A laminated hard film is obtained by laminating a layer A and a layer B. The layer A has a composition different from that of the layer B. The layer A is formed of (Ti.sub.aCr.sub.bAl.sub.cSi.sub.d)(C.sub.xN.sub.1-x) and satisifies the relationship of 0≦a≦0.10, 0.10≦b≦0.50, 0.50≦c≦0.90, 0≦d≦0.05, a+b+c+d=1 and 0≦x≦0.5. The layer B is formed of (Cr.sub.eSi.sub.1-e)(C.sub.yN.sub.1-y) and satisfies the relationship of 0.90≦e≦1.0 and 0≦y≦0.5, or is formed of (Al.sub.fSi.sub.1-f)(C.sub.2N.sub.1-z) and satisfies the relationship of 0.90≦f≦1.0 and 0≦x≦0.5. Each of the layer A and the layer B has a thickness of 2 to 100 nm, and the layer A and the layer B are each alternately laminated.

Provided is a coated cutting tool, which includes a hard coating film containing a layer (b) formed of a nitride or a carbonitride, a layer (c) which is a layered coating film formed by alternately layering a nitride or carbonitride layer (c1) that contains 55 atom % or more and 75 atom % or less of Al, Cr having a second highest content percentage, and at least Si and a nitride or carbonitride layer (c2) that contains 55 atom % or more and 75 atom % or less of Al and Ti having a second highest content percentage, each layer having a film thickness of 50 nm or less, and a layer (d) that is a nitride or carbonitride that contains, with respect to a total amount of metal elements (including metalloid elements), 55 atom % or more and 75 atom % or less of Al, Cr having a second highest content percentage.

A cutting tool comprises a substrate and a coating layer provided on the substrate, the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer, and a lone layer, the lone layer including cubic Ti.sub.zAl.sub.1-zN crystal grains, an atomic ratio z of Ti in the Ti.sub.zAl.sub.1-zN being 0.4 or more and less than 0.55, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, the multilayer structure layer having a thickness with an average value of 10 nm or more and 45 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 20 nm to 50 nm, a maximum value of 40 nm to 60 nm, and a minimum value of 10 nm to 30 nm.

There is provided a coated tool in which an aluminum oxide layer has improved wear resistance. The coated tool is, for example, a cutting tool (1) which is provided with a base material (5) and a coating layer (6) located on a surface of the base material (5), wherein a cutting edge (4) and a flank surface (3) are located on the coating layer (6), the coating layer (6) has a portion in which at least a titanium carbonitride layer (8) and an aluminum oxide layer (10) having an α-type crystal structure are laminated in this order, and, with regard to a texture coefficient (Tc) (hkl) which is calculated on a basis of a peak of the aluminum oxide layer (10) analyzed by an X-ray diffraction analysis, a texture coefficient (Tc1) (4_0_10) as measured from a surface side of the aluminum oxide layer (10) in the flank surface (3) is 0.6 or more.

A process chamber includes multiple partitions within a single continuous vacuum enclosure. Each of the multiple partitions is defined by respective distinct volumes within the single continuous vacuum enclosure that are connected thereamongst for unhindered movement of a substrate therethrough. The multiple partitions are configured to provide different process gases or purge gases to the substrate as the substrate cycles through the multiple positions. The process can cycle through a first deposition step that deposits a first material on the substrate in a first position and a second deposition step that deposits a second material on the substrate in a second position within each cycle. Alternatively or additionally, the process spaces can include at least one precursor treatment space and at least one reaction space.

A cutting tool comprises a substrate and a coating layer provided on the substrate, the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer, and a lone layer, the lone layer including cubic Ti.sub.zAl.sub.1-zN crystal grains, an atomic ratio z of Ti in the Ti.sub.zAl.sub.1-zN being 0.4 or more and less than 0.55, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, the multilayer structure layer having a thickness with an average value of 40 nm or more and 95 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 50 nm to 100 nm, a maximum value of 90 nm to 110 nm, and a minimum value of 40 nm to 60 nm.

A cutting tool comprises a substrate and a coating layer provided on the substrate, the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer, and a lone layer, the lone layer including cubic Ti.sub.zAl.sub.1-zN crystal grains, an atomic ratio z of Ti in the Ti.sub.zAl.sub.1-zN being 0.55 or more and 0.7 or less, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, the multilayer structure layer having a thickness with an average value of 10 nm or more and 45 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 20 nm to 50 nm, a maximum value of 40 nm to 60 nm, and a minimum value of 10 nm to 30 nm.

A coated die for use in hot stamping has a hard film having an alternating lamination section formed by alternating lamination of a1 layers consisting of nitride having 30% or more of chromium in atomic ratio in a metal part, and a2 layers consisting of nitride having 50% or more of vanadium in atomic ratio in a metal part. When t.sub.a1 and t.sub.a2 are defined as thicknesses of the a1 layer and the a2 layer respectively, a film thickness ratio Xb is defined as a film thickness ratio t.sub.a2/t.sub.a1 of a1 layers and a2 layers adjacent to each other in a substrate-side region of the alternating lamination section and a film thickness ratio Xt is defined as a film thickness ratio t.sub.a2/t.sub.a1 of a1 layers and a2 layers adjacent to each other in an outermost surface side region of the alternating lamination section, it holds that Xt>Xb.

A layer combination for an electrode can be used in rechargeable electrochemical cells. The rechargeable electrochemical cells are in the form of lithium batteries, e.g. a lithium-sulfur battery or a lithium-oxygen battery. The layer combination includes at least one superhydrophobic, nanostructured protective layer which repels polar substances.

A reactive material stack with tunable ignition temperatures is provided by inserting a barrier layer between layers of reactive materials. The barrier layer prevents the interdiffusion of the reactive materials, thus a reaction between reactive materials only occurs at an elevated ignition temperature when a certain energy threshold is reached.