon-containing coating material is produced from a flowable precursor, which is applied to the inner wall and/or the outer wall of the container. The container to be coated is a container made from a fiber-based material.

METHOD OF COATING A SUBSTRATE INCLUDING A MULTI-LAYER COATING

Described herein is a method for forming a multi-layer coating including a first layer comprising a metal oxide layer on a surface of a chamber component and a second layer comprising a rare earth fluoride layer on the metal oxide layer. The method further includes removing surface oxidation on the rare earth fluoride layer using a wet clean process.

METHOD OF COATING A SUBSTRATE INCLUDING A MULTI-LAYER COATING

Described herein is a method for forming a multi-layer coating including a first layer comprising a metal oxide layer on a surface of a chamber component and a second layer comprising a rare earth fluoride layer on the metal oxide layer. The method further includes removing surface oxidation on the rare earth fluoride layer using a wet clean process.

METHOD FOR UNIFORM INSULATIVE LAYER DEPOSITION IN HYBRID MATERIALS
20250389021 · 2025-12-25 ·

The present disclosure provides a method of producing a hybrid material comprising a first set of combustion chambers producing a combustion, a substrate at least once receiving a combustion product from the combustion chambers, and the substrate undergoing a combination of translational motion and independent dynamic adjustments before or as the substrate receives the combustion product. The translational movement may be generated by a conveyor system. The method may further comprise passing the substrate through a cooling environment after receiving the combustion product and passing the substrate through the combustion chamber multiple times to form a single insulation layer or multiple insulation layers. The independent dynamic adjustments create a more uniform insulation layer thickness and may be randomized. The combustion chambers may produce combustion at a variety of intensities, and the independent dynamic adjustments offset deposition irregularities caused by the variety of combustion intensities to improve uniformity.