A cutting tool comprises a substrate and a coating layer provided on the substrate, the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer, and a lone layer, the lone layer including cubic Ti.sub.zAl.sub.1-zN crystal grains, an atomic ratio z of Ti in the Ti.sub.zAl.sub.1-zN being 0.4 or more and less than 0.55, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, the multilayer structure layer having a thickness with an average value of 40 nm or more and 95 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 50 nm to 100 nm, a maximum value of 90 nm to 110 nm, and a minimum value of 40 nm to 60 nm.

A cutting tool comprises a substrate and a coating layer provided on the substrate, the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer, and a lone layer, the lone layer including cubic Ti.sub.zAl.sub.1-zN crystal grains, an atomic ratio z of Ti in the Ti.sub.zAl.sub.1-zN being 0.55 or more and 0.7 or less, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, the multilayer structure layer having a thickness with an average value of 10 nm or more and 45 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 20 nm to 50 nm, a maximum value of 40 nm to 60 nm, and a minimum value of 10 nm to 30 nm.

A coated die for use in hot stamping has a hard film having an alternating lamination section formed by alternating lamination of a1 layers consisting of nitride having 30% or more of chromium in atomic ratio in a metal part, and a2 layers consisting of nitride having 50% or more of vanadium in atomic ratio in a metal part. When t.sub.a1 and t.sub.a2 are defined as thicknesses of the a1 layer and the a2 layer respectively, a film thickness ratio Xb is defined as a film thickness ratio t.sub.a2/t.sub.a1 of a1 layers and a2 layers adjacent to each other in a substrate-side region of the alternating lamination section and a film thickness ratio Xt is defined as a film thickness ratio t.sub.a2/t.sub.a1 of a1 layers and a2 layers adjacent to each other in an outermost surface side region of the alternating lamination section, it holds that Xt>Xb.

A coated cutting tool includes a substrate and a coating layer formed onto the surface of the substrate. The coating layer contains an outermost layer. The outermost layer contains NbN. The NbN contains cubic NbN and hexagonal NbN. When a peak intensity at a (200) plane of cubic NbN is made I.sub.c, a peak intensity at a (101) plane of the hexagonal NbN is made I.sub.h1, and a sum of peak intensities at a (103) plane and a (110) plane of the hexagonal NbN is made I.sub.h2 in X-ray diffraction analysis, a ratio [I.sub.h1/(I.sub.h1+I.sub.c)] of I.sub.h1 based on a sum of I.sub.c and I.sub.h1 is 0.5 or more and less than 1.0, and a ratio [I.sub.h1/(I.sub.h1+I.sub.h2)] of I.sub.h1 based on a sum of I.sub.h1 and I.sub.h2 is 0.5 or more and 1.0 or less.

A coated cutting tool includes a substrate of cemented carbide, cermet, ceramics, steel or cubic boron nitride and a multi-layered wear resistant coating. The multi-layered wear resistant coating has a total thickness from 5 to 25 μm and includes refractory coating layers deposited by chemical vapour deposition (CVD) or moderate temperature chemical vapour deposition (MT-CVD). The multi-layered wear resistant coating has at least one pair of layers (a) and (b), with layer (b) being deposited immediately on top of layer (a). Layer (a) is a layer of aluminium nitride having hexagonal crystal structure (h-AlN) and a thickness from 10 nm to 750 nm. Layer (b) is a layer of titanium aluminium nitride or titanium aluminium carbonitride represented by the general formula Ti.sub.1-xAl.sub.xC.sub.yN.sub.z with 0.4≤x≤0.95, 0≤y≤0.10 and 0.85≤z≤1.15, having a thickness from 0.5 μm to 15 μm, and at least 90% of the Ti.sub.1-xAl.sub.xC.sub.yN.sub.z of layer (b) has a face-centered cubic (fcc) crystal structure.

The invention provides substrates with a multi-layer coating, comprising in order: i) the substrate; ii) a seed layer; ill) a barrier layer deposited via a CVD method; and iv) a functional layer deposited via a PVD method, and methods of making such coatings. The coatings of the invention have been shown to possess good resistance to corrosion.

