A gas branching apparatus that branches and supplies a gas to first to N-th supply targets, includes first to N-th pipes wherein the first to N-th pipes are each branched into first to N-th branch pipes on a downstream end side, and wherein the i-th branch pipes of the respective first to N-th pipes are connected in common to the i-th supply target, and the i-th branch pipes of the respective first to N-th pipes are provided with valves, respectively, where i denotes each of integers of 1 to N.

A threadlike metallic or metallized reinforcer, for example a thread, film, tape or cord made of carbon steel, at the periphery of which is positioned a layer of metal referred to as surface metal chosen from copper, nickel and copper/nickel alloys, is characterized in that this surface metal layer is itself coated, at least in part, with at least one layer of graphene; preferably, there is grafted, to this graphene, at least one functional group which can crosslink to a polymer matrix. This reinforcer of the invention is effectively protected from corrosion by virtue of the graphene present at the surface; advantageously, it can be adhesively bonded directly, without adhesion primer or addition of metal salt, to an unsaturated rubber matrix, such as natural rubber, by virtue of the possible functionalization of this graphene.

A threadlike metallic or metallized reinforcer, for example a thread, film, tape or cord made of carbon steel, at the periphery of which is positioned a layer of metal referred to as surface metal chosen from copper, nickel and copper/nickel alloys, is characterized in that this surface metal layer is itself coated, at least in part, with at least one layer of graphene; preferably, there is grafted, to this graphene, at least one functional group which can crosslink to a polymer matrix. This reinforcer of the invention is effectively protected from corrosion by virtue of the graphene present at the surface; advantageously, it can be adhesively bonded directly, without adhesion primer or addition of metal salt, to an unsaturated rubber matrix, such as natural rubber, by virtue of the possible functionalization of this graphene.

A shaping tooling for chemical vapor infiltration of a fiber preform includes a structural enclosure formed by supports each provided with a multiply-perforated zone. Each of the supports has in its inside face an uncased zone that includes the multiply-perforated zone. The shaping tooling further includes first and second shaping mold functional elements, each present in a respective one of the uncased zones of the support. Each shaping mold functional element has a first face of a determined shape corresponding to the shape of the part that is to be made and a second face that is held facing the inside face of a support. Each functional element has a plurality of perforations and presents a number of perforations, a size of perforations, or a shape of perforations that differs from the number, the size, or the shape of the perforations present in the facing support.

A shaping tooling for chemical vapor infiltration of a fiber preform includes a structural enclosure formed by supports each provided with a multiply-perforated zone. Each of the supports has in its inside face an uncased zone that includes the multiply-perforated zone. The shaping tooling further includes first and second shaping mold functional elements, each present in a respective one of the uncased zones of the support. Each shaping mold functional element has a first face of a determined shape corresponding to the shape of the part that is to be made and a second face that is held facing the inside face of a support. Each functional element has a plurality of perforations and presents a number of perforations, a size of perforations, or a shape of perforations that differs from the number, the size, or the shape of the perforations present in the facing support.

A method of depositing a layer includes measuring a physical property that is related to an air pressure in a reactor chamber of a deposition apparatus. A main gas mixture including a source gas and an auxiliary gas is introduced into the reactor chamber at atmospheric pressure, the source gas including a precursor material and a carrier gas. A gas flow of at least one of the source gas and the auxiliary gas into the reactor chamber is controlled in response to a change of the air pressure in the reactor chamber.

A method of depositing a layer includes measuring a physical property that is related to an air pressure in a reactor chamber of a deposition apparatus. A main gas mixture including a source gas and an auxiliary gas is introduced into the reactor chamber at atmospheric pressure, the source gas including a precursor material and a carrier gas. A gas flow of at least one of the source gas and the auxiliary gas into the reactor chamber is controlled in response to a change of the air pressure in the reactor chamber.

Described herein are cobalt compounds, processes for making cobalt compounds, cobalt compounds used as precursors for depositing cobalt-containing films (e.g., cobalt, cobalt oxide, cobalt nitride, cobalt silicide etc.); and cobalt films. Examples of cobalt precursor compounds are bis(diazadiene)cobalt compounds. Examples of surfaces for deposition of metal-containing films include, but are not limited to, metals, metal oxides, metal nitrides, and metal silicates; silicon, silicon oxide and silicon nitride. Alkylated diazadiene ligands are used to form cobalt complexes which are used for selective deposition on certain surfaces and/or superior film properties such as uniformity, continuity, and low resistance.

Described herein are cobalt compounds, processes for making cobalt compounds, cobalt compounds used as precursors for depositing cobalt-containing films (e.g., cobalt, cobalt oxide, cobalt nitride, cobalt silicide etc.); and cobalt films. Examples of cobalt precursor compounds are bis(diazadiene)cobalt compounds. Examples of surfaces for deposition of metal-containing films include, but are not limited to, metals, metal oxides, metal nitrides, and metal silicates; silicon, silicon oxide and silicon nitride. Alkylated diazadiene ligands are used to form cobalt complexes which are used for selective deposition on certain surfaces and/or superior film properties such as uniformity, continuity, and low resistance.

Various examples related to fabrication of thermally stable ultra-high density particle-in-cavity (PIC) nanostructures. In one example, a method includes disposing an anodized aluminum oxide (AAO) template onto a surface of a substrate; removing, from the AAO template, a support layer disposed on a side of the AAO template opposite the surface of the substrate; etching nanocavities into the surface of the substrate using the AAO template as an etch mask; and removing the AAO template from the surface of the substrate. The method can include fabricating the AAO template on an aluminum substrate by anodization of an aluminum film and removing the AAO template from the aluminum substrate after formation of the support layer on the AAO template.