A cutting tool comprises a substrate and a coating layer provided on the substrate, the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer, and a lone layer, the lone layer including cubic Ti.sub.zAl.sub.1-zN crystal grains, an atomic ratio z of Ti in the Ti.sub.zAl.sub.1-zN being 0.55 or more and 0.7 or less, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, the multilayer structure layer having a thickness with an average value of 40 nm or more and 95 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 50 nm to 100 nm, a maximum value of 90 nm to 110 nm, and a minimum value of 40 nm to 60 nm.

A coated tool includes a base and a coating layer on the base. The coating layer includes a cubic crystal that includes one or more kinds of elements selected from Groups 4, 5 and 6 in the periodic table, Al, Si, B, Y and Mn, and one or more kinds of elements selected from C, N and O. A maximum peak is in a range of 50° or more in a distribution of X-ray intensity (111) at α axis of a pole figure, the X-ray intensity regarding a (111) plane of the cubic crystal. The intensity at the maximum peak is Imax, a peak width at 0.8 Imax of the maximum peak is 20° or more, and the intensity at 90° is 0.78 Imax or more. A cutting tool includes a holder which includes a pocket at an end, and the coated tool in the pocket.

A coated cutting tool including a substrate and a coating is provided. The coating includes a nano-multilayer of alternating layers of a first nanolayer being Ti.sub.1-xAl.sub.xN, 0.35≤x≤0.70, and a second nanolayer being Ti.sub.1-yAl.sub.yN, 0.12≤y≤0.25. A sequence of one first nanolayer and one second nanolayer forms a layer period. The average layer period thickness in the nano-multilayer is ≤7 nm. The nanomultilayer has a columnar structure with an average column width of ≤70 nm.

A functional film that has a hydrophilic property or an antifog property and that is formed on a base material includes a fluorine-containing layer that contains fluorine.

A component (100), in particular for a valve train system, having a substrate (3) and a layer system (1) applied at least in parts to the substrate (3), wherein the layer system (1) includes a friction-reducing and wear-reducing protective layer (2) for forming a component surface, wherein the protective layer (2) has at least one first sub-layer (4, 4a) made of doped tetrahedral amorphous carbon, which includes sp.sup.3-hybridized carbon having a mole fraction of at least 50%, wherein the first sub-layer (4, 4a) contains oxygen in a concentration in the range from 0.1 at % to 3.0 at % and hydrogen in a concentration in the range from 0.1 at % to 15 at %, and wherein the first sub-layer (4, 4a) has one or more of the following dopants in a concentration in the range from 0.03 at % to 15 at %: chromium, molybdenum, tungsten, silicon, copper, niobium, zirconium, vanadium, nickel, iron, silver, hafnium, fluorine, boron and nitrogen. A method for producing such a component (100) is also provided.

An electronic device may include conductive structures having a visible-light-reflecting coating. The coating may include a seed layer, transition layers, a neutral-color base layer, and an uppermost layer that forms a single-layer interference film. The neutral-color base layer may be opaque to visible light. The interference film may include silicon and may have an absorption coefficient between 0 and 1. The interference film may include, for example, CrSiN or CrSiCN. The composition of the interference film, the thickness of the interference film, and/or the composition of the base layer may be selected to provide the coating with a desired color near the middle of the visible spectrum (e.g., at green wavelengths). The color may be relatively stable even if the thickness of the coating varies across its area.

A coated mold which can exhibit good sliding properties, and has further reduced droplets and excellent durability. The coated mold has a hard coating on a work surface, the hard coating including layer A in which layer a1 and layer a2 are alternately laminated, wherein the layer a1 is composed of a Cr-based nitride and has a thickness of 100 nm or less, and the layer a2 is composed of a nitride or carbonitride of (V.sub.1-aM.sub.a) (M is at least one selected from Mo and W), has an atomic ratio a of M to the sum of V and M of 0.05 or more and 0.45 or less, and has a thickness of 80 nm or less. Also: a method for manufacturing a coated mold; and a hard coat-forming target which can be used in the method for manufacturing a coated mold.

A cutting tool includes a substrate and a coating film that is disposed on the substrate, wherein the coating film includes a first layer composed of metal tungsten and hexagonal ditungsten carbide, and the first layer has an elastic deformation rate of 43.0 or more and 58.0 or less.

A component including a substrate surface coated with a coating including at least one MoN layer having a thickness not less than 40 nm. Between the substrate surface and the at least one MoN layer the component includes: i) a substrate surface hardened layer, which is a hardened, nitrogen-containing substrate surface layer that is the result of a nitriding treatment carried out at the substrate surface and has a thickness not less than 10 nm, preferably not less than 20 nm and not greater than 150 nm, and/or ii) a layer system composed of more than 2 MoN layers and more than 2 CrN layers, wherein the MoN and CrN layers forming the layer system are individual layers deposited alternatingly one on each other forming a multilayer MoN/CrN coating film.

Provided is a coated cutting tool, which includes a hard coating film containing a layer (b) formed of a nitride or a carbonitride, a layer (c) which is a layered coating film formed by alternately layering a nitride or carbonitride layer (c1) that contains 55 atom % or more and 75 atom % or less of Al, Cr having a second highest content percentage, and at least Si and a nitride or carbonitride layer (c2) that contains 55 atom % or more and 75 atom % or less of Al and Ti having a second highest content percentage, each layer having a film thickness of 50 nm or less, and a layer (d) that is a nitride or carbonitride that contains, with respect to a total amount of metal elements (including metalloid elements), 55 atom % or more and 75 atom % or less of Al, Cr having a second highest content percentage.