The object of the present invention is to provide a method for growing a large-size crystal by laser assisted heating and a dedicated device. The device comprises a laser core heating device, a xenon lamp surface heating device, a base, a vacuum cavity and etc. When a crystal is prepared, seeding and crystal growing are implemented by a xenon lamp-laser synergetic heating mode. According to the present invention, the structure and functions of the dedicated device are designed to introduce, at the center of a float melting zone, a laser heating source having high precision and strong controllability, so that a composite heating mode with xenon lamp surface heating and laser core heating is formed; and combined with the control of process, the method and the device solve the difficulty in growing a large-size test crystal bar and enable the growth of the crystal bar having a diameter up to 35 mm so as to facilitate engineering uses.

A method includes providing a collection of particulate material and forming a first article therefrom. Forming the first article includes forming an outer shell with an outer surface that defines an outer periphery of the first article; forming a relief area of the first article that supports the outer shell, including forming a relief void in the relief area; and collecting a collection of the particulate material within the outer shell during formation of the first article. Moreover, the method includes encasing the first article with an outer member. The outer member defines an internal cavity with an internal surface that corresponds to the outer surface of the outer shell. The method further includes heating, which deforms the first article selectively at the relief void.

A laser heated pedestal growth system includes two lasers having output beams that are combined with a beam combiner to produce a single beam. A growth chamber that includes a final focusing mirror for receiving and focusing the single beam of the lasers onto a tip of a feed material to create a molten zone in a focal region. A feed transport mechanism is adapted for transporting a feed material through the growth chamber and into the molten zone. An opposing seed transport mechanism is adapted for withdrawing a seed material from the growth chamber. An imaging system is adapted for capturing an image of the molten zone within the growth chamber. A controller in communication with the feed transport mechanism, the seed transport mechanism, one of the two lasers, and the imagining system is adapted to control and stabilize a fiber growth process by controlling the feed transport mechanism, the seed transport mechanism, and the power of the combined laser beam.

A laser heated pedestal growth system includes two lasers having output beams that are combined with a beam combiner to produce a single beam. A growth chamber that includes a final focusing mirror for receiving and focusing the single beam of the lasers onto a tip of a feed material to create a molten zone in a focal region. A feed transport mechanism is adapted for transporting a feed material through the growth chamber and into the molten zone. An opposing seed transport mechanism is adapted for withdrawing a seed material from the growth chamber. An imaging system is adapted for capturing an image of the molten zone within the growth chamber. A controller in communication with the feed transport mechanism, the seed transport mechanism, one of the two lasers, and the imagining system is adapted to control and stabilize a fiber growth process by controlling the feed transport mechanism, the seed transport mechanism, and the power of the combined laser beam.

Using processes disclosed herein, materials and structures are created and used. For example, processes can include melting amorphous carbon doped with nitrogen and carbon-13 into an undercooled state followed by quenching. Materials disclosed herein may include dopants in concentrations exceeding thermodynamic solubility limits.

The invention relates to a method for producing a component by means of layered construction, by combining a plurality of crystallites of a metallic material to form a single crystal. The single crystal is formed by thermomechanically activated successive anisotropic plastic deformation. The metallic material is heated during the construction of a new layer, with the result that the metallic material is melted in a linear region. The linear region is moved in order to construct the new layer.

The invention relates to a method for producing a component by means of layered construction, by combining a plurality of crystallites of a metallic material to form a single crystal. The single crystal is formed by thermomechanically activated successive anisotropic plastic deformation. The metallic material is heated during the construction of a new layer, with the result that the metallic material is melted in a linear region. The linear region is moved in order to construct the new layer.

To provide a single crystal production apparatus capable of efficiently producing a single crystal of relatively high quality, by cooling a melting zone, the device including: a heating part that forms the melting zone from a raw material by irradiation of light; and a supporting part that supports the melting zone in a non-contact manner.

Granular silicon which is especially useful in reducing dislocations and gas inclusions of single crystals prepared therefrom is produced by a heat treatment in which a process gas flowing through a plasma chamber heats granular silicon, and the heated granular silicon is transported counter-currently through the plasma chamber, melting an outer periphery of the granular silicon, which then recrystallizes, producing an exterior with a lower concentration of crystal grains than the interior of the granules.

Granular silicon which is especially useful in reducing dislocations and gas inclusions of single crystals prepared therefrom is produced by a heat treatment in which a process gas flowing through a plasma chamber heats granular silicon, and the heated granular silicon is transported counter-currently through the plasma chamber, melting an outer periphery of the granular silicon, which then recrystallizes, producing an exterior with a lower concentration of crystal grains than the interior of the granules.