Patent classifications
C23C28/32
ALUMINUM ALLOY HUB AND METHOD FOR COATING SURFACE OF ALUMINUM ALLOY HUB
The application relates to an aluminum alloy hub and a method for coating the surface of the aluminum alloy hub. The aluminum alloy hub is provided with an aluminum alloy matrix and a coating attached to the surface of the aluminum alloy matrix, and the coating sequentially includes a pre-coating layer formed by nickel-coated aluminum or aluminum-coated nickel powder, a Cr.sub.3C.sub.2 layer and a varnish layer on the surface of the aluminum alloy matrix. According to the aluminum alloy hub disclosed by the invention, more excellent corrosion resistance is obtained by spraying the Cr.sub.3C.sub.2 layer on the surface of the aluminum alloy hub.
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR PRODUCING NANOWIRE OR NANOSHEET TRANSISTOR
The present disclosure appropriately shortens a processing step for processing a substrate in which a silicon layer and a silicon germanium layer are alternatively laminated. The present disclosure provides a substrate processing method of processing the substrate in which the silicon layer and the silicon germanium layer are alternatively laminated, which includes forming an oxide film by selectively modifying a surface layer of an exposed surface of the silicon germanium layer by using a processing gas including fluorine and oxygen and converted into plasma.
METHOD FOR FORMING ELECTRODE
A method of forming an electrode in accordance with an exemplary embodiment includes a process of forming a mask pattern on one surface of a base to expose a partial area of the one surface of the base by using a mask material that is polymer including an end tail having at least one bonding structure of covalent bond and double bond, a process of loading the base on which the mask pattern is formed into a chamber, and a process of forming a conductive layer containing copper on the exposed one surface of the base by using an atomic layer deposition method that alternately injects a source material containing copper and a reactive material that reacts with the source material into the chamber.
Thus, according to the method of forming an electrode in accordance with an exemplary embodiment, a thin-film caused by a material for forming an electrode is not formed on a surface of the mask pattern. Therefore, a residue is not remained when the mask pattern is removed to prevent a defect caused by the residue from being generated.
Sn-BASED PLATED STEEL SHEET
To provide a Sn-based plated steel sheet excellent in yellowing resistance, coating film adhesiveness, and sulfurization blackening resistance without performing the conventional chromate treatment.
A Sn-based plated steel sheet of the present invention includes: a steel sheet; a Sn-based plating layer located on at least one surface of the steel sheet; and a coating layer located on the Sn-based plating layer, wherein: the Sn-based plating layer contains 0.10 to 15.00 g/m.sup.2 of Sn per side in terms of metal Sn; the coating layer contains a Zr oxide and a Mn oxide; a content of the Zr oxide is 0.20 to 50.00 mg/m.sup.2 per side in terms of metal Zr; a content of the Mn oxide in terms of metal Mn is 0.01 to 0.50 times on a mass basis relative to the content of the Zr oxide in terms of metal Zr; and a depth position A where an element concentration of Mn is maximum is located on a side closer to a surface of the coating layer than a depth position B where an element concentration of Zr is maximum, and a distance in a depth direction between the depth position A and the depth position B is 2 nm or more in an element analysis in the depth direction by XPS.
METAL OXIDE RESIST PATTERNING WITH ELECTRICAL FIELD GUIDED POST-EXPOSURE BAKE
A method for processing a substrate is described. The method includes forming a metal containing resist layer onto a substrate, patterning the metal containing resist layer, and performing a post exposure bake on the metal containing resist layer. The post exposure bake on the metal containing resist layer is a field guided post exposure bake operation and includes the use of an electric field to guide the ions or charged species within the metal containing resist layer. The field guided post exposure bake operation may be paired with a post development field guided bake operation.
Anodic oxide film structure
Proposed is an anodic oxide film structure that includes an anodic oxide film sheet and has high strength, chemical resistance and corrosion resistance.
CORROSION-RESISTANT PERMANENT MAGNET FOR AN INTRAVASCULAR BLOOD PUMP
This invention is directed to a corrosion-resistant permanent magnet, to a method for producing a corrosion-resistant permanent magnet, and to an intravascular blood pump comprising the magnet. The magnet is surrounded by a composite coating, the composite coating comprising, in the order recited, a first metal oxide layer, a metal layer, a second metal oxide layer, a linker layer, and a layer formed from poly(2-chloro-p-xylylene). In an alternative embodiment, a further metal layer and, optionally, a further metal oxide layer may be provided between the second metal oxide layer and the linker layer. In a further alternative embodiment, the metal layer may be omitted, and a further layer structure comprising at least one metal oxide layer, a linker layer, and a layer formed from poly(2-chloro-p-xylylene) may be provided instead.
Wet-area device and method for manufacturing wet-area device
According to one embodiment, a wet-area device includes a main part, a first layer, and a second layer. The first layer is provided on an outer surface of the main part. The second layer is provided on an outer surface of the first layer. A hardness of the second layer is greater than a hardness of the first layer. The first layer includes a first unevenness at a side of the outer surface of the first layer. The first unevenness includes a plurality of recesses and a plurality of protrusions. The second layer includes a second unevenness at a side of an outer surface of the second layer. The second unevenness includes a plurality of recesses and a plurality of protrusions. The second unevenness is arranged along the first unevenness. An average height of the first unevenness is less than an average length of the first unevenness.
Method for doping using electric field
A doping method using an electric field includes stacking a sacrificial layer on a doped layer, disposing a doping material on the sacrificial layer, disposing electrodes on the doping material and the doped layer, respectively, and doping the doping material into the doped layer through oxidation, diffusion, and reduction of the doping material by the electric field.
SUBSTRATE WITH A MOLYBDENUM NITRIDE LAYER SYSTEM, AND COATING METHOD FOR PRODUCING A LAYER SYSTEM
A substrate having a multilayer coating system in the form of a surface coating, which has an outer cover layer comprising amorphous carbon, and a coating process for producing a substrate. At least a first Mo.sub.aN.sub.x support layer is provided between the substrate and the cover layer, which support layer has a nitrogen content x, referred to an Mo content a, which is in the range of 25 at %≤x≤55 at %, with x+a=100 at %.