Patent classifications
C23C28/32
Substrate for flexible device
A substrate for a flexible device which includes a stainless steel sheet, a nickel plating layer formed on a surface of the stainless steel sheet, and a glass layer of electrical insulating bismuth-based glass formed in the form of layer on a surface of the nickel plating layer.
Multilayer structure and method for producing multilayer structure
Provided are: a multilayer structure in which a titanium oxide layer exhibits excellent photocatalytic activity; and a method for producing this multilayer structure. The above-described multilayer structure comprises: a conductive part which contains a metal element A other than Ti, while having electrical conductivity; and a titanium oxide layer which is arranged on the conductive part and contains 1.0% by atom or more of the metal element A.
Method for manufacturing a micromechanical layer structure
A method for manufacturing a micromechanical layer structure, including: providing a first protective layer patterned to have at least one opening which is filled with sacrificial layer material; depositing a functional-layer layer structure; producing a first opening in the functional-layer layer structure to at least one opening of the first protective layer, so that in at least one of the layers of the functional-layer layer structure; depositing a second protective layer so that the first opening is filled with material of the second protective layer; patterning the second protective layer and the filled first opening to have a second opening to the first protective layer, the second opening having the same or a lesser width than the first opening; removing sacrificial layer material at least in the opening of the first protective layer; and removing protective layer material at least in the second opening.
Plating film and plated member
Provided is a plating film containing Au and Tl, including Tl oxides including Tl.sub.2O on a surface of the plating film, a ratio of Tl atoms constituting Tl.sub.2O to a total of Tl atoms constituting the Tl oxides and Tl atoms constituting Tl simple substances on the surface being 40% or more.
Air data probe corrosion protection
An air data probe with a corrosion protection coating system includes a body with an external and an internal surface and a uniform, pinhole-free first protection layer applied by atomic layer deposition (ALD) to reduce corrosion of the body, including corrosion initiated by sulfur and nitrogen compounds. The air data probe further includes a second protection layer, covering the first protection layer over the external surfaces of the body to protect the air data probe from foreign object impact damage.
CORROSION-RESISTANT MEMBER
A corrosion-resistant member including: a metal base material (10); a corrosion-resistant coating (30) formed on the surface of the base material (10); and a buffer layer (20) formed between the base material (10) and the corrosion-resistant coating (30). The base material (10) contains a main element having the highest mass content ratio among elements contained in the base material (10) and a trace element having a mass content ratio of 1% by mass or less. The corrosion-resistant coating (30) contains at least one kind selected from magnesium fluoride, aluminum fluoride, and aluminum oxide. The buffer layer (20) contains an element of the same kind as the trace element, and the content ratio obtained by energy dispersive X-ray analysis of the element of the same kind as the trace element contained in the buffer layer (20) is 2% by mass or more and 99% by mass or less.
METHOD OF MANUFACTURING PASSIVATION FILM
A method of manufacturing a passivation film, which includes a passivation process in which a substrate on the surface of which at least one of germanium and molybdenum is contained is treated with a passivation gas containing an oxygen-containing compound, which is a compound containing an oxygen atom in the molecule, and hydrogen sulfide to form a passivation film containing a sulfur atom on the surface of the substrate. The concentration of the oxygen-containing compound in the passivation gas is from 0.001 mole ppm to less than 75 mole ppm.
Solar control film with improved moisture resistance function and manufacturing method thereof
A solar control film with improved moisture resistance function is provided. The solar control film includes a flexible substrate, at least one infrared-reflective composite layer and an outer dielectric layer. The infrared-reflective composite layer includes a dielectric sublayer and a metal sublayer. The dielectric sublayer is disposed on the flexible substrate, and the material of the dielectric sublayer includes TiO.sub.2. The metal sublayer is disposed on the dielectric sublayer, and includes 8.3-16.4 atomic % Ag, 0.5-1.0 atomic % Ti, 81.0-90.9 atomic % N, and 0.3-0.6 atomic % noble metal, and the noble metal is Au, Pd or any combinations thereof. The outer dielectric layer is disposed on the infrared-reflective composite layer, and the material of the outer dielectric layer includes TiO.sub.2. In this way, the provided solar control film can effectively suppress of forming white spots without significantly sacrificing its original function and characteristics.
PVD COATINGS FOR ALUMINUM DIE CASTING MOLDS
A die-cast mold for die casting aluminum includes a first die having a first mold surface, a first multilayer coating disposed over the first mold surface, a second die having a second mold surface, and a second multilayer coating disposed over the second mold surface. The first multilayer coating includes a first base layer and the second multilayer coating includes a second base layer. The first die and the second die mate to form a mold cavity. Characteristically, the first base layer and the second base layer are each independently composed of a zirconium nitride or a zirconium carbide.
METHOD OF MANUFACTURING A NEURAL INTERFACE PROBE EMPLOYING AMORPHOUS SILICON CARBIDE
Manufacturing a neural interface device. Forming a neural interface probe of an implantable microelectrode body. PECVD a first amorphous silicon carbide insulation layer, forming a thin film metal trace and interface pad on the first layer, the pad on a portion of the trace. PECVD a second amorphous silicon carbide insulation layer on the first layer and covering the trace and the pad. Forming an opening in the second layer to expose the pad to an ambient environment. Patterning the first and second layers to define the neural interface probe. The probe has a rectangular cuboid shape, a cross-sectional area perpendicularly transverse to a long axis length of the probe and through any perpendicularly transverse cross-section along the long axis length is less than about 50 microns. The layers are the principle material of construction of the probe.