A protective coating layer, an electronic device including such a protective coating layer, and the methods of making the same are provided. The electronic device includes a substrate, a thin film circuit layer disposed over the substrate, and a protective coating layer disposed over the thin film circuit layer. The protective coating layer includes a first coating and a second coating disposed over the first coating. Each coating has a cross-plane thermal conductivity in a direction normal to a respective coating surface equal to or higher than 0.5 W/(m*K). The first coating and the second coating have different crystal or amorphous structures, different crystalline orientations, different compositions, or a combination thereof to provide different nanoindentation hardness. The first coating has a hardness lower than that of the second coating.

A hard coating for cutting tools according to the present invention is a hard coating for cutting tools which is formed on and adjacent to a hard base material by a PVD method, and is characterized in that the thickness of the entire hard coating is 0.5 to 10 μm, and the hard coating includes one or more nitride layers and one or more oxide layers. Each of the one or more nitride layers has a thickness of 0.1 to 5.0 μm and is composed of Al.sub.aTi.sub.bMe.sub.cN (wherein Me is at least one selected from Si, W, Nb, Mo, Ta, Hf, Zr, and Y, and 0.55≤a≤0.7, 0.2<b≤0.45, and 0≤c<0.1) or Al.sub.aCr.sub.bMe.sub.cN (wherein Me is at least one selected from Si, W, Nb, Mo, Ta, Hf, Zr, and Y, and 0.55≤a≤0.7, 0.2<b≤0.45, and 0≤c<0.1) in a cubic phase, and each of the one or more oxide layers has a thickness of 0.1 to 3.0 μm and is composed of γ-Al.sub.2O.sub.3 in a cubic phase. When the number of compositionally discontinuous interfaces throughout the hard coating including the hard base material is n, the n satisfies 4≤n≤9, and the ratio of the microhardness (H1) of the nitride layer to the microhardness (H2) of the oxide layer satisfies 1.03<H1/H2<1.3, and the ratio of the elastic modulus of the nitride layer (E1) to the elastic modulus of the oxide layer (E2) satisfies 1.1<E1/E2<1.3. Each of the nitride layers and each of the oxide layers have an elastic deformation resistance index (H/E) of 0.07 to 0.09 and a plastic deformation resistance index (H.sup.3/E.sup.2) of 0.13 to 0.29, and the elastic deformation resistance index (H/E) of the entire hard coating is 0.09 to 0.12, and the plastic deformation resistance index (H.sup.3/E.sup.2) of the entire hard coating is 0.29 to 0.32.

A coated cutting tool comprises a substrate and a coating layer formed on a surface of the substrate, and has a rake face and a flank. The coating layer comprises an alternating laminate structure in which first compound layers containing AlN and second compound layers containing a compound are laminated in an alternating manner, the compound having a composition represented by formula (1) below:

(Ti.sub.1-xAl.sub.x)N  (1)

(wherein x satisfies 0.40≤x≤0.70). An average thickness T.sub.1 per first compound layer is 5 nm or more to 160 nm or less, and an average thickness T.sub.2 per second compound layer is 8 nm or more to 200 nm or less. A ratio of T.sub.1 to T.sub.2 is 0.10 or more to 0.80 or less. An average thickness T.sub.3 of the alternating laminate structure is 2.5 μm or more to 7.0 μm or less. A ratio (H/E) of hardness H to elastic modulus E is 0.065 or more to 0.085 or less at the rake face or the flank.

Forming a porous multilayer material includes forming a multilayer material on a substrate. Forming the multilayer material includes alternately forming a sacrificial layer and a semi-sacrificial layer, where the sacrificial layer includes a first metal and the semi-sacrificial layer includes the first metal and a second metal or metallic alloy. Forming the porous multilayer material further includes removing at least a portion of the first metal from each of the sacrificial and semi-sacrificial layers to yield the porous multilayer material. The porous multilayer material includes a multiplicity of metal-containing layers, each layer having a thickness in a range between about 5 nm and about 100 nm and bonded to an adjacent layer. Each layer includes chromium, niobium, tantalum, vanadium, molybdenum, tungsten, or a combination thereof. A void is defined between each pair of layers, and a density of porous the multilayer material is <1% bulk density.