A method of estimating an oxygen concentration in monocrystalline silicon, which is pulled up by a pull-up device having a hot zone with a plane-asymmetric arrangement with respect to a plane defined by a crystal pull-up shaft and an application direction of a horizontal magnetic field, includes, in at least one of a neck-formation step or a shoulder-formation step for the monocrystalline silicon: a step of measuring a surface temperature of a silicon melt at a point defining a plane-asymmetric arrangement of a hot zone, and a step of estimating the oxygen concentration in a straight body of the pulled-up monocrystalline silicon based on the measured surface temperature of the silicon melt and a predetermined relationship between the surface temperature of the silicon melt and the oxygen concentration in the monocrystalline silicon.

The present invention provides a method for calculating the liquid-solid interface morphology during growth of the ingot. The method comprises providing a wafer, selecting plural sampling locations on the wafer and detecting electrical resistivity at the plural sampling locations, calculating height differences between the sampling locations based on the detected electrical resistivity, and illustrating the morphology of the liquid-solid interface based on the calculated height differences. The method of the invention has advantages including easy operation and low cost.

The present invention provides a method for calculating the liquid-solid interface morphology during growth of the ingot. The method comprises providing a wafer, selecting plural sampling locations on the wafer and detecting electrical resistivity at the plural sampling locations, calculating height differences between the sampling locations based on the detected electrical resistivity, and illustrating the morphology of the liquid-solid interface based on the calculated height differences. The method of the invention has advantages including easy operation and low cost.

The disclosure discloses a method and a system for controlling temperature during crystal growth. The method includes that: the power of each of the heaters is constantly adjusted and simulating is performed by software to calculate the thermal field correspondingly at a solid-liquid interface and vicinity of the solid-liquid interface; the thermal field is coupled with a moving grid to determine whether the solid-liquid interface and the total thermal energy both reach thermal equilibrium; the power of each of the heaters that enables both the solid-liquid interface and the total thermal energy to reach the thermal equilibrium is stored and a thermal equilibrium diagram is drawn based on the power of each of the heaters; and during crystal growth, the power of each of the heaters is selected from the thermal equilibrium diagram which is drawn to control the temperature gradient at the solid-liquid interface.

The disclosure discloses a method and a system for controlling temperature during crystal growth. The method includes that: the power of each of the heaters is constantly adjusted and simulating is performed by software to calculate the thermal field correspondingly at a solid-liquid interface and vicinity of the solid-liquid interface; the thermal field is coupled with a moving grid to determine whether the solid-liquid interface and the total thermal energy both reach thermal equilibrium; the power of each of the heaters that enables both the solid-liquid interface and the total thermal energy to reach the thermal equilibrium is stored and a thermal equilibrium diagram is drawn based on the power of each of the heaters; and during crystal growth, the power of each of the heaters is selected from the thermal equilibrium diagram which is drawn to control the temperature gradient at the solid-liquid interface.

Methods for producing single crystal silicon ingots in which an array of quartz particles are added to the crucible assembly before ingot growth are disclosed. The array may be disposed in the outer melt zone of the crucible assembly as in a continuous Czochralski (CCz) process. The array may be made of quartz particles that are interconnected by linking members.

An embodiment provides a method for growing a silicon single crystalline ingot that may include: preparing a silicon melt solution in a crucible; probing a seed in the silicon melt solution; rotating the seed and the crucible while applying a horizontal magnetic field to the crucible; and pulling up an ingot grown from the silicon melt solution, wherein an interface between the growing ingot and the silicon melt solution is formed downward from a horizontal plane at 1 to 5 millimeters, and a bulk micro defects (BMD) size of the grown ingot is between 55 and 65 nanometers.

The present disclosure provides a method for automatically controlling material suction in a process of pulling-up of a monocrystal, including the steps of: obtaining a lifetime value and a resistivity of a pulled monocrystalline silicon rod; determining the lifetime value and a ratio of the lifetime value to the resistivity of the pulled monocrystalline silicon rod; if both the lifetime value and the ratio of the lifetime value to the resistivity are greater than set values, continuing to perform a re-feeding and pulling procedure; and if the lifetime value or/and the ratio of the lifetime value to the resistivity is less than or equal to the set values, performing a segment-taking and material suction procedure.

The present disclosure provides a method for automatically controlling material suction in a process of pulling-up of a monocrystal, including the steps of: obtaining a lifetime value and a resistivity of a pulled monocrystalline silicon rod; determining the lifetime value and a ratio of the lifetime value to the resistivity of the pulled monocrystalline silicon rod; if both the lifetime value and the ratio of the lifetime value to the resistivity are greater than set values, continuing to perform a re-feeding and pulling procedure; and if the lifetime value or/and the ratio of the lifetime value to the resistivity is less than or equal to the set values, performing a segment-taking and material suction procedure.

A method of controlling a convection pattern of a silicon melt includes applying a horizontal magnetic field having an intensity of 0.2 tesla or more to the silicon melt in a rotating quartz crucible to fix a direction of a convection flow in a plane orthogonal to an application direction of the horizontal magnetic field in the silicon melt, the horizontal magnetic field being applied so that a central magnetic field line passes through a point horizontally offset from a center axis of the quartz crucible by 10 mm or more